Uzawa; Shigeyuki

Patent Applications and Registrations

Patent applications and USPTO patent grants for Uzawa; Shigeyuki.The latest application filed is for "optical element positioning apparatus, projection optical system and exposure apparatus".

Company Profile

0.20.12

Uzawa; Shigeyuki - Utsunomiya JP
Uzawa; Shigeyuki - Utsunomiya-shi JP
Uzawa; Shigeyuki - Tokyo JP
Uzawa; Shigeyuki - Naka-machi JP
Uzawa; Shigeyuki - Nakamachi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Optical element positioning apparatus, projection optical system and exposure apparatus Grant 7,948,695 - Nawata , et al. May 24, 2	2011-05-24
Optical Element Positioning Apparatus, Projection Optical System and Exposure Apparatus App 20100321803 - Nawata; Ryo ; et al.	2010-12-23
Optical element positioning apparatus, projection optical system and exposure apparatus Grant 7,821,726 - Nawata , et al. October 26, 2	2010-10-26
Exposure apparatus, pressure control method for the same, and device manufacturing method Grant 7,525,106 - Imoto , et al. April 28, 2	2009-04-28
Optical Element Positioning Apparatus, Projection Optical System And Exposure Apparatus App 20090021847 - Nawata; Ryo ; et al.	2009-01-22
Exposure Apparatus, Pressure Control Method For The Same, And Device Manufacturing Method App 20080073571 - IMOTO; Kouhei ; et al.	2008-03-27
Surface position detecting system and method Grant 7,166,855 - Yamada , et al. January 23, 2	2007-01-23
Scanning exposure apparatus and device manufacturing method Grant 6,963,075 - Yamada , et al. November 8, 2	2005-11-08
Exposure apparatus, device manufacturing method, semiconductor manufacturing plant and method of maintaining exposure apparatus Grant 6,864,953 - Uzawa March 8, 2	2005-03-08
Projection exposure apparatus, and device manufacturing method which compensate for a change in optical performance of a projection optical system Grant 6,614,503 - Uzawa September 2, 2	2003-09-02
Surface position detecting method App 20030132401 - Yamada, Yuichi ; et al.	2003-07-17
Surface position detecting method having a detection timing determination Grant 6,559,465 - Yamada , et al. May 6, 2	2003-05-06
Driving apparatus and exposure apparatus Grant 6,493,062 - Tokuda , et al. December 10, 2	2002-12-10
Surface position detecting method App 20020085757 - Yamada, Yuichi ; et al.	2002-07-04
Driving Apparatus And Exposure Apparatus App 20020054280 - TOKUDA, YUKIO ; et al.	2002-05-09
Exposure apparatus, coating/developing system, device manufacturing system, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method App 20020011207 - Uzawa, Shigeyuki ; et al.	2002-01-31
Exposure apparatus, exposure method, and device manufacturing method employing the exposure method Grant 6,342,703 - Koga , et al. January 29, 2	2002-01-29
Projection Exposure Apparatus And Method Of Controlling Same App 20020001082 - AKIMOTO, SATOSHI ; et al.	2002-01-03
Aligning method Grant 6,333,786 - Uzawa , et al. December 25, 2	2001-12-25
Exposure Method And Exposure Apparatus App 20010050761 - UZAWA, SHIGEYUKI	2001-12-13
Exposure apparatus, device manufacturing method, semiconductor manufacturing plant and method of maintaining exposure apparatus App 20010048084 - Uzawa, Shigeyuki	2001-12-06
Substrate holding apparatus, substrate transfer system, exposure apparatus, coating apparatus, method for making a device, and method for cleaning a substrate holding section Grant 6,307,620 - Takabayashi , et al. October 23, 2	2001-10-23
Surface position detecting system and method App 20010020687 - Yamada, Yuichi ; et al.	2001-09-13
Surface position detecting system and method App 20010019111 - Yamada, Yuichi ; et al.	2001-09-06
Alignment method and alignment system Grant 5,986,766 - Koga , et al. November 16, 1	1999-11-16
Projection exposure method and apparatus in which scanning exposure is performed in accordance with a shot layout of mask patterns Grant 5,793,471 - Kanda , et al. August 11, 1	1998-08-11
Alignment for layer formation through determination of target values for translation, rotation and magnification Grant 5,783,341 - Uzawa July 21, 1	1998-07-21
Exposure apparatus and method wherein alignment is carried out by comparing marks which are incident on both reticle stage and wafer stage reference plates Grant 5,751,404 - Murakami , et al. May 12, 1	1998-05-12
Alignment method and semiconductor exposure method Grant 5,695,897 - Mitome , et al. December 9, 1	1997-12-09
Alignment method Grant 5,585,925 - Sato , et al. December 17, 1	1996-12-17
Aligning method utilizing reliability weighting coefficients Grant 5,543,921 - Uzawa , et al. August 6, 1	1996-08-06
Alignment method and alignment system Grant 5,499,099 - Sato , et al. March 12, 1	1996-03-12

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