loadpatents
name:-0.012171983718872
name:-0.0089161396026611
name:-0.0026388168334961
Utsumi; Takao Patent Filings

Utsumi; Takao

Patent Applications and Registrations

Patent applications and USPTO patent grants for Utsumi; Takao.The latest application filed is for "low energy e-beam contact printing lithography".

Company Profile
4.9.14
  • Utsumi; Takao - Tokyo N/A JP
  • Utsumi; Takao - Watchung JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Low energy e-beam contact printing lithography
Grant 10,950,441 - Utsumi March 16, 2
2021-03-16
Low Energy E-beam Contact Printing Lithography
App 20210066072 - Utsumi; Takao
2021-03-04
Low Energy E-beam Contact Printing Lithography
App 20210060924 - Utsumi; Takao
2021-03-04
Low energy electron beam lithography
Grant 9,557,658 - Utsumi January 31, 2
2017-01-31
Low Energy Electron Beam Lithography
App 20160274474 - Utsumi; Takao
2016-09-22
Low energy electron beam lithography
App 20150146179 - Utsumi; Takao
2015-05-28
Electron beam proximity exposure apparatus and mask unit therefor
Grant 6,894,295 - Shimazu , et al. May 17, 2
2005-05-17
Electron beam proximity exposure apparatus and method
Grant 6,727,507 - Shimazu , et al. April 27, 2
2004-04-27
Mask inspecting apparatus
Grant 6,717,157 - Utsumi April 6, 2
2004-04-06
Electron beam proximity exposure apparatus
Grant 6,703,623 - Shimazu , et al. March 9, 2
2004-03-09
Electron beam proximity exposure apparatus
App 20040026634 - Utsumi, Takao ;   et al.
2004-02-12
Mask Inspecting Apparatus
App 20040004195 - Utsumi, Takao
2004-01-08
Electron beam proximity exposure apparatus and method
App 20020096646 - Shimazu, Nobuo ;   et al.
2002-07-25
Electron beam proximity exposure apparatus and mask unit therefor
App 20020070356 - Shimazu, Nobuo ;   et al.
2002-06-13
Manufacturing method of mask for electron beam proximity exposure and mask
App 20020071994 - Shimazu, Nobuo ;   et al.
2002-06-13
Manufacturing method of mask for electron beam proximity exposure and mask
App 20020070354 - Shimazu, Nobuo ;   et al.
2002-06-13
Low energy electron beam lithography
Grant 5,831,272 - Utsumi November 3, 1
1998-11-03

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.

© 2024 USPTO.report | Privacy Policy | Resources | RSS Feed of Trademarks | Trademark Filings Twitter Feed