Vacassy; Robert
Patent Applications and Registrations
Patent applications and USPTO patent grants for Vacassy; Robert.The latest application filed is for "polishing pad with porous interface and solid core, and related apparatus and methods".
- Vacassy; Robert - Aurora IL US
- Vacassy; Robert - Evian FR
| Patent | Date |
|---|---|
| CMP porous pad with particles in a polymeric matrix Grant 9,951,054 - Li , et al. April 24, 2 | 2018-04-24 |
| Polishing pad with porous interface and solid core, and related apparatus and methods Grant 9,463,551 - Vacassy , et al. October 11, 2 | 2016-10-11 |
| CMP method for metal-containing substrates Grant 9,074,118 - Vacassy , et al. July 7, 2 | 2015-07-07 |
| Polishing Pad With Porous Interface And Solid Core, And Related Apparatus And Methods App 20150056892 - VACASSY; Robert ; et al. | 2015-02-26 |
| Ultra High Void Volume Polishing Pad With Closed Pore Structure App 20150056895 - Fotou; George ; et al. | 2015-02-26 |
| Cmp Porous Pad With Particles In A Polymeric Matrix App 20100273399 - Li; Shoutian ; et al. | 2010-10-28 |
| Compositions And Methods For Chemical-mechanical Polishing Of Phase Change Materials App 20100190339 - Chen; Zhan ; et al. | 2010-07-29 |
| Compositions and methods for dielectric CMP Grant 7,677,956 - Carter , et al. March 16, 2 | 2010-03-16 |
| CMP method for metal-containing substrates App 20090314744 - Vacassy; Robert ; et al. | 2009-12-24 |
| Polishing composition for a tungsten-containing substrate Grant 7,582,127 - Vacassy , et al. September 1, 2 | 2009-09-01 |
| CMP method for improved oxide removal rate App 20090191710 - CARTER; Phillip W. ; et al. | 2009-07-30 |
| Silicon oxide polishing method utilizing colloidal silica App 20080220610 - Bayer; Benjamin ; et al. | 2008-09-11 |
| Rate-enhanced CMP compositions for dielectric films App 20080020680 - Vacassy; Robert ; et al. | 2008-01-24 |
| Method of polishing a tungsten-containing substrate App 20070266641 - Vacassy; Robert ; et al. | 2007-11-22 |
| Tunable selectivity slurries in CMP applications Grant 7,294,576 - Chen , et al. November 13, 2 | 2007-11-13 |
| Method Of Polishing A Tungsten-containing Substrate App 20070214728 - Vacassy; Robert ; et al. | 2007-09-20 |
| Composition and method to polish silicon nitride App 20070209287 - Chen; Zhan ; et al. | 2007-09-13 |
| Method of polishing a tungsten-containing substrate Grant 7,247,567 - Vacassy , et al. July 24, 2 | 2007-07-24 |
| CMP composition for improved oxide removal rate App 20050279733 - Carter, Phillip W. ; et al. | 2005-12-22 |
| Method of polishing a tungsten-containing substrate App 20050282391 - Vacassy, Robert ; et al. | 2005-12-22 |
| Methanol-containing silica-based cmp compositions App 20050150173 - Vacassy, Robert | 2005-07-14 |
| Methanol-containing silica-based CMP compositions Grant 6,682,575 - Vacassy January 27, 2 | 2004-01-27 |
| Compositions and methods for dielectric CMP App 20030211815 - Carter, Phillip ; et al. | 2003-11-13 |
| Methanol-containing silica-based CMP compositions App 20030168628 - Vacassy, Robert | 2003-09-11 |
| Production of powders Grant 6,458,335 - Lemaitre , et al. October 1, 2 | 2002-10-01 |
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