Usui; Youichi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Usui; Youichi.The latest application filed is for "mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive ma".

Company Profile

4.7.7

Usui; Youichi - Tokyo JP
Usui; Youichi - Shinjuku-ku JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication method Grant 10,620,527 - Hamamoto , et al.	2020-04-14
Mask Blank Substrate, Substrate With Multilayer Reflection Film, Transmissive Mask Blank, Reflective Mask Blank, Transmissive Ma App 20190361337 - HAMAMOTO; Kazuhiro ; et al.	2019-11-28
Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication method Grant 10,429,728 - Hamamoto , et al. O	2019-10-01
Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method Grant 10,295,900 - Orihara , et al.	2019-05-21
Mask Blank Substrate, Substrate With Multilayer Reflection Film, Transmissive Mask Blank, Reflective Mask, And Semiconductor Device Fabrication Method App 20180275507 - ORIHARA; Toshihiko ; et al.	2018-09-27
Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method Grant 10,001,699 - Orihara , et al. June 19, 2	2018-06-19
Mask Blank Substrate, Substrate With Multilayer Reflection Film, Transmissive Mask Blank, Reflective Mask Blank, Transmissive Mask, Reflective Mask, And Semiconductor Device Fabrication Method App 20180081264 - HAMAMOTO; Kazuhiro ; et al.	2018-03-22
Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication method Grant 9,897,909 - Hamamoto , et al. February 20, 2	2018-02-20
Mask Blank Substrate, Substrate With Multilayer Reflection Film, Transmissive Mask Blank, Reflective Mask Blank, Transmissive Mask, Reflective Mask, And Semiconductor Device Fabrication Method App 20170023853 - HAMAMOTO; Kazuhiro ; et al.	2017-01-26
Mask Blank Substrate, Substrate With Multilayer Reflection Film, Transmissive Mask Blank, Reflective Mask, And Semiconductor Device Fabrication Method App 20170010527 - ORIHARA; Toshihiko ; et al.	2017-01-12
Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method Grant 9,494,851 - Orihara , et al. November 15, 2	2016-11-15
Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication method Grant 9,348,217 - Hamamoto , et al. May 24, 2	2016-05-24
Mask Blank Substrate, Substrate With Multilayer Reflection Film, Transmissive Mask Blank, Reflective Mask, And Semiconductor Device Fabrication Method App 20150017574 - Orihara; Toshihiko ; et al.	2015-01-15
Mask Blank Substrate, Substrate With Multilayer Reflection Film, Transmissive Mask Blank, Reflective Mask Blank, Transmissive Mask, Reflective Mask, And Semiconductor Device Fabrication Method App 20140329174 - Hamamoto; Kazuhiro ; et al.	2014-11-06

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