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name:-0.019848823547363
name:-0.023097038269043
name:-0.0017580986022949
Ueno; Takumi Patent Filings

Ueno; Takumi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ueno; Takumi.The latest application filed is for "positive photosensitive resin composition, method of creating resist pattern, and electronic component".

Company Profile
0.35.24
  • Ueno; Takumi - Hitachi JP
  • Ueno; Takumi - Ibaraki N/A JP
  • Ueno; Takumi - Hitachi-shi JP
  • Ueno; Takumi - Mito JP
  • Ueno, Takumi - Mito-shi JP
  • Ueno, Takumi - Tokyo JP
  • Ueno; Takumi - Hachiohji JP
  • Ueno; Takumi - Hachioji JP
  • Ueno; Takumi - Bonn DE
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Positive-type photosensitive resin composition, method for production of resist pattern, semiconductor device, and electronic device
Grant 9,786,576 - Matsutani , et al. October 10, 2
2017-10-10
Photosensitive polymer composition, method of producing pattern and electronic parts
Grant 8,852,726 - Ooe , et al. October 7, 2
2014-10-07
Positive photosensitive resin composition, method of creating resist pattern, and electronic component
Grant 8,836,089 - Tanimoto , et al. September 16, 2
2014-09-16
Positive Photosensitive Resin Composition, Method Of Creating Resist Pattern, And Electronic Component
App 20130168859 - Tanimoto; Akitoshi ;   et al.
2013-07-04
Positive-type photosensitive resin composition, method for producing resist pattern, semiconductor device, and electronic device
Grant 8,461,699 - Matsutani , et al. June 11, 2
2013-06-11
Positive-type photosensitive resin composition, method for producing resist pattern, and electronic component
Grant 8,426,985 - Matsutani , et al. April 23, 2
2013-04-23
Photosensitive polymer composition, method of forming relief patterns, and electronic equipment
Grant 8,304,149 - Nunomura , et al. November 6, 2
2012-11-06
Photosensitive Polymer Composition, Method of Producing Pattern and Electronic Parts
App 20120263920 - Ooe; Masayuki ;   et al.
2012-10-18
Photosensitive polymer composition, method of producing pattern and electronic parts
Grant 8,231,959 - Ooe , et al. July 31, 2
2012-07-31
Positive-type photosensitive resin composition, method for producing patterns, and electronic parts
Grant 8,097,386 - Nakano , et al. January 17, 2
2012-01-17
Positive-type Photosensitive Resin Composition, Method For Producing Resist Pattern, Semiconductor Device, And Electronic Device
App 20110254178 - Matsutani; Hiroshi ;   et al.
2011-10-20
Positive-type Photosensitive Resin Composition, Method For Production Of Resist Pattern, Semiconductor Device, And Electronic Device
App 20110250396 - Matsutani; Hiroshi ;   et al.
2011-10-13
Postive-type Photosensitive Resin Composition, Method For Producing Resist Pattern, And Electronic Component
App 20110204528 - Matsutani; Hiroshi ;   et al.
2011-08-25
Photosensitive Polymer Composition, Method Of Forming Relief Patterns, And Electronic Equipment
App 20110076458 - NUNOMURA; Masataka ;   et al.
2011-03-31
Photosensitive polymer composition, method of forming relief patterns, and electronic equipment
Grant 7,851,128 - Nunomura , et al. December 14, 2
2010-12-14
Positive-type Photosensitive Resin Composition, Method For Producing Patterns, And Electronic Parts
App 20100227126 - Nakano; Hajime ;   et al.
2010-09-09
Photosensitive Polymer Composition, Method of Producing Pattern and Electronic Parts
App 20080220222 - Masayuki; Ooe ;   et al.
2008-09-11
High dielectric constant composite material and multilayer wiring board using the same
Grant 7,220,481 - Satsu , et al. May 22, 2
2007-05-22
Semiconductor device, semiconductor wafer, semiconductor module, and a method of manufacturing semiconductor device
Grant 7,217,992 - Ogino , et al. May 15, 2
2007-05-15
Photosensitive polymer composition, method of forming relief patterns, and electronic equipment
App 20070072122 - Nunomura; Masataka ;   et al.
2007-03-29
Photosensitive polymer composition, method of forming relief patterns, and electronic equipment
Grant 7,150,947 - Nunomura , et al. December 19, 2
2006-12-19
Wiring tape for semiconductor device including a buffer layer having interconnected foams
Grant 7,038,325 - Ogino , et al. May 2, 2
2006-05-02
