Umotoy; Salvador P.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Umotoy; Salvador P..The latest application filed is for "lid assembly for a processing system to facilitate sequential deposition techniques".

Company Profile

0.34.28

Umotoy; Salvador P. - Milpitas CA
Umotoy; Salvador P. - Antioch CA US
Umotoy; Salvador P. - Milpita CA
UMOTOY, SALVADOR P - ANTIOCH CA
Umotoy; Salvador P. - Pittsburg CA
Umotoy; Salvador P. - Pittsburgh CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Lid assembly for a processing system to facilitate sequential deposition techniques Grant 10,280,509 - Tzu , et al.	2019-05-07
Lid Assembly For A Processing System To Facilitate Sequential Deposition Techniques App 20170241020 - TZU; Gwo-Chuan ; et al.	2017-08-24
Lid assembly for a processing system to facilitate sequential deposition techniques Grant 9,587,310 - Tzu , et al. March 7, 2	2017-03-07
Apparatuses and methods for atomic layer deposition Grant 9,017,776 - Lam , et al. April 28, 2	2015-04-28
Temperature controlled lid assembly for tungsten nitride deposition Grant 8,821,637 - Gelatos , et al. September 2, 2	2014-09-02
Lid Assembly For A Processing System To Facilitate Sequential Deposition Techniques App 20140190411 - TZU; GWO-CHUAN ; et al.	2014-07-10
Apparatuses and methods for atomic layer deposition Grant 8,747,556 - Lam , et al. June 10, 2	2014-06-10
Apparatuses And Methods For Atomic Layer Deposition App 20140087091 - Lam; Hyman W.H. ; et al.	2014-03-27
Multi Chamber Processing System App 20140076234 - KAO; Chien-Teh ; et al.	2014-03-20
Apparatuses And Methods For Atomic Layer Deposition App 20130008984 - Lam; Hyman ; et al.	2013-01-10
Apparatuses and methods for atomic layer deposition Grant 8,293,015 - Lam , et al. October 23, 2	2012-10-23
Apparatuses and methods for atomic layer deposition Grant 8,291,857 - Lam , et al. October 23, 2	2012-10-23
Apparatus for cyclical depositing of thin films Grant 8,123,860 - Thakur , et al. February 28, 2	2012-02-28
Apparatuses And Methods For Atomic Layer Deposition App 20120000422 - Lam; Hyman ; et al.	2012-01-05
Lid Assembly For A Processing System To Facilitate Sequential Deposition Techniques App 20110114020 - TZU; GWO-CHUAN ; et al.	2011-05-19
Lid assembly for a processing system to facilitate sequential deposition techniques Grant 7,905,959 - Tzu , et al. March 15, 2	2011-03-15
Substrate support having brazed plates and resistance heater Grant 7,705,275 - Umotoy , et al. April 27, 2	2010-04-27
Apparatuses And Methods For Atomic Layer Deposition App 20100003406 - Lam; Hyman ; et al.	2010-01-07
Apparatus And Method Of Mounting And Supporting A Solar Panel App 20090205703 - Umotoy; Salvador P. ; et al.	2009-08-20
Apparatus For Cyclical Depositing Of Thin Films App 20090056626 - THAKUR; RANDHIR P.S. ; et al.	2009-03-05
Temperature Controlled Lid Assembly For Tungsten Nitride Deposition App 20080202425 - Gelatos; Avgerinos V. ; et al.	2008-08-28
Process For Tungsten Nitride Deposition By A Temperature Controlled Lid Assembly App 20080206987 - Gelatos; Avgerinos V. ; et al.	2008-08-28
Apparatus For Cyclical Depositing Of Thin Films App 20070095285 - Thakur; Randhir P.S. ; et al.	2007-05-03
Substrate support having brazed plates and resistance heater App 20070040265 - Umotoy; Salvador P. ; et al.	2007-02-22
Apparatus for cyclical deposition of thin films Grant 7,175,713 - Thakur , et al. February 13, 2	2007-02-13
Apparatus for generating plasma by RF power App 20060130971 - Chang; Yu ; et al.	2006-06-22
Dual gas faceplate for a showerhead in a semiconductor wafer processing system App 20060021703 - Umotoy; Salvador P. ; et al.	2006-02-02
Lid assembly for a processing system to facilitate sequential deposition techniques App 20050115675 - Tzu, Gwo-Chuan ; et al.	2005-06-02
