| Patent | Date |
|---|
Resin Molded Body
App 20210403689 - KATAYAMA; Hiroshi ; et al. | 2021-12-30 |
Variable Capacity Turbocharger
App 20210404376 - HAYASHI; Katsunori ; et al. | 2021-12-30 |
Electromagnetic Wave Shielding Molded Article
App 20210371623 - UEDA; Takafumi ; et al. | 2021-12-02 |
Turbocharger
Grant 11,162,381 - Hayashi , et al. November 2, 2 | 2021-11-02 |
Turbocharger
Grant 10,907,496 - Shioya , et al. February 2, 2 | 2021-02-02 |
Turbocharger
Grant 10,895,166 - Shioya , et al. January 19, 2 | 2021-01-19 |
Turbocharger
App 20210010387 - HAYASHI; Katsunori ; et al. | 2021-01-14 |
Electromagnetic Wave Shielding And Absorbing Molded Article
App 20200335875 - UEDA; Takafumi ; et al. | 2020-10-22 |
Seal Structure For Turbocharger
App 20200232337 - HAYASHI; Katsunori ; et al. | 2020-07-23 |
Quality Analysis Device And Quality Analysis Method
App 20200159183 - UEDA; Takafumi | 2020-05-21 |
Variable geometry system turbocharger
Grant 10,309,248 - Ueda , et al. | 2019-06-04 |
Variable nozzle unit and variable geometry system turbocharger
Grant 10,280,836 - Ueda , et al. | 2019-05-07 |
Turbocharger
App 20190071987 - SHIOYA; Takayuki ; et al. | 2019-03-07 |
Turbocharger
App 20180355752 - SHIOYA; Takayuki ; et al. | 2018-12-13 |
Quality Control Apparatus, Quality Control Method, And Quality Control Program
App 20180284739 - UEDA; Takafumi ; et al. | 2018-10-04 |
Variable geometry system turbocharger
Grant 10,030,576 - Ueda , et al. July 24, 2 | 2018-07-24 |
Variable nozzle unit and variable geometry system turbocharger
Grant 9,702,264 - Ueda , et al. July 11, 2 | 2017-07-11 |
Composition for forming a coating type BPSG film, substrate formed a film by said composition, and patterning process using said composition
Grant 9,627,204 - Ogihara , et al. April 18, 2 | 2017-04-18 |
Variable Geometry System Turbocharger
App 20160258316 - UEDA; Takafumi ; et al. | 2016-09-08 |
Variable Nozzle Unit And Variable Geometry System Turbocharger
App 20160245160 - UEDA; Takafumi ; et al. | 2016-08-25 |
Compositon for forming metal oxide-containing film and patterning process
Grant 9,377,690 - Ogihara , et al. June 28, 2 | 2016-06-28 |
Composition for forming titanium-containing resist underlayer film and patterning process
Grant 9,188,866 - Ogihara , et al. November 17, 2 | 2015-11-17 |
Composition for forming titanium-containing resist underlayer film and patterning process
Grant 9,176,382 - Ogihara , et al. November 3, 2 | 2015-11-03 |
Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process
Grant 9,075,309 - Ogihara , et al. July 7, 2 | 2015-07-07 |
Variable Geometry System Turbocharger
App 20150125275 - UEDA; Takafumi ; et al. | 2015-05-07 |
Patterning process
Grant 9,005,883 - Ogihara , et al. April 14, 2 | 2015-04-14 |
Silicon-containing antireflective coatings including non-polymeric silsesquioxanes
Grant 8,999,625 - Glodde , et al. April 7, 2 | 2015-04-07 |
Patterning process and composition for forming silicon-containing film usable therefor
Grant 8,951,711 - Ogihara , et al. February 10, 2 | 2015-02-10 |
Composition for forming resist underlayer film and patterning process using the same
Grant 8,951,917 - Ogihara , et al. February 10, 2 | 2015-02-10 |
Silicon-containing resist underlayer film-forming composition and patterning process
Grant 8,945,820 - Ogihara , et al. February 3, 2 | 2015-02-03 |
Composition for forming a silicon-containing resist underlayer film and patterning process using the same
Grant 8,932,953 - Ogihara , et al. January 13, 2 | 2015-01-13 |
Composition For Forming A Coating Type Bpsg Film, Substrate Formed A Film By Said Composition, And Patterning Process Using Said Composition
App 20150004791 - OGIHARA; Tsutomu ; et al. | 2015-01-01 |
Patterning Process And Composition For Forming Silicon-containing Film Usable Therefor
App 20140342289 - OGIHARA; Tsutomu ; et al. | 2014-11-20 |
Variable Nozzle Unit And Variable Geometry System Turbocharger
App 20140334918 - UEDA; Takafumi ; et al. | 2014-11-13 |
Patterning process
Grant 8,859,189 - Ogihara , et al. October 14, 2 | 2014-10-14 |
Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process
Grant 8,852,844 - Ogihara , et al. October 7, 2 | 2014-10-07 |
Composition For Forming Titanium-containing Resist Underlayer Film And Patterning Process
App 20140273447 - OGIHARA; Tsutomu ; et al. | 2014-09-18 |
Composition For Forming Titanium-containing Resist Underlayer Film And Patterning Process
App 20140273448 - OGIHARA; Tsutomu ; et al. | 2014-09-18 |
Patterning process and composition for forming silicon-containing film usable therefor
Grant 8,835,102 - Ogihara , et al. September 16, 2 | 2014-09-16 |
Silicon-containing Antireflective Coatings Including Non-polymeric Silsesquioxanes
App 20140227641 - Glodde; Martin ; et al. | 2014-08-14 |
Composition For Forming Titanium-containing Resist Underlayer Film And Patterning Process
App 20140193975 - OGIHARA; Tsutomu ; et al. | 2014-07-10 |
Compositon For Forming Metal Oxide-containing Film And Patterning Process
App 20140193757 - OGIHARA; Tsutomu ; et al. | 2014-07-10 |
