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Substrate Processing Method And Substrate Processing Apparatus App 20220181171 - UOZUMI; Yoshihiro ;   et al. | 2022-06-09 |
Semiconductor Device And Method For Manufacturing The Same App 20210091024 - UOZUMI; Yoshihiro | 2021-03-25 |
Substrate Processing Method And Substrate Processing Apparatus App 20190214277 - Uozumi; Yoshihiro ;   et al. | 2019-07-11 |
Etching method using hydrogen peroxide solution containing tungsten Grant 9,929,017 - Takami , et al. March 27, 2 | 2018-03-27 |
Self-aligned silicide formation on source/drain through contact via Grant 9,553,189 - Uozumi January 24, 2 | 2017-01-24 |
Substrate Processing Method And Substrate Processing Apparatus App 20160071747 - Uozumi; Yoshihiro ;   et al. | 2016-03-10 |
Substrate processing method and substrate processing apparatus Grant 9,213,242 - Uozumi , et al. December 15, 2 | 2015-12-15 |
Self-aligned Silicide Formation On Source/drain Through Contact Via App 20150318395 - Uozumi; Yoshihiro | 2015-11-05 |
Self-aligned silicide formation on source/drain through contact via Grant 9,099,474 - Uozumi August 4, 2 | 2015-08-04 |
Method for manufacturing semiconductor memory device and semiconductor memory device Grant 8,946,809 - Takamura , et al. February 3, 2 | 2015-02-03 |
Method for manufacturing a semiconductor device including a stacked body comprising pluralities of first and second metallic conductive layers Grant 8,912,089 - Omoto , et al. December 16, 2 | 2014-12-16 |
Method For Manufacturing Semiconductor Memory Device And Semiconductor Memory Device App 20140284691 - Takamura; Kazuhide ;   et al. | 2014-09-25 |
Etching Method, Etching Apparatus And Chemical Solution App 20140073069 - TAKAMI; Nagisa ;   et al. | 2014-03-13 |
Method For Manufacturing Semiconductor Device And Semiconductor Device App 20140061752 - Omoto; Seiichi ;   et al. | 2014-03-06 |
Post-dry etching cleaning liquid composition and process for fabricating semiconductor device Grant 8,513,140 - Muramatsu , et al. August 20, 2 | 2013-08-20 |
Method And Apparatus For Manufacturing Semiconductor Device App 20130196512 - KOIDE; Tatsuhiko ;   et al. | 2013-08-01 |
Self-aligned Silicide Formation On Source/drain Through Contact Via App 20130092988 - Uozumi; Yoshihiro | 2013-04-18 |
Substrate Processing Method And Substrate Processing Apparatus App 20130008868 - UOZUMI; Yoshihiro ;   et al. | 2013-01-10 |
Self-aligned silicide formation on source/drain through contact via Grant 8,349,718 - Uozumi January 8, 2 | 2013-01-08 |
Self-aligned Silicide Formation On Source/drain Through Contact Via App 20120241963 - Uozumi; Yoshihiro | 2012-09-27 |
Ion Implanted Resist Strip With Superacid App 20120244690 - Uozumi; Yoshihiro | 2012-09-27 |
Metal containing sacrifice material and method of damascene wiring formation Grant 8,222,160 - Uozumi July 17, 2 | 2012-07-17 |
Ru cap metal post cleaning method and cleaning chemical Grant 8,211,800 - Uozumi July 3, 2 | 2012-07-03 |
Semiconductor Device And Method Of Manufacturing The Same App 20120139033 - Yamasaki; Hiroyuki ;   et al. | 2012-06-07 |
Metal Containing Sacrifice Material And Method Of Damascene Wiring Formation App 20120133044 - Uozumi; Yoshihiro | 2012-05-31 |
Restoration method using metal for better CD controllability and Cu filing Grant 8,168,528 - Isobayashi , et al. May 1, 2 | 2012-05-01 |
Ru CAP METAL POST CLEANING METHOD AND CLEANING CHEMICAL App 20120045898 - Uozumi; Yoshihiro | 2012-02-23 |
Method of manufacturing semiconductor device Grant 7,884,027 - Uozumi , et al. February 8, 2 | 2011-02-08 |
Post-dry etching cleaning liquid composition and process for fabricating semiconductor device App 20110014793 - Muramatsu; Masafumi ;   et al. | 2011-01-20 |
Restoration Method Using Metal For Better Cd Controllability And Cu Filing App 20100323514 - Isobayashi; Atsunobu ;   et al. | 2010-12-23 |
Method of manufacturing semiconductor device and cleaning apparatus Grant 7,850,818 - Matsumura , et al. December 14, 2 | 2010-12-14 |
Semiconductor device manufacturing method and chemical fluid used for manufacturing semiconductor device Grant 7,776,754 - Uozumi , et al. August 17, 2 | 2010-08-17 |
