UP CHEMICAL CO., LTD.

Patent Applications and Registrations

Patent applications and USPTO patent grants for UP CHEMICAL CO., LTD..The latest application filed is for "silicon precursor compound, preparation method therefor, and silicon-containing film formation method using same".

Company Profile

6.22.16

UP CHEMICAL CO., LTD. -
UP CHEMICAL CO., LTD. - Pyeongtaek-si KR
UP CHEMICAL CO., LTD. - Pyeongtaek-si, Gyeonggi-do N/A KR
UP CHEMICAL CO., LTD. - Gyeonggi-do KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Silicon Precursor Compound, Preparation Method Therefor, And Silicon-containing Film Formation Method Using Same App 20210269463 - KIM; Jin Sik ; et al.	2021-09-02
Aluminum Compounds And Methods Of Forming Aluminum- Containing Film Using The Same App 20210147450 - HAN; Won Seok ; et al.	2021-05-20
Group 4 Metal Element-containing Compounds, Method Of Preparing The Same, Precursor Compositions Including The Same For Forming A Film, And Method Of Forming A Film Using The Same App 20200361969 - HAN; Won Seok ; et al.	2020-11-19
Liquid precursor compositions, preparation methods thereof, and methods for forming layer using the composition Grant 10,763,001 - Han , et al. Sep	2020-09-01
Group 5 metal compound, method for preparing the same, precursor composition for depositing layer containing the same, and method for depositing layer using the same Grant 10,577,385 - Han , et al.	2020-03-03
Group 5 Metal Compound, Method For Preparing The Same, Precursor Composition For Depositing Layer Containing The Same, And Metho App 20190202847 - HAN; Won Seok ; et al.	2019-07-04
Copper metal film, method for preparing the same, and method for forming copper interconnect for semiconductor device using the same Grant 10,287,681 - Lee , et al.	2019-05-14
Method for manufacturing silicon-containing thin film Grant 10,290,493 - Han , et al.	2019-05-14
Group 4 metal element-containing alkoxy compound, preparing method thereof, precursor composition including the same for film deposition, and method of depositing film using the same Grant 10,131,680 - Han , et al. November 20, 2	2018-11-20
Liquid Precursor Compositions, Preparation Methods Thereof, And Methods For Forming Layer Using The Composition App 20180286529 - HAN; Won Seok ; et al.	2018-10-04
Liquid precursor compositions, preparation methods thereof, and methods for forming layer using the composition Grant 10,014,089 - Han , et al. July 3, 2	2018-07-03
Group 4 metal element-containing compound, method of preparing the same, precursor composition including the same for depositing film, and method of depositing film using the same Grant 10,005,795 - Han , et al. June 26, 2	2018-06-26
Group 4 Metal Element-containing Compound, Method Of Preparing The Same, Precursor Composition Including The Same For Depositing Film, And Method Of Depositing Film Using The Same App 20180162882 - HAN; Won Seok ; et al.	2018-06-14
Ruthenium compound, preparation method therefor, precursor composition for film deposition containing same, and method for depositing film by using same Grant 9,957,614 - Han , et al. May 1, 2	2018-05-01
Novel Ruthenium Compound, Preparation Method Therefor, Precursor Composition For Film Deposition Containing Same, And Method For Depositing Film By Using Same App 20170226638 - Han; Won Seok ; et al.	2017-08-10
Indium-containing Film And Composition For Forming The Same App 20160326008 - Koh; Wonyong ; et al.	2016-11-10
Liquid Precursor Compositions, Preparation Methods Thereof, And Methods For Forming Layer Using The Composition App 20160314980 - HAN; Won Seok ; et al.	2016-10-27
Copper Metal Film, Method For Preparing The Same, And Method For Forming Copper Interconnect For Semiconductor Device Using The Same App 20160305024 - Lee; Won-Jun ; et al.	2016-10-20
Indium-containing oxide film and preparing method thereof Grant 9,431,144 - Koh , et al. August 30, 2	2016-08-30
Diazadiene-based metal compound, method for preparing same and method for forming a thin film using same Grant 9,353,437 - Han May 31, 2	2016-05-31
Deposition Method For Tungsten-containing Film Using Tungsten Compound, And Precursor Composition For Depositing Tungsten-containing Film, Comprising Tungsten Compound App 20160122867 - HAN; Won Seok ; et al.	2016-05-05
Aluminum precursor composition Grant 9,255,324 - Koh , et al. February 9, 2	2016-02-09
Method For Manufacturing Silicon-containing Thin Film App 20150235834 - Han; Won Seok ; et al.	2015-08-20
Indium-containing Oxide Film And Preparing Method Thereof App 20140335363 - Koh; Wonyong ; et al.	2014-11-13
Aluminum Precursor Composition App 20140050848 - Koh; Wonyong ; et al.	2014-02-20
Diazadiene-based Metal Compound, Method For Preparing Same And Method For Forming A Thin Film Using Same App 20130251903 - Han; Won Seok	2013-09-26
Method for thin film vapor deposition of a dialkyl amido dihydroaluminum compound Grant 7,985,450 - Shin , et al. July 26, 2	2011-07-26

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