Umehara; Naoto
Patent Applications and Registrations
Patent applications and USPTO patent grants for Umehara; Naoto.The latest application filed is for "in-situ deposition and etch process and apparatus for precision patterning of semiconductor devices".
- Umehara; Naoto - Yokkaichi JP
- Umehara; Naoto - Hillsboro OR
- Umehara; Naoto - Minato-ku JP
| Patent | Date |
|---|---|
| In-situ deposition and etch process and apparatus for precision patterning of semiconductor devices Grant 10,847,376 - Osawa , et al. November 24, 2 | 2020-11-24 |
| In-situ Deposition And Etch Process And Apparatus For Precision Patterning Of Semiconductor Devices App 20200006080 - OSAWA; Yusuke ; et al. | 2020-01-02 |
| Method of making semiconductor device Grant 8,030,216 - Kozuka , et al. October 4, 2 | 2011-10-04 |
| Method Of Making Semiconductor Device App 20080261404 - Kozuka; Shinichi ; et al. | 2008-10-23 |
| Method of making semiconductor device Grant 7,405,160 - Kozuka , et al. July 29, 2 | 2008-07-29 |
| Plasma processing method, storage medium storing program for implementing the method, and plasma processing apparatus App 20070134938 - Kozuka; Shinichi ; et al. | 2007-06-14 |
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