loadpatents
Patent applications and USPTO patent grants for Um; Jung Hwan.The latest application filed is for "plasma processing apparatus including gas distribution plate".
Patent | Date |
---|---|
Plasma Processing Apparatus Including Gas Distribution Plate App 20190304751 - Park; Chan Hoon ;   et al. | 2019-10-03 |
Showerhead And Substrate Processing Device Including The Same App 20190145002 - UM; JUNG HWAN ;   et al. | 2019-05-16 |
Diagnosing an abnormal state of a substrate-processing apparatus Grant 10,281,520 - Jung , et al. | 2019-05-07 |
Diagnosing An Abnormal State Of A Substrate-processing Apparatus App 20180059168 - Jung; Dae-Sung ;   et al. | 2018-03-01 |
Dielectric window, plasma processing system including the window, and method of fabricating semiconductor device using the system Grant 9,812,293 - Um , et al. November 7, 2 | 2017-11-07 |
Dielectric Window, Plasma Processing System Including The Window, And Method Of Fabricating Semiconductor Device Using The System App 20170084427 - UM; Jung-hwan ;   et al. | 2017-03-23 |
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.