loadpatents
Patent applications and USPTO patent grants for Utsumi; Takao.The latest application filed is for "low energy e-beam contact printing lithography".
Patent | Date |
---|---|
Low energy e-beam contact printing lithography Grant 10,950,441 - Utsumi March 16, 2 | 2021-03-16 |
Low Energy E-beam Contact Printing Lithography App 20210066072 - Utsumi; Takao | 2021-03-04 |
Low Energy E-beam Contact Printing Lithography App 20210060924 - Utsumi; Takao | 2021-03-04 |
Low energy electron beam lithography Grant 9,557,658 - Utsumi January 31, 2 | 2017-01-31 |
Low Energy Electron Beam Lithography App 20160274474 - Utsumi; Takao | 2016-09-22 |
Low energy electron beam lithography App 20150146179 - Utsumi; Takao | 2015-05-28 |
Electron beam proximity exposure apparatus and mask unit therefor Grant 6,894,295 - Shimazu , et al. May 17, 2 | 2005-05-17 |
Electron beam proximity exposure apparatus and method Grant 6,727,507 - Shimazu , et al. April 27, 2 | 2004-04-27 |
Mask inspecting apparatus Grant 6,717,157 - Utsumi April 6, 2 | 2004-04-06 |
Electron beam proximity exposure apparatus Grant 6,703,623 - Shimazu , et al. March 9, 2 | 2004-03-09 |
Electron beam proximity exposure apparatus App 20040026634 - Utsumi, Takao ;   et al. | 2004-02-12 |
Mask Inspecting Apparatus App 20040004195 - Utsumi, Takao | 2004-01-08 |
Electron beam proximity exposure apparatus and method App 20020096646 - Shimazu, Nobuo ;   et al. | 2002-07-25 |
Electron beam proximity exposure apparatus and mask unit therefor App 20020070356 - Shimazu, Nobuo ;   et al. | 2002-06-13 |
Manufacturing method of mask for electron beam proximity exposure and mask App 20020071994 - Shimazu, Nobuo ;   et al. | 2002-06-13 |
Manufacturing method of mask for electron beam proximity exposure and mask App 20020070354 - Shimazu, Nobuo ;   et al. | 2002-06-13 |
Low energy electron beam lithography Grant 5,831,272 - Utsumi November 3, 1 | 1998-11-03 |
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