Uehara; Yusaku

Patent Applications and Registrations

Patent applications and USPTO patent grants for Uehara; Yusaku.The latest application filed is for "reticle error reduction by cooling".

Company Profile

0.4.5

Uehara; Yusaku - Ageo N/A JP
Uehara; Yusaku - Saitama JP
Uehara; Yusaku - Ageo City JP
Uehara; Yusaku - Saitama-ken JP
Uehara; Yusaku - Ageo-shi JP
Uehara; Yusaku - Ageoshi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Exposure method and device manufacturing method including selective deformation of a mask Grant 9,304,385 - Phillips , et al. April 5, 2	2016-04-05
Exposure method, exposure apparatus and device manufacturing method Grant 8,253,924 - Uehara , et al. August 28, 2	2012-08-28
Exposure method and apparatus, and device producing method using two light beams to correct non-rotationally symmetric aberration Grant 7,817,249 - Uehara October 19, 2	2010-10-19
Reticle Error Reduction By Cooling App 20100186942 - Phillips; Alton H. ; et al.	2010-07-29
Exposure Method, Device Manufacturing Method, And Mask App 20100097588 - Phillips; Alton H. ; et al.	2010-04-22
Exposure Method, Exposure Apparatus and Device Manufacturing Method App 20080218714 - Uehara; Yusaku ; et al.	2008-09-11
Exposure method and exposure apparatus, and device manufacturing method App 20080204682 - Uehara; Yusaku ; et al.	2008-08-28
Exposure method and apparatus and device producing method App 20060244940 - Uehara; Yusaku	2006-11-02

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