Method of manufacturing semiconductor device and cleaning apparatus App 20100059180 - Matsumura; Tsuyoshi ;   et al. | 2010-03-11 |
Method of manufacturing semiconductor device and cleaning apparatus Grant 7,635,601 - Matsumura , et al. December 22, 2 | 2009-12-22 |
Semiconductor Device Fabrication Method App 20090286391 - Nakajima; Takahito ;   et al. | 2009-11-19 |
Substrate Processing Apparatus And Substrate Processing Method App 20090250431 - INUKAI; Minako ;   et al. | 2009-10-08 |
Oxidation protection apparatus and method for chemical liquid App 20090004052 - Matsumura; Tsuyoshi ;   et al. | 2009-01-01 |
Post-dry etching cleaning liquid composition and process for fabricating semiconductor device App 20080188085 - Muramatsu; Masafumi ;   et al. | 2008-08-07 |
Semiconductor device and method for manufacturing the same Grant 7,405,133 - Natori , et al. July 29, 2 | 2008-07-29 |
Insulating tube, semiconductor device employing the tube, and method of manufacturing the same Grant 7,345,352 - Matsumura , et al. March 18, 2 | 2008-03-18 |
Insulating tube, semiconductor device employing the tube, and method of manufacturing the same Grant 7,282,437 - Matsumura , et al. October 16, 2 | 2007-10-16 |
Method of manufacturing semiconductor device and cleaning apparatus App 20070178613 - Matsumura; Tsuyoshi ;   et al. | 2007-08-02 |
Insulating tube, semiconductor device employing the tube, and method of manufacturing the same App 20070170594 - Matsumura; Tsuyoshi ;   et al. | 2007-07-26 |
Method of manufacturing semiconductor device App 20070105378 - Uozumi; Yoshihiro ;   et al. | 2007-05-10 |
Semiconductor device manufacturing method and chemical fluid used for manufacturing semiconductor device App 20070082491 - Uozumi; Yoshihiro ;   et al. | 2007-04-12 |
Semiconductor device fabrication method App 20070054482 - Nakajima; Takahito ;   et al. | 2007-03-08 |
Method of plating a metal or metal compound on a semiconductor substrate that includes using the same main component in both plating and etching solutions Grant 7,183,203 - Uozumi February 27, 2 | 2007-02-27 |
Semiconductor device and method for manufacturing the same Grant 7,022,580 - Natori , et al. April 4, 2 | 2006-04-04 |
Insulating tube, semiconductor device employing the tube, and method of manufacturing the same App 20060054990 - Matsumura; Tsuyoshi ;   et al. | 2006-03-16 |
Semiconductor device fabrication method App 20060051969 - Nakajima; Takahito ;   et al. | 2006-03-09 |
Insulating tube Grant 6,995,472 - Matsumura , et al. February 7, 2 | 2006-02-07 |
Post-dry etching cleaning liquid composition and process for fabricating semiconductor device App 20060019201 - Muramatsu; Masafumi ;   et al. | 2006-01-26 |
Method of plating a metal or metal or metal compound on a semiconductor substrate that includes using the same main component in both plating and etching solutions App 20050064700 - Uozumi, Yoshihiro | 2005-03-24 |
Insulating tube, semiconductor device employing the tube, and method of manufacturing the same App 20050023690 - Matsumura, Tsuyoshi ;   et al. | 2005-02-03 |
Method of plating a metal or metal compound on a semiconductor substrate that includes using the same main component in both plating and etching solutions Grant 6,818,556 - Uozumi November 16, 2 | 2004-11-16 |
Method of forming copper oxide film, method of etching copper film, method of fabricating semiconductor device, semiconductor manufacturing apparatus, and semiconductor device App 20030001271 - Uozumi, Yoshihiro | 2003-01-02 |
Semiconductor device and method for manufacturing the same App 20020190290 - Natori, Katsuaki ;   et al. | 2002-12-19 |
Method of fabricating metal wiring on a semiconductor substrate using ammonia-containing plating and etching solutions Grant 6,475,909 - Uozumi November 5, 2 | 2002-11-05 |
Method of forming copper oxide film, method of etching copper film, method of fabricating semiconductor device, semiconductor manufacturing apparatus, and semiconductor device App 20010034125 - Uozumi, Yoshihiro | 2001-10-25 |
Method of forming a copper oxide film to etch a copper surface evenly Grant 6,261,953 - Uozumi July 17, 2 | 2001-07-17 |