Usui; Yuki

Patent Applications and Registrations

Patent applications and USPTO patent grants for Usui; Yuki.The latest application filed is for "substrates coated with selective cell separation or cell culture polymers".

Company Profile

12.20.28

Usui; Yuki - Toyama JP
USUI; Yuki - Toyama-shi JP
Usui; Yuki - Matsumoto N/A JP
Usui; Yuki - Ibaraki JP
Usui; Yuki - Matsumoto-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Composition for forming a coating film for removing foreign matters Grant 11,319,514 - Kishioka , et al. May 3, 2	2022-05-03
Resist underlayer film forming composition which contains compound having glycoluril skeleton as additive Grant 11,131,928 - Usui , et al. September 28, 2	2021-09-28
Compositions for forming a protective film against basic aqueous hydrogen peroxide solution, and pattern formation method Grant 11,003,078 - Ohashi , et al. May 11, 2	2021-05-11
Substrates Coated With Selective Cell Separation Or Cell Culture Polymers App 20210130788 - KITANO; Hiromi ; et al.	2021-05-06
Composition For Forming Resist Underlayer Film And Method For Forming Resist Pattern Using Same App 20210024689 - OGATA; Hiroto ; et al.	2021-01-28
Composition for forming resist underlayer film and method for forming resist pattern using same Grant 10,844,167 - Ogata , et al. November 24, 2	2020-11-24
Resin Composition For Insulating Film App 20200347226 - OHASHI; Takuya ; et al.	2020-11-05
Resist Underlayer Film Forming Composition Containing Compound Having Hydantoin Ring App 20200201183 - OGATA; Hiroto ; et al.	2020-06-25
Resist Underlayer Film-forming Composition App 20200192224 - OGATA; Hiroto ; et al.	2020-06-18
Composition For Forming A Coating Film For Removing Foreign Matters App 20200140792 - KISHIOKA; Takahiro ; et al.	2020-05-07
Resist Underlying Film-forming Composition Containing An Amide Group-containing Polyester App 20200041905 - TAMURA; Mamoru ; et al.	2020-02-06
Cationically polymerizable resist underlayer film-forming composition Grant 10,437,151 - Ogata , et al. O	2019-10-08
Composition For Forming Resist Underlayer Film And Method For Forming Resist Pattern Using Same App 20190177475 - OGATA; Hiroto ; et al.	2019-06-13
Composition For Forming Protective Film Including Specific Crosslinking Agent, And Pattern Formation Method In Which Same Is Use App 20190163064 - OHASHI; Tomoya ; et al.	2019-05-30
Resist Underlayer Film Forming Composition Which Contains Compound Having Glycoluril Skeleton As Additive App 20190086806 - USUI; Yuki ; et al.	2019-03-21
Cationically Polymerizable Resist Underlayer Film-forming Composition App 20180081274 - OGATA; Hiroto ; et al.	2018-03-22
Light-degradable material, substrate, and method for patterning the substrate Grant 9,822,330 - Kishioka , et al. November 21, 2	2017-11-21
Pattern forming method using resist underlayer film Grant 9,793,131 - Ohashi , et al. October 17, 2	2017-10-17
Resist underlayer film-forming composition containing copolymer that has triazine ring and sulfur atom in main chain Grant 9,678,427 - Ogata , et al. June 13, 2	2017-06-13
Resist Underlayer Film-forming Composition Containing Copolymer That Has Triazine Ring And Sulfur Atom In Main Chain App 20170038687 - OGATA; Hiroto ; et al.	2017-02-09
Composition for forming organic hard mask layer for use in lithography containing polymer having acrylamide structure Grant 9,514,949 - Someya , et al. December 6, 2	2016-12-06
Pattern Forming Method Using Resist Underlayer Film App 20160218013 - OHASHI; Tomoya ; et al.	2016-07-28
Organic silicon compound and silane coupling agent containing the same Grant 9,340,561 - Umezaki , et al. May 17, 2	2016-05-17
Compressed fiber structural material and method for producing the same Grant 9,320,602 - Nakayama , et al. April 26, 2	2016-04-26
Light-degradable Material, Substrate, And Method For Patterning The Substrate App 20150267159 - Kishioka; Takahiro ; et al.	2015-09-24
Application of soybean emulsion composition to soybean-derived raw material-containing food or beverage Grant 9,101,158 - Samoto , et al. August 11, 2	2015-08-11
Monolayer or multilayer forming composition Grant 9,023,583 - Kishioka , et al. May 5, 2	2015-05-05
Organic Silicon Compound And Silane Coupling Agent Containing The Same App 20140370182 - Umezaki; Makiko ; et al.	2014-12-18
Compressed Fiber Structural Material And Method For Producing The Same App 20140336779 - Nakayama; Noboru ; et al.	2014-11-13
Novel Application Of Soybean Emulsion Composition To Soybean-derived Raw Material-containing Food Or Beverage App 20140113013 - Samoto; Masahiko ; et al.	2014-04-24
Composition For Forming Organic Hard Mask Layer For Use In Lithography Containing Polymer Having Acrylamide Structure App 20140106570 - Someya; Yasunobu ; et al.	2014-04-17
Photosensitive resist underlayer film forming composition Grant 8,685,615 - Kimura , et al. April 1, 2	2014-04-01
Photosensitive Organic Particles App 20140045119 - Kishioka; Takahiro ; et al.	2014-02-13
Monolayer Or Multilayer Forming Composition App 20130216956 - Kishioka; Takahiro ; et al.	2013-08-22
Composition For Formation Of Photosensitive Resist Underlayer Film And Method For Formation Of Resist Pattern App 20120288795 - Umezaki; Makiko ; et al.	2012-11-15
Photosensitive Resist Underlayer Film Forming Composition App 20110311915 - Kimura; Shigeo ; et al.	2011-12-22

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