Urano; Fumiyoshi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Urano; Fumiyoshi.The latest application filed is for "bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition".

Company Profile

0.17.2

Urano; Fumiyoshi - Saitama JP
Urano; Fumiyoshi - Niiza JP
Urano; Fumiyoshi - Kawagoe JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition Grant 7,374,857 - Maesawa , et al. May 20, 2	2008-05-20
Diazodisulfones Grant RE40,211 - Urano , et al. April 1, 2	2008-04-01
Resist compositions Grant 7,312,014 - Maesawa , et al. December 25, 2	2007-12-25
Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition App 20050038261 - Maesawa, Tsuneaki ; et al.	2005-02-17
Resist compositions App 20040170918 - Maesawa, Tsuneaki ; et al.	2004-09-02
Sulfonium salt compounds Grant 6,723,483 - Oono , et al. April 20, 2	2004-04-20
Resist composition Grant 6,656,660 - Urano , et al. December 2, 2	2003-12-02
Agent for reducing substrate dependence Grant 6,586,152 - Urano , et al. July 1, 2	2003-07-01
Polymer composition and resist material Grant 5,976,759 - Urano , et al. November 2, 1	1999-11-02
Resist composition for deep ultraviolet light Grant 5,695,910 - Urano , et al. December 9, 1	1997-12-09
Process for forming a pattern on a semiconductor substrate using a deep ultraviolet absorbent composition Grant 5,677,112 - Urano , et al. October 14, 1	1997-10-14
Pattern formation process Grant 5,670,299 - Urano , et al. September 23, 1	1997-09-23
Resist material Grant 5,558,971 - Urano , et al. September 24, 1	1996-09-24
Pattern formation method Grant 5,558,976 - Urano , et al. September 24, 1	1996-09-24
Anthracene derivatives Grant 5,498,748 - Urano , et al. March 12, 1	1996-03-12
Resist material and pattern formation process Grant 5,468,589 - Urano , et al. November 21, 1	1995-11-21
Negative working resist composition Grant 5,389,491 - Tani , et al. February 14, 1	1995-02-14
Chemical amplified resist material containing photosensitive compound capable of generating an acid and specific polystyrene copolymer having functional groups that become alkali-soluble under an acid atmosphere Grant 5,350,660 - Urano , et al. September 27, 1	1994-09-27
Pattern forming contrast enhanced material utilizing water soluble photosensitive diazo compound and pattern forming method Grant 5,272,036 - Tani , et al. December 21, 1	1993-12-21

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