Ushikawa; Harunori

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ushikawa; Harunori.The latest application filed is for "method for the formation of co film and method for the formation of cu interconnection film".

Company Profile

1.25.16

Ushikawa; Harunori - Shizuoka N/A JP
Ushikawa; Harunori - Shizuoka-ken JP
Ushikawa, Harunori - Tokyo JP
Ushikawa; Harunori - Sagamihara JP
Ushikawa; Harunori - Gunma JP
Ushikawa; Harunori - Kofu JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method for forming NiSi film, method for forming silicide film, method for forming metal film for use in silicide-annealing, apparatus for vacuum processing and film-forming apparatus Grant 8,815,737 - Higuchi , et al. August 26, 2	2014-08-26
Method for the formation of Co film and method for the formation of Cu interconnection film Grant 8,809,193 - Kumamoto , et al. August 19, 2	2014-08-19
Method for forming tantalum nitride film Grant 8,796,142 - Gonohe , et al. August 5, 2	2014-08-05
Method for forming Ni film Grant 8,669,191 - Uehigashi , et al. March 11, 2	2014-03-11
Method for forming Cu electrical interconnection film Grant 8,476,161 - Kumamoto , et al. July 2, 2	2013-07-02
Purge gas assembly Grant 8,377,207 - Kagami , et al. February 19, 2	2013-02-19
Method For The Formation Of Co Film And Method For The Formation Of Cu Interconnection Film App 20130023116 - Kumamoto; Shoichiro ; et al.	2013-01-24
Method For Forming Ni Film App 20120264310 - Uehigashi; Toshimitsu ; et al.	2012-10-18
Method For Forming Nisi Film, Method For Forming Silicide Film, Method For Forming Metal Film For Use In Silicide-annealing, Apparatus For Vacuum Processing And Film-forming Apparatus App 20120244701 - Higuchi; Yasushi ; et al.	2012-09-27
Method for forming tantalum nitride film Grant 8,158,198 - Gonohe , et al. April 17, 2	2012-04-17
Method for forming tantalum nitride film Grant 8,158,197 - Gonohe , et al. April 17, 2	2012-04-17
Method for forming tantalum nitride film Grant 8,105,468 - Gonohe , et al. January 31, 2	2012-01-31
Method For Forming Tantalum Nitride Film And Film-forming Apparatus For Forming The Same App 20110318505 - Yamamoto; Akiko ; et al.	2011-12-29
Method For Forming Cu Electrical Interconnection Film App 20110104890 - Kumamoto; Shoichiro ; et al.	2011-05-05
Method for Forming Tantalum Nitride Film App 20100206716 - Gonohe; Narishi ; et al.	2010-08-19
Purge Gas Assembly App 20100139556 - Kagami; Tsuyoshi ; et al.	2010-06-10
Method For Forming Tantalum Nitride Film App 20090246375 - Gonohe; Narishi ; et al.	2009-10-01
Method for Forming Tantalum Nitride Film App 20090159430 - Gonohe; Narishi ; et al.	2009-06-25
Method for Forming Tantalum Nitride Film App 20090162565 - Gonohe; Narishi ; et al.	2009-06-25
Method for Forming Tantalum Nitride Film App 20090159431 - Gonohe; Narishi ; et al.	2009-06-25
Method for Forming Tantalum Nitride Film App 20090104775 - Gonohe; Narishi ; et al.	2009-04-23
Method for Forming Cu Film App 20090078580 - Yoshihama; Tomoyuki ; et al.	2009-03-26
Method for Forming Tantalum Nitride Film App 20080199601 - Gonohe; Narishi ; et al.	2008-08-21
Capacitor for analog circuit, and manufacturing method thereof App 20020160577 - Hosoda, Keizo ; et al.	2002-10-31
Method and device for treating semiconductor with treating gas while substrate is heated Grant 6,140,256 - Ushikawa October 31, 2	2000-10-31
Single-substrate-processing apparatus in semiconductor processing system Grant 6,007,633 - Kitamura , et al. December 28, 1	1999-12-28
Transfer apparatus, transfer method, treatment apparatus and treatment method Grant 5,984,607 - Oosawa , et al. November 16, 1	1999-11-16
Heating device, method of manufacturing the same, and processing apparatus using the same Grant 5,904,872 - Arami , et al. May 18, 1	1999-05-18
Heat treatment process for preventing slips in semiconductor wafers Grant 5,775,889 - Kobayashi , et al. July 7, 1	1998-07-07
Processing apparatus Grant 5,536,320 - Ushikawa , et al. July 16, 1	1996-07-16
Treating device Grant 5,378,283 - Ushikawa January 3, 1	1995-01-03
Heat treatment apparatus having a wafer boat Grant 5,310,339 - Ushikawa May 10, 1	1994-05-10
Method of forming a phosphorus doped silicon film Grant 5,225,378 - Ushikawa July 6, 1	1993-07-06
Method of forming semiconductor film Grant 5,116,784 - Ushikawa May 26, 1	1992-05-26

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