Unal; Nezih
Patent Applications and Registrations
Patent applications and USPTO patent grants for Unal; Nezih.The latest application filed is for "process artefact compensation upon transfer of a mask layout onto a mask substrate".
- Unal; Nezih - Taufkirchen DE
- Unal; Nezih - Wuppertal DE
- Unal; Nezih - Dortmund DE
| Patent | Date |
|---|---|
| Process artefact compensation upon transfer of a mask layout onto a mask substrate Grant 10,409,946 - Unal , et al. Sept | 2019-09-10 |
| Process Artefact Compensation Upon Transfer Of A Mask Layout Onto A Mask Substrate App 20160078166 - Unal; Nezih ; et al. | 2016-03-17 |
| Sample support Grant 7,560,073 - Peters , et al. July 14, 2 | 2009-07-14 |
| Sample Support App 20090155128 - PETERS; Ralf-Peter ; et al. | 2009-06-18 |
| Sample support App 20070025875 - Peters; Ralf-Peter ; et al. | 2007-02-01 |
| Nozzle plate for a liquid jet print head Grant 5,818,479 - Reinecke , et al. October 6, 1 | 1998-10-06 |
| Microstructured infrared absorption photometer Grant 5,734,165 - Unal , et al. March 31, 1 | 1998-03-31 |
| Nozzle plate for a liquid jet print head Grant 5,588,597 - Reinecke , et al. December 31, 1 | 1996-12-31 |
| Infrared-spectrometric sensor for gases Grant 5,550,375 - Peters , et al. August 27, 1 | 1996-08-27 |
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