Usman Ibrahim; Sheik Ansar

Patent Applications and Registrations

Patent applications and USPTO patent grants for Usman Ibrahim; Sheik Ansar.The latest application filed is for "chemical mechanical polishing composition".

Company Profile

7.9.17

Usman Ibrahim; Sheik Ansar - Heverlee BE
USMAN IBRAHIM; Sheik Ansar - Waterloo BE
Usman Ibrahim; Sheik Ansar - Potsdam NY

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates Grant 11,286,402 - Reichardt , et al. March 29, 2	2022-03-29
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates Grant 11,264,250 - Reichardt , et al. March 1, 2	2022-03-01
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substrates Grant 10,899,945 - Reichardt , et al. January 26, 2	2021-01-26
Chemical Mechanical Polishing Composition App 20200299547 - DAESCHLEIN; Christian ; et al.	2020-09-24
Use Of A Chemical Mechanical Polishing (cmp) Composition For Polishing Of Cobalt And / Or Cobalt Alloy Comprising Substrates App 20200294813 - REICHARDT; Robert ; et al.	2020-09-17
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates Grant 10,738,219 - Reichardt , et al. A	2020-08-11
Chemical mechanical polishing (CMP) composition Grant 10,570,316 - Reichardt , et al. Feb	2020-02-25
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates Grant 10,385,236 - Reichardt , et al. A	2019-08-20
Chemical mechanical polishing (CMP) composition for high effective polishing of substrates comprising germanium Grant 10,227,506 - Siebert , et al.	2019-03-12
Use Of A Chemical Mechanical Polishing (cmp) Composition For Polishing Of Cobalt Comprising Substrates App 20180230333 - REICHARDT; Robert ; et al.	2018-08-16
Use Of A Chemical Mechanical Polishing (cmp) Composition For Polishing Of Cobalt And / Or Cobalt Alloy Comprising Substrates App 20180016468 - REICHARDT; Robert ; et al.	2018-01-18
Chemical Mechanical Polishing (cmp) Composition For High Effective Polishing Of Substrates Comprising Germanium App 20170369743 - SIEBERT; Max ; et al.	2017-12-28
Use Of A Chemical Mechanical Polishing (cmp) Composition For Polishing Of Cobalt And / Or Cobalt Alloy Comprising Substrates App 20170369741 - REICHARDT; Robert ; et al.	2017-12-28
Use Of A Chemical Mechanical Polishing (cmp) Composition For Polishing Of Cobalt And / Or Cobalt Alloy Comprising Substrates App 20170362464 - REICHARDT; Robert ; et al.	2017-12-21
Chemical Mechanical Polishing (cmp) Composition App 20170158913 - REICHARDT; Robert ; et al.	2017-06-08
Chemical mechanical polishing composition comprising polyvinyl phosphonic acid and its derivatives Grant 9,487,675 - Raman , et al. November 8, 2	2016-11-08
Cmp Composition Comprising Abrasive Particles Containing Ceria App 20160160083 - LAUTER; Michael ; et al.	2016-06-09
Chemical Mechanical Polishing Composition Comprising Polyvinyl Phosphonic Acid And Its Derivatives App 20150159050 - Raman; Vijay Immanuel ; et al.	2015-06-11
Aqueous Polishing Composition And Process For Chemically Mechanically Polishing Substrates For Electrical, Mechanical And Optical Devices App 20130200038 - Li; Yuzhuo ; et al.	2013-08-08
Aqueous Polishing Compositions Containing N-substituted Diazenium Dioxides And/or N'-hydroxy-diazenium Oxide Salts App 20130200039 - Noller; Bastian ; et al.	2013-08-08
Aqueous Polishing Composition And Process For Chemically Mechanically Polishing Substrate Materials For Electrical, Mechanical And Optical Devices App 20130161285 - Li; Yuzhuo ; et al.	2013-06-27

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