loadpatents
name:-0.089168071746826
name:-0.067927837371826
name:-0.0017189979553223
UOZUMI; Yoshihiro Patent Filings

UOZUMI; Yoshihiro

Patent Applications and Registrations

Patent applications and USPTO patent grants for UOZUMI; Yoshihiro.The latest application filed is for "substrate processing method and substrate processing apparatus".

Company Profile
1.26.38
  • UOZUMI; Yoshihiro - Aichi-ken JP
  • UOZUMI; Yoshihiro - Shinagawa JP
  • Uozumi; Yoshihiro - Aichi JP
  • Uozumi; Yoshihiro - Somers NY
  • Uozumi; Yoshihiro - Yokohama N/A JP
  • Uozumi; Yoshihiro - Yokohama-shi JP
  • UOZUMI; Yoshihiro - Hopewell Junction NY
  • Uozumi; Yoshihiro - Kanagawa-ken JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Substrate Processing Method And Substrate Processing Apparatus
App 20220181171 - UOZUMI; Yoshihiro ;   et al.
2022-06-09
Semiconductor Device And Method For Manufacturing The Same
App 20210091024 - UOZUMI; Yoshihiro
2021-03-25
Substrate Processing Method And Substrate Processing Apparatus
App 20190214277 - Uozumi; Yoshihiro ;   et al.
2019-07-11
Etching method using hydrogen peroxide solution containing tungsten
Grant 9,929,017 - Takami , et al. March 27, 2
2018-03-27
Self-aligned silicide formation on source/drain through contact via
Grant 9,553,189 - Uozumi January 24, 2
2017-01-24
Substrate Processing Method And Substrate Processing Apparatus
App 20160071747 - Uozumi; Yoshihiro ;   et al.
2016-03-10
Substrate processing method and substrate processing apparatus
Grant 9,213,242 - Uozumi , et al. December 15, 2
2015-12-15
Self-aligned Silicide Formation On Source/drain Through Contact Via
App 20150318395 - Uozumi; Yoshihiro
2015-11-05
Self-aligned silicide formation on source/drain through contact via
Grant 9,099,474 - Uozumi August 4, 2
2015-08-04
Method for manufacturing semiconductor memory device and semiconductor memory device
Grant 8,946,809 - Takamura , et al. February 3, 2
2015-02-03
Method for manufacturing a semiconductor device including a stacked body comprising pluralities of first and second metallic conductive layers
Grant 8,912,089 - Omoto , et al. December 16, 2
2014-12-16
Method For Manufacturing Semiconductor Memory Device And Semiconductor Memory Device
App 20140284691 - Takamura; Kazuhide ;   et al.
2014-09-25
Etching Method, Etching Apparatus And Chemical Solution
App 20140073069 - TAKAMI; Nagisa ;   et al.
2014-03-13
Method For Manufacturing Semiconductor Device And Semiconductor Device
App 20140061752 - Omoto; Seiichi ;   et al.
2014-03-06
Post-dry etching cleaning liquid composition and process for fabricating semiconductor device
Grant 8,513,140 - Muramatsu , et al. August 20, 2
2013-08-20
Method And Apparatus For Manufacturing Semiconductor Device
App 20130196512 - KOIDE; Tatsuhiko ;   et al.
2013-08-01
Self-aligned Silicide Formation On Source/drain Through Contact Via
App 20130092988 - Uozumi; Yoshihiro
2013-04-18
Substrate Processing Method And Substrate Processing Apparatus
App 20130008868 - UOZUMI; Yoshihiro ;   et al.
2013-01-10
Self-aligned silicide formation on source/drain through contact via
Grant 8,349,718 - Uozumi January 8, 2
2013-01-08
Self-aligned Silicide Formation On Source/drain Through Contact Via
App 20120241963 - Uozumi; Yoshihiro
2012-09-27
Ion Implanted Resist Strip With Superacid
App 20120244690 - Uozumi; Yoshihiro
2012-09-27
Metal containing sacrifice material and method of damascene wiring formation
Grant 8,222,160 - Uozumi July 17, 2
2012-07-17
Ru cap metal post cleaning method and cleaning chemical
Grant 8,211,800 - Uozumi July 3, 2
2012-07-03
Semiconductor Device And Method Of Manufacturing The Same
App 20120139033 - Yamasaki; Hiroyuki ;   et al.
2012-06-07
Metal Containing Sacrifice Material And Method Of Damascene Wiring Formation
App 20120133044 - Uozumi; Yoshihiro
2012-05-31
Restoration method using metal for better CD controllability and Cu filing
Grant 8,168,528 - Isobayashi , et al. May 1, 2
2012-05-01
Ru CAP METAL POST CLEANING METHOD AND CLEANING CHEMICAL
App 20120045898 - Uozumi; Yoshihiro
2012-02-23
Method of manufacturing semiconductor device
Grant 7,884,027 - Uozumi , et al. February 8, 2
2011-02-08
Post-dry etching cleaning liquid composition and process for fabricating semiconductor device
App 20110014793 - Muramatsu; Masafumi ;   et al.
2011-01-20
Restoration Method Using Metal For Better Cd Controllability And Cu Filing
App 20100323514 - Isobayashi; Atsunobu ;   et al.
