UNO; Toshiyuki

Patent Applications and Registrations

Patent applications and USPTO patent grants for UNO; Toshiyuki.The latest application filed is for "reflective mask blank for euv lithography, reflective mask for euv lithography, and method for manufacturing mask blank and mask".

Company Profile

0.13.19

UNO; Toshiyuki - Tokyo JP
UNO; Toshiyuki - Fukushima JP
UNO; Toshiyuki - Koriyama-shi JP
Uno; Toshiyuki - Chiyoda-ku JP
Uno; Toshiyuki - Guilderland NY
Uno; Toshiyuki - Yokohama-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Reflective Mask Blank For Euv Lithography, Reflective Mask For Euv Lithography, And Method For Manufacturing Mask Blank And Mask App 20220299862 - AKAGI; Daijiro ; et al.	2022-09-22
Reflective Mask Blank And Reflective Mask App 20220236636 - TANABE; Hiroyoshi ; et al.	2022-07-28
Reflective Mask Blank For Euv Lithography App 20220075256 - KAWAHARA; Hirotomo ; et al.	2022-03-10
Reflective Mask Blank For Euv Lithography, Mask Blank For Euv Lithography, And Manufacturing Methods Thereof App 20220035234 - AKAGI; Daijiro ; et al.	2022-02-03
Reflective Mask Blank For Euv Lithography App 20210325772 - KAWAHARA; Hirotomo ; et al.	2021-10-21
Reflective mask blank and reflective mask Grant 11,036,127 - Kawahara , et al. June 15, 2	2021-06-15
Reflective element for mask blank and process for producing reflective element for mask blank Grant 10,254,640 - Uno	2019-04-09
Reflective Mask Blank And Reflective Mask App 20190056653 - KAWAHARA; Hirotomo ; et al.	2019-02-21
Reflective Element For Mask Blank And Process For Producing Reflective Element For Mask Blank App 20170235218 - UNO; Toshiyuki	2017-08-17
Reflective mask blank for EUV lithography Grant 9,097,976 - Hayashi , et al. August 4, 2	2015-08-04
Substrate with conductive film, substrate with multilayer reflective film and reflective mask blank for EUV lithography Grant 9,086,629 - Maeshige , et al. July 21, 2	2015-07-21
Reflective mask blank for EUV lithography and process for producing the same Grant 8,956,787 - Uno , et al. February 17, 2	2015-02-17
Substrate With Conductive Film, Substrate With Multilayer Reflective Film And Reflective Mask Blank For Euv Lithography App 20130323630 - MAESHIGE; Kazunobu ; et al.	2013-12-05
Reflective Mask Blank For Euv Lithography App 20130316272 - Hayashi; Kazuyuki ; et al.	2013-11-28
Reflective Mask Blank For Euv Lithography And Process For Producing The Same App 20120322000 - Uno; Toshiyuki ; et al.	2012-12-20
Reflective mask blank for EUV lithography Grant 8,288,062 - Hayashi , et al. October 16, 2	2012-10-16
Reflective Mask Blank For Euv Lithography App 20120107733 - HAYASHI; Kazuyuki ; et al.	2012-05-03
Reflective mask blank for EUV lithography and mask for EUV lithography Grant 8,168,352 - Hayashi , et al. May 1, 2	2012-05-01
Reflective mask blank for EUV lithography Grant 8,029,950 - Hayashi , et al. October 4, 2	2011-10-04
Reflective-type mask blank for EUV lithography Grant 7,960,077 - Ikuta , et al. June 14, 2	2011-06-14
Reflective Mask Blank For Euv Lithography And Mask For Euv Lithography App 20110104595 - HAYASHI; Kazuyuki ; et al.	2011-05-05
Reflective Mask Blank For Euv Lithography App 20100304283 - Hayashi; Kazuyuki ; et al.	2010-12-02
Reflective-type Mask Blank For Euv Lithography App 20100167187 - IKUTA; Yoshiaki ; et al.	2010-07-01
Method for smoothing a surface of a glass substrate for a reflective mask blank used in EUV lithography Grant 7,712,333 - Uno , et al. May 11, 2	2010-05-11
Reflective-type mask blank for EUV lithography Grant 7,678,511 - Ikuta , et al. March 16, 2	2010-03-16
Method for smoothing a surface of a glass substrate, and substrate for a reflective mask blank used in EUV lithography, obtainable by that method App 20070240453 - Uno; Toshiyuki ; et al.	2007-10-18
Reflective-type mask blank for EUV lithography App 20070160916 - Ikuta; Yoshiaki ; et al.	2007-07-12
Defect repair device and defect repair method Grant 7,230,695 - Ikuta , et al. June 12, 2	2007-06-12
Ion beam sputtering apparatus and film deposition method for a multilayer for a reflective-type mask blank for EUV lithography App 20070087578 - Sugiyama; Takashi ; et al.	2007-04-19
Defect repair device and defect repair method App 20060007433 - Ikuta; Yoshiaki ; et al.	2006-01-12
Black matrix for liquid crystal display devices and color filter App 20020034698 - Uno, Toshiyuki ; et al.	2002-03-21

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