Ushirogouchi; Toru

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ushirogouchi; Toru.The latest application filed is for "method and system for removing carbon dioxide from exhaust gas by utilizing seawater".

Company Profile

0.40.33

Ushirogouchi; Toru - Yokohama-shi JP
Ushirogouchi; Toru - Yokohama JP
Ushirogouchi; Toru - Kanagawa-ken JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method And System For Removing Carbon Dioxide From Exhaust Gas By Utilizing Seawater App 20130276631 - SANO; Kenji ; et al.	2013-10-24
Method and system for removing carbon dioxide from exhaust gas by utilizing seawater Grant 8,486,182 - Sano , et al. July 16, 2	2013-07-16
Method And System For Removing Carbon Dioxide From Exhaust Gas By Utilizing Seawater App 20110300043 - SANO; Kenji ; et al.	2011-12-08
Ink Jet Recording Apparatus App 20110122177 - HIROKI; Masashi ; et al.	2011-05-26
Ink jet recording apparatus Grant 7,896,484 - Hiroki , et al. March 1, 2	2011-03-01
Photosensitive inkjet ink Grant 7,858,670 - Akiyama , et al. December 28, 2	2010-12-28
Inkjet ink Grant 7,803,851 - Ishibashi , et al. September 28, 2	2010-09-28
Pigment dispersion, precursor of ink for UV-curing type ink-jet recording, method of ink-jet recording, printed matter, and method of manufacturing pigment dispersion Grant 7,754,785 - Ushirogouchi , et al. July 13, 2	2010-07-13
Inkjet ink composition and printed matters created using inkjet ink composition Grant 7,579,390 - Ushirogouchi , et al. August 25, 2	2009-08-25
Liquid ink and recording apparatus Grant 7,500,745 - Ushirogouchi , et al. March 10, 2	2009-03-10
Photosensitive inkjet ink Grant 7,473,720 - Akiyama , et al. January 6, 2	2009-01-06
Pigment dispersion, precursor of ink for UV-curing type ink-jet recording, method of ink-jet recording, printed matter, and method of manufacturing pigment dispersion Grant 7,439,281 - Ushirogouchi , et al. October 21, 2	2008-10-21
Pigment dispersion, precursor of ink for uv-curing type ink-jet recording, method of ink-jet recording, printed matter, and method of manufacturing pigment dispersion App 20080242773 - Ushirogouchi; Toru ; et al.	2008-10-02
Washing solution for inkjet printer head and washing method using the solution Grant 7,425,525 - Akiyama , et al. September 16, 2	2008-09-16
Ink for ink jet and ink jet recording apparatus Grant 7,417,074 - Hiroki , et al. August 26, 2	2008-08-26
Liquid ink and recording apparatus Grant 7,387,380 - Ushirogouchi , et al. June 17, 2	2008-06-17
Inkjet ink Grant 7,375,145 - Akiyama , et al. May 20, 2	2008-05-20
Inkjet ink App 20070270520 - Akiyama; Ryozo ; et al.	2007-11-22
Processed pigments, pigment-dispersed solution, ink for ink jet, manufacturing method of processed pigments and manufacturing method of pigment-dispersed solution Grant 7,285,581 - Akiyama , et al. October 23, 2	2007-10-23
Photosensitive Composition App 20070202437 - Ishibashi; Mitsuru ; et al.	2007-08-30
Photosensitive Inkjet Ink App 20070185224 - Akiyama; Ryozo ; et al.	2007-08-09
Inkjet ink App 20070101898 - Akiyama; Ryozo ; et al.	2007-05-10
Process for producing a semiconductor device Grant 7,163,781 - Okino , et al. January 16, 2	2007-01-16
Liquid ink and recording apparatus App 20060274135 - Ushirogouchi; Toru ; et al.	2006-12-07
Liquid ink and recording apparatus App 20060274136 - Ushirogouchi; Toru ; et al.	2006-12-07
Liquid ink and recording apparatus Grant 7,125,112 - Ushirogouchi , et al. October 24, 2	2006-10-24
Resist resin Grant 7,119,156 - Okino , et al. October 10, 2	2006-10-10
Liquid ink and recording apparatus Grant 7,108,367 - Ushirogouchi , et al. September 19, 2	2006-09-19
Inkjet ink App 20060189715 - Ishibashi; Mitsuru ; et al.	2006-08-24
Dispersion, inkjet ink, method of manufacturing dispersion, method of manufacturing inkjet ink, and printed matter App 20060189716 - Ushirogouchi; Toru ; et al.	2006-08-24
Pattern forming process Grant 7,070,905 - Okino , et al. July 4, 2	2006-07-04
Resist resin Grant 7,063,932 - Okino , et al. June 20, 2	2006-06-20
Exposure-curing method of photo-cure type ink and inkjet recording apparatus App 20060114305 - Ohtsu; Kazuhiko ; et al.	2006-06-01
Resist composition Grant 7,029,823 - Okino , et al. April 18, 2	2006-04-18
Inkjet ink composition and printed matters created using inkjet ink composition App 20060025497 - Ushirogouchi; Toru ; et al.	2006-02-02
Curing method of cure type liquid composition and inkjet recording apparatus App 20060021537 - Ohtsu; Kazuhiko ; et al.	2006-02-02