2010-12-23
Method of manufacturing semiconductor device and cleaning apparatus
Grant 7,850,818 - Matsumura , et al. December 14, 2
2010-12-14
Semiconductor device manufacturing method and chemical fluid used for manufacturing semiconductor device
Grant 7,776,754 - Uozumi , et al. August 17, 2
2010-08-17
Method of manufacturing semiconductor device and cleaning apparatus
App 20100059180 - Matsumura; Tsuyoshi ;   et al.
2010-03-11
Method of manufacturing semiconductor device and cleaning apparatus
Grant 7,635,601 - Matsumura , et al. December 22, 2
2009-12-22
Semiconductor Device Fabrication Method
App 20090286391 - Nakajima; Takahito ;   et al.
2009-11-19
Substrate Processing Apparatus And Substrate Processing Method
App 20090250431 - INUKAI; Minako ;   et al.
2009-10-08
Oxidation protection apparatus and method for chemical liquid
App 20090004052 - Matsumura; Tsuyoshi ;   et al.
2009-01-01
Post-dry etching cleaning liquid composition and process for fabricating semiconductor device
App 20080188085 - Muramatsu; Masafumi ;   et al.
2008-08-07
Semiconductor device and method for manufacturing the same
Grant 7,405,133 - Natori , et al. July 29, 2
2008-07-29
Insulating tube, semiconductor device employing the tube, and method of manufacturing the same
Grant 7,345,352 - Matsumura , et al. March 18, 2
2008-03-18
Insulating tube, semiconductor device employing the tube, and method of manufacturing the same
Grant 7,282,437 - Matsumura , et al. October 16, 2
2007-10-16
Method of manufacturing semiconductor device and cleaning apparatus
App 20070178613 - Matsumura; Tsuyoshi ;   et al.
2007-08-02
Insulating tube, semiconductor device employing the tube, and method of manufacturing the same
App 20070170594 - Matsumura; Tsuyoshi ;   et al.
2007-07-26
Method of manufacturing semiconductor device
App 20070105378 - Uozumi; Yoshihiro ;   et al.
2007-05-10
Semiconductor device manufacturing method and chemical fluid used for manufacturing semiconductor device
App 20070082491 - Uozumi; Yoshihiro ;   et al.
2007-04-12
Semiconductor device fabrication method
App 20070054482 - Nakajima; Takahito ;   et al.
2007-03-08
Method of plating a metal or metal compound on a semiconductor substrate that includes using the same main component in both plating and etching solutions
Grant 7,183,203 - Uozumi February 27, 2
2007-02-27
Semiconductor device and method for manufacturing the same
Grant 7,022,580 - Natori , et al. April 4, 2
2006-04-04
Insulating tube, semiconductor device employing the tube, and method of manufacturing the same
App 20060054990 - Matsumura; Tsuyoshi ;   et al.
2006-03-16
Semiconductor device fabrication method
App 20060051969 - Nakajima; Takahito ;   et al.
2006-03-09
Insulating tube
Grant 6,995,472 - Matsumura , et al. February 7, 2
2006-02-07
Post-dry etching cleaning liquid composition and process for fabricating semiconductor device
App 20060019201 - Muramatsu; Masafumi ;   et al.
2006-01-26
Method of plating a metal or metal or metal compound on a semiconductor substrate that includes using the same main component in both plating and etching solutions
App 20050064700 - Uozumi, Yoshihiro
2005-03-24
Insulating tube, semiconductor device employing the tube, and method of manufacturing the same
App 20050023690 - Matsumura, Tsuyoshi ;   et al.
2005-02-03
Method of plating a metal or metal compound on a semiconductor substrate that includes using the same main component in both plating and etching solutions
Grant 6,818,556 - Uozumi November 16, 2
2004-11-16
Method of forming copper oxide film, method of etching copper film, method of fabricating semiconductor device, semiconductor manufacturing apparatus, and semiconductor device
App 20030001271 - Uozumi, Yoshihiro
2003-01-02
Semiconductor device and method for manufacturing the same
App 20020190290 - Natori, Katsuaki ;   et al.
2002-12-19
Method of fabricating metal wiring on a semiconductor substrate using ammonia-containing plating and etching solutions
Grant 6,475,909 - Uozumi November 5, 2
2002-11-05
Method of forming copper oxide film, method of etching copper film, method of fabricating semiconductor device, semiconductor manufacturing apparatus, and semiconductor device
App 20010034125 - Uozumi, Yoshihiro
2001-10-25
Method of forming a copper oxide film to etch a copper surface evenly
Grant 6,261,953 - Uozumi July 17, 2
2001-07-17

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