Lid assembly for a processing system to facilitate sequential deposition techniques Grant 6,878,206 - Tzu , et al. April 12, 2	2005-04-12
Showerhead assembly for a processing chamber Grant 6,827,815 - Hytros , et al. December 7, 2	2004-12-07
Lift pin actuating mechanism for semiconductor processing chamber Grant 6,767,176 - Yudovsky , et al. July 27, 2	2004-07-27
Ceramic substrate support Grant 6,730,175 - Yudovsky , et al. May 4, 2	2004-05-04
Aluminum oxide chamber and process App 20030198754 - Xi, Ming ; et al.	2003-10-23
Apparatus for cyclical deposition of thin films App 20030172872 - Thakur, Randhir P.S. ; et al.	2003-09-18
Resonant chamber applicator for remote plasma source Grant 6,603,269 - Vo , et al. August 5, 2	2003-08-05
Apparatus and method for low pressure CVD deposition of tungsten and tungsten nitride App 20030140857 - Umotoy, Salvador P. ; et al.	2003-07-31
Ceramic substrate support App 20030136520 - Yudovsky, Joseph ; et al.	2003-07-24
Showerhead assembly for a processing chamber App 20030132319 - Hytros, Mark M. ; et al.	2003-07-17
Dual-gas delivery system for chemical vapor deposition processes App 20030124842 - Hytros, Mark M. ; et al.	2003-07-03
Lid assembly for a processing system to facilitate sequential deposition techniques App 20030010451 - Tzu, Gwo-Chuan ; et al.	2003-01-16
Lift pin actuating mechanism for semiconductor processing chamber App 20030000775 - Yudovsky, Joseph ; et al.	2003-01-02
Showerhead with reduced contact area Grant 6,461,435 - Littau , et al. October 8, 2	2002-10-08
High temperature chemical vapor deposition chamber Grant 6,364,954 - Umotoy , et al. April 2, 2	2002-04-02
High Temperature Chemical Vapor Deposition Chamber App 20010054381 - UMOTOY, SALVADOR P ; et al.	2001-12-27
Gate valve for an integrated temperature controlled exhaust and cold trap assembly App 20010050053 - Umotoy, Salvador P. ; et al.	2001-12-13
One-piece dual gas faceplate for a showerhead in a semiconductor wafer processing system Grant 6,302,964 - Umotoy , et al. October 16, 2	2001-10-16
Integrated temperature controlled exhaust and cold trap assembly App 20010004879 - Umotoy, Salvador P. ; et al.	2001-06-28
Integrated temperature controlled exhaust and cold trap assembly Grant 6,206,971 - Umotoy , et al. March 27, 2	2001-03-27
Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process Grant 6,167,834 - Wang , et al. January 2, 2	2001-01-02
Dual gas faceplate for a showerhead in a semiconductor wafer processing system Grant 6,086,677 - Umotoy , et al. July 11, 2	2000-07-11
Process for PECVD of silicon oxide using TEOS decomposition Grant RE36,623 - Wang , et al. March 21, 2	2000-03-21
Lid assembly for semiconductor processing chamber Grant 5,906,683 - Chen , et al. May 25, 1	1999-05-25
Heater with shadow ring and purge above wafer surface Grant 5,888,304 - Umotoy , et al. March 30, 1	1999-03-30
Method for protecting against deposition on a selected region of a substrate Grant 5,871,811 - Wang , et al. February 16, 1	1999-02-16
Removable ring for controlling edge deposition in substrate processing apparatus Grant 5,766,365 - Umotoy , et al. June 16, 1	1998-06-16
Plasma-enhanced CVD process using TEOS for depositing silicon oxide Grant 5,362,526 - Wang , et al. * November 8, 1	1994-11-08
Thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process Grant 5,354,715 - Wang , et al. * October 11, 1	1994-10-11
Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process Grant 5,000,113 - Wang , et al. March 19, 1	1991-03-19
Process for PECVD of silicon oxide using TEOS decomposition Grant 4,892,753 - Wang , et al. January 9, 1	1990-01-09
CVD of silicon oxide using TEOS decomposition and in-situ planarization process Grant 4,872,947 - Wang , et al. October 10, 1	1989-10-10