Inkjet ink, printed matters, and inkjet recording method App 20060023043 - Ishibashi; Mitsuru ; et al.	2006-02-02
Washing solution for inkjet printer head and washing method using the solution App 20060017769 - Akiyama; Ryozo ; et al.	2006-01-26
High Molecular Compound, Monomer Compounds And Photosensitive Composition For Photoresist, Pattern Forming Method Utilizing Photosensitive Composition, And Method Of Manufacturing Electronic Components Grant 6,974,658 - Shida , et al. December 13, 2	2005-12-13
Liquid ink and recording apparatus Grant 6,959,986 - Ushirogouchi , et al. November 1, 2	2005-11-01
Liquid ink and recording apparatus App 20050168556 - Ushirogouchi, Toru ; et al.	2005-08-04
Liquid ink and recording apparatus App 20050168553 - Ushirogouchi, Toru ; et al.	2005-08-04
Inkjet ink App 20050113476 - Akiyama, Ryozo ; et al.	2005-05-26
Pigment dispersion, precursor of ink for UV-curing type ink-jet recording, method of ink-jet recording, printed matter, and method of manufacturing pigment dispersion App 20050090582 - Ushirogouchi, Toru ; et al.	2005-04-28
Ink for ink jet and ink jet recording apparatus App 20050057630 - Hiroki, Masashi ; et al.	2005-03-17
Resist resin App 20050048400 - Okino, Takeshi ; et al.	2005-03-03
Resist resin App 20050037283 - Okino, Takeshi ; et al.	2005-02-17
Resist composition App 20050037284 - Okino, Takeshi ; et al.	2005-02-17
Pattern forming process App 20050031990 - Okino, Takeshi ; et al.	2005-02-10
Process for producing a semiconductor device App 20050031991 - Okino, Takeshi ; et al.	2005-02-10
Processed pigments, pigment-dispersed solution, ink for ink jet, manufacturing method of processed pigments and manufacturing method of pigment-dispersed solution App 20040259976 - Akiyama, Ryozo ; et al.	2004-12-23
Resin useful for resist, resist composition and pattern forming process using the same Grant 6,824,957 - Okino , et al. November 30, 2	2004-11-30
Resin useful for resist, resist composition and pattern forming process using the same App 20040043324 - Okino, Takeshi ; et al.	2004-03-04
High molecular compound, monomer compounds and photosensitive composition for photoresist, pattern forming method utilizing photosensitive composition, and method of manufacturing electronic components App 20030235781 - Shida, Naomi ; et al.	2003-12-25
Liquid ink and recording apparatus App 20030231234 - Ushirogouchi, Toru ; et al.	2003-12-18
Resin useful for resist, resist composition and pattern forming process using the same Grant 6,660,450 - Okino , et al. December 9, 2	2003-12-09
Photosensitive composition Grant RE38,256 - Ushirogouchi , et al. September 23, 2	2003-09-23
Resin useful for resist, resist composition and pattern forming process using the same App 20030149225 - Okino, Takeshi ; et al.	2003-08-07
Resin useful for resist, resist composition and pattern forming process using the same Grant 6,541,597 - Okino , et al. April 1, 2	2003-04-01
Polymeric compound and resin composition for photoresist Grant 6,440,636 - Ushirogouchi , et al. August 27, 2	2002-08-27
Resin useful for resist, resist composition and pattern forming process using the same App 20020098441 - Okino, Takeshi ; et al.	2002-07-25
Resin useful for resist, resist composition and pattern forming process using the same Grant 6,303,266 - Okino , et al. October 16, 2	2001-10-16
Photosensitive composition, method for forming pattern using the same, and method for manufacturing electronic parts Grant 6,280,897 - Asakawa , et al. August 28, 2	2001-08-28
Photo-sensitive material, method of forming a resist pattern and manufacturing an electronic parts using photo-sensitive material Grant 6,228,552 - Okino , et al. May 8, 2	2001-05-08
Pattern forming process and a photosensitive composition Grant 6,190,841 - Kihara , et al. February 20, 2	2001-02-20
Transparent resin, photosensitive composition, and method of forming a pattern Grant 6,071,670 - Ushirogouchi , et al. June 6, 2	2000-06-06
Photosensitive material Grant 6,060,207 - Shida , et al. May 9, 2	2000-05-09
Method of forming a pattern using polysilane Grant 6,025,117 - Nakano , et al. February 15, 2	2000-02-15
Resist for alkali development Grant 5,932,391 - Ushirogouchi , et al. August 3, 1	1999-08-03
Photosensitive composition Grant 5,691,101 - Ushirogouchi , et al. November 25, 1	1997-11-25
Pattern forming method Grant 5,372,914 - Naito , et al. December 13, 1	1994-12-13
Polysilane compound and photosensitive composition Grant 4,871,646 - Hayase , et al. October 3, 1	1989-10-03