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Medical puncture needle
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Puncture Needle And Catheter Assembly
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Medical puncture needle and method for manufacturing puncture needle
Grant 10,772,660 - Ueda September 15, 2 | 2020-09-15 |
Medical puncture needle and method for manufacturing puncture needle
Grant 10,722,264 - Ueda | 2020-07-28 |
Medical puncture needle and method for manufacturing puncture needle
Grant 10,682,473 - Ueda | 2020-06-16 |
Electronic Apparatus Activation Control Apparatus, Electronic Apparatus Activation Control System, Electronic Apparatus Activati
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Washing/drying apparatus, screening apparatus, washing/drying method, and screening method
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Medical Puncture Needle
App 20190091415 - UEDA; Takehiko | 2019-03-28 |
Medical Puncture Needle And Method For Manufacturing Puncture Needle
App 20180153579 - UEDA; Takehiko | 2018-06-07 |
Medical Puncture Needle And Method For Manufacturing Puncture Needle
App 20180146983 - UEDA; Takehiko | 2018-05-31 |
Medical Puncture Needle And Method For Manufacturing Puncture Needle
App 20170274153 - UEDA; Takehiko | 2017-09-28 |
Washing/drying Apparatus, Screening Apparatus, Washing/drying Method, And Screening Method
App 20170045543 - ISAMI; Tadao ; et al. | 2017-02-16 |
Biochip Fixing Method, Biochip Fixing Device, And Screening Method For Biomolecule Array
App 20160059201 - UEDA; Takehiko ; et al. | 2016-03-03 |
Method for predicting worked shape, method for determining working conditions, working method, working system, semiconductor device manufacturing method, computer program and computer program storage medium
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Electronic Apparatus Activation Control Apparatus, Electronic Apparatus Activation Control System, Electronic Apparatus Activation Control Method, And Program
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Optical Element, Optical Device, Measurement Device, And Screening Apparatus
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Method for detecting polishing end in CMP polishing device, CMP polishing device, and semiconductor device manufacturing method
Grant 7,981,309 - Ueda , et al. July 19, 2 | 2011-07-19 |
Method For Predicting Worked Shape, Method For Determining Working Conditions, Working Method, Working System, Semiconductor Device Manufacturing Method, Computer Program And Computer Program Storage Medium
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Working shape prediction method, working requirement determination method, working method, working system, method of manufacturing semiconductor device, computer program, and computer program storage medium
Grant 7,686,673 - Senga , et al. March 30, 2 | 2010-03-30 |
Method for Detecting Polishing End in CMP Polishing Device, CMP Polishing Device, and Semiconductor Device Manufacturing Method
App 20090233525 - Ueda; Takehiko ; et al. | 2009-09-17 |
Chemical mechanical polishing end point detection apparatus and method
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Chemical Mechanical Polishing End Point Detection Apparatus And Method
App 20060258263 - Barada; Andrew H. ; et al. | 2006-11-16 |
Layer-thickness detection methods and apparatus for wafers and the like, and polishing apparatus comprising same
Grant 7,052,920 - Ushio , et al. May 30, 2 | 2006-05-30 |
Process end point detection apparatus and method, polishing apparatus, semiconductor device manufacturing method, and recording medium recorded with signal processing program
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Working shape prediction method, working requirement determination method, working method, working system, method of manufacturing semiconductor device, computer program, and computer program storage medium
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Layer-thickness detection methods and apparatus for wafers and the like, and polishing apparatus comprising same
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Process end point detection apparatus and method, polishing apparatus, semiconductor device manufacturing method, and recording medium recorded with signal processing program
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Layer-thickness detection methods and apparatus for wafers and the like, and polishing apparatus comprising same
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Layer-thickness detection methods and apparatus for wafers and the like, and polishing apparatus comprising same
App 20010039064 - Ushio, Yoshijiro ; et al. | 2001-11-08 |
Display Device And Camera Having The Display Device
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Layer-thickness detection methods and apparatus for wafers and the like, and polishing apparatus comprising same
Grant 6,271,047 - Ushio , et al. August 7, 2 | 2001-08-07 |
Method for fabricating semiconductor device
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Controlling apparatus for high frequency high voltage power source for corona discharge processing
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