Semiconductor module and mounting method for same
Grant 6,940,162 - Eguchi , et al. September 6, 2
2005-09-06
High dielectric constant composite material and multilayer wiring board using the same
Grant 6,924,971 - Satsu , et al. August 2, 2
2005-08-02
Semiconductor device, semiconductor wafer, semiconductor module, and a method of manufacturing semiconductor device
Grant 6,888,230 - Ogino , et al. May 3, 2
2005-05-03
Semiconductor module and mounting method for same
App 20040251540 - Eguchi, Shuji ;   et al.
2004-12-16
Semiconductor device, semiconductor wafer, semiconductor module, and a method of manufacturing semiconductor device
App 20040217453 - Ogino, Masahiko ;   et al.
2004-11-04
Wiring tape for semiconductor device including a buffer layer having interconnected foams
App 20040195702 - Ogino, Masahiko ;   et al.
2004-10-07
Semiconductor module and mounting method for same
Grant 6,784,541 - Eguchi , et al. August 31, 2
2004-08-31
Semiconductor device comprising stress relaxation layers and method for manufacturing the same
Grant 6,710,446 - Nagai , et al. March 23, 2
2004-03-23
Semiconductor devices
Grant 6,710,263 - Kobayashi , et al. March 23, 2
2004-03-23
Photosensitive polymer composition, method of forming relief patterns, and electronic equipment
App 20040029045 - Nunomura, Masataka ;   et al.
2004-02-12
Composite material member for semiconductor device and insulated and non-insulated semiconductor devices using composite material member
App 20030201530 - Kurihara, Yasutoshi ;   et al.
2003-10-30
Thermal stable low elastic modulus material and device using the same
Grant 6,638,352 - Satsu , et al. October 28, 2
2003-10-28
Thermal stable low elastic modulus material and device using the same
Grant 6,638,631 - Satsu , et al. October 28, 2
2003-10-28
Semiconductor module and method of mounting
Grant 6,627,997 - Eguchi , et al. September 30, 2
2003-09-30
Semiconductor module and mounting method for same
App 20030071348 - Eguchi, Shuji ;   et al.
2003-04-17
Thermal stable low elastic modulus material and device using the same
App 20030047351 - Satsu, Yuichi ;   et al.
2003-03-13
Thermal stable low elastic modulus material and device using the same
App 20030049193 - Satsu, Yuichi ;   et al.
2003-03-13
High dielectric constant composite material and multilayer wiring board using the same
App 20030030999 - Satsu, Yuichi ;   et al.
2003-02-13
Composite material member for semiconductor device and insulated and non-insulated semiconductor devices using composite material member
App 20020192488 - Kurihara, Yasutoshi ;   et al.
2002-12-19
High dielectric constant composite material and multilayer wiring board using the same
App 20020168510 - Satsu, Yuichi ;   et al.
2002-11-14
Semiconductor device and wiring tape for semiconductor device
App 20020158343 - Ogino, Masahiko ;   et al.
2002-10-31
Semiconductor device and method of manufacture thereof
App 20020130412 - Nagai, Akira ;   et al.
2002-09-19
Semiconductor device and method for manufacturing the same technical field
Grant 6,396,145 - Nagai , et al. May 28, 2
2002-05-28
Semiconductor devices
App 20010023983 - Kobayashi, Toshiyuki ;   et al.
2001-09-27
Photosensitive resin composition, method for forming pattern therefrom, electronic devices produced by using the same, and method for production thereof
Grant 6,291,619 - Maekawa , et al. September 18, 2
2001-09-18
Resin sealed semiconductor devices and a process for manufacturing the same
Grant 6,097,100 - Eguchi , et al. August 1, 2
2000-08-01
Method of forming a pattern
Grant 5,328,807 - Tanaka , et al. July 12, 1
1994-07-12
Pattern forming material and process for forming pattern using the same
Grant 5,118,582 - Ueno , et al. June 2, 1
1992-06-02
Radiation imaging process for forming pattern without alkali-soluble polymer underlayer and water soluble radiation-sensitive diazonium salt overlayer
Grant 4,985,344 - Uchino , et al. January 15, 1
1991-01-15
Resist pattern forming process with dry etching
Grant 4,835,089 - Iwayanagi , et al. May 30, 1
1989-05-30
Radiation-sensitive resist composition with an admixture of cis-(1,3,5,7-tetrahydroxy)-1,3,5,7-tetraphenylcyclotetrasiloxane and a polysilsesquioxane
Grant 4,722,881 - Ueno , et al. February 2, 1
1988-02-02

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