Uemura; Ryoichi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Uemura; Ryoichi.The latest application filed is for "coating processing apparatus and coating liquid collecting member".

Company Profile

1.11.10

Uemura; Ryoichi - Kumamoto JP
Uemura; Ryoichi - Koshi JP
UEMURA; Ryoichi - Koshi-Shi JP
Uemura; Ryoichi - Kumamoto-ken JP
Uemura, Ryoichi - Kikuchi-gun JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Coating processing apparatus and coating liquid collecting member Grant 10,699,919 - Uemura	2020-06-30
Coating Processing Apparatus And Coating Liquid Collecting Member App 20190067043 - UEMURA; Ryoichi	2019-02-28
Substrate cleaning method, substrate cleaning apparatus, and computer-readable storage medium Grant 9,869,941 - Uemura , et al. January 16, 2	2018-01-16
Substrate Cleaning Method, Substrate Cleaning Apparatus, And Computer-readable Storage Medium App 20170090305 - UEMURA; Ryoichi ; et al.	2017-03-30
Substrate cleaning method, substrate cleaning apparatus, and computer-readable storage medium Grant 9,570,326 - Uemura , et al. February 14, 2	2017-02-14
Substrate Cleaning Method, Substrate Cleaning Apparatus, And Computer-readable Storage Medium App 20150194301 - UEMURA; Ryoichi ; et al.	2015-07-09
Temperature control method of heat processing plate, computer storage medium, and temperature control apparatus of heat processing plate Grant 8,698,052 - Tadokoro , et al. April 15, 2	2014-04-15
Temperature Control Method Of Heat Processing Plate, Computer Storage Medium, And Temperature Control Apparatus Of Heat Processing Plate App 20120279955 - TADOKORO; Masahide ; et al.	2012-11-08
Temperature control method of heat processing plate, computer storage medium, and temperature control apparatus of heat processing plate Grant 8,242,417 - Tadokoro , et al. August 14, 2	2012-08-14
Substrate-processing apparatus, substrate-processing method, substrate-processing program, and computer-readable recording medium recorded with such program Grant 7,867,674 - Tanaka , et al. January 11, 2	2011-01-11
Substrate-processing apparatus, substrate-processing method, substrate-processing program, and computer-readable recording medium recorded with such program Grant 7,867,673 - Ogata , et al. January 11, 2	2011-01-11
Substrate-processing apparatus, substrate-processing method, substrate-processing program, and computer-readable recording medium recorded with such program Grant 7,862,966 - Ogata , et al. January 4, 2	2011-01-04
Substrate-processing Apparatus, Substrate-processing Method, Substrate-processing Program, And Computer-readable Recording Medium Recorded With Such Program App 20090162759 - Ogata; Kunie ; et al.	2009-06-25
Substrate-processing Apparatus, Substrate-processing Method, Substrate-processing Program, And Computer-readable Recording Medium Recorded With Such Program App 20090104548 - Tanaka; Michio ; et al.	2009-04-23
Substrate-processing Apparatus, Substrate-processing Method, Substrate-processing Program, And Computer-readable Recording Medium Recorded With Such Program App 20090047586 - Ogata; Kunie ; et al.	2009-02-19
Temperature Control Method Of Heat Processing Plate, Computer Storage Medium, And Temperature Control Apparatus Of Heat Processing Plate App 20070272680 - TADOKORO; Masahide ; et al.	2007-11-29
Substrate processing method Grant 6,921,554 - Harada , et al. July 26, 2	2005-07-26
Substrate processing method and substrate processing unit App 20020153351 - Harada, Koji ; et al.	2002-10-24
Substrate processing method and substrate processing unit Grant 6,402,844 - Harada , et al. June 11, 2	2002-06-11
Coating film forming apparatus and coating film forming method App 20010016225 - Ogata, Kunie ; et al.	2001-08-23

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