Patterning process
Grant 8,759,220 - Ogihara , et al. June 24, 2 | 2014-06-24 |
Silicon-containing resist underlayer film-forming composition and patterning process
Grant 8,715,913 - Ogihara , et al. May 6, 2 | 2014-05-06 |
Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same
Grant 8,697,330 - Ogihara , et al. April 15, 2 | 2014-04-15 |
Patterning Process
App 20140093825 - OGIHARA; Tsutomu ; et al. | 2014-04-03 |
Coated-type silicon-containing film stripping process
Grant 8,652,267 - Ogihara , et al. February 18, 2 | 2014-02-18 |
Silicon Compound, Silicon-containing Compound, Composition For Forming Resist Underlayer Film Containing The Same And Patterning Process
App 20130280912 - OGIHARA; Tsutomu ; et al. | 2013-10-24 |
Silicon-containing Surface Modifier, Resist Underlayer Film Composition Containing This, And Patterning Process
App 20130210236 - OGIHARA; Tsutomu ; et al. | 2013-08-15 |
Silicon-containing Surface Modifier, Resist Lower Layer Film-forming Composition Containing The Same, And Patterning Process
App 20130210229 - OGIHARA; Tsutomu ; et al. | 2013-08-15 |
Silicon-containing film-forming composition, silicon-containing film-formed substrate, and patterning process
Grant 8,501,386 - Ogihara , et al. August 6, 2 | 2013-08-06 |
Silicon-containing Resist Underlayer Film-forming Composition And Patterning Process
App 20130137271 - OGIHARA; Tsutomu ; et al. | 2013-05-30 |
Silicon-containing Resist Underlayer Film-forming Composition And Patterning Process
App 20130137041 - OGIHARA; Tsutomu ; et al. | 2013-05-30 |
Composition For Forming A Silicon-containing Resist Underlayer Film And Patterning Process Using The Same
App 20130045601 - OGIHARA; Tsutomu ; et al. | 2013-02-21 |
Composition For Forming Resist Underlayer Film And Patterning Process Using The Same
App 20130005150 - OGIHARA; Tsutomu ; et al. | 2013-01-03 |
Patterning process
Grant 8,343,711 - Ogihara , et al. January 1, 2 | 2013-01-01 |
Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method
Grant 8,329,376 - Ogihara , et al. December 11, 2 | 2012-12-11 |
Patterning Process
App 20120276483 - OGIHARA; Tsutomu ; et al. | 2012-11-01 |
Patterning Process And Composition For Forming Silicon-containing Film Usable Therefor
App 20120238095 - OGIHARA; Tsutomu ; et al. | 2012-09-20 |
Silicon-containing Film-forming Composition, Silicon-containing Film-formed Substrate, And Patterning Process
App 20120052685 - OGIHARA; Tsutomu ; et al. | 2012-03-01 |
Freeze-dried composition of inactivated virus envelope with membrane fusion activity
Grant 8,043,610 - Ueda October 25, 2 | 2011-10-25 |
Metal oxide-containing film-forming composition, metal oxide-containing film-formed substrate, and patterning process
Grant 8,029,974 - Ogihara , et al. October 4, 2 | 2011-10-04 |
Metal oxide-containing film-forming composition, metal oxide-containing film, metal oxide-containing film-bearing substrate, and patterning method
Grant 8,026,038 - Ogihara , et al. September 27, 2 | 2011-09-27 |
Silicon-containing antireflective coating forming composition, silicon-containing antireflective coating, substrate processing intermediate, and substrate processing method
Grant 7,910,283 - Ogihara , et al. March 22, 2 | 2011-03-22 |
Substrate comprising a lower silicone resin film and an upper silicone resin film
Grant 7,868,407 - Ogihara , et al. January 11, 2 | 2011-01-11 |
Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method
Grant 7,855,043 - Ogihara , et al. December 21, 2 | 2010-12-21 |
Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same
App 20100285407 - Ogihara; Tsutomu ; et al. | 2010-11-11 |
Patterning process
App 20100273110 - Ogihara; Tsutomu ; et al. | 2010-10-28 |
Coated-type silicon-containing film stripping process
App 20100147334 - Ogihara; Tsutomu ; et al. | 2010-06-17 |
Metal oxide-containing film-forming composition, metal oxide-containing film-formed substrate, and patterning process
App 20100086872 - Ogihara; Tsutomu ; et al. | 2010-04-08 |
Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process
App 20100086870 - Ogihara; Tsutomu ; et al. | 2010-04-08 |
Silicon-containing film forming composition, silicon-containing film serving as etching mask, substrate processing intermediate, and substrate processing method
Grant 7,678,529 - Ogihara , et al. March 16, 2 | 2010-03-16 |
Freeze-dried Composition Of Inactivated Virus Envelope With Membrane Fusion Activity
App 20100040580 - UEDA; Takafumi | 2010-02-18 |
Rework process for photoresist film
Grant 7,642,043 - Ogihara , et al. January 5, 2 | 2010-01-05 |
Rework process for photoresist film
Grant 7,638,268 - Ogihara , et al. December 29, 2 | 2009-12-29 |
Antireflection film composition, substrate, and patterning process
Grant 7,585,613 - Ogihara , et al. September 8, 2 | 2009-09-08 |
Antireflective film-forming composition, method for manufacturing the same, and antireflective film and pattern formation method using the same
Grant 7,541,134 - Iwabuchi , et al. June 2, 2 | 2009-06-02 |
Metal Oxide-containing Film-forming Composition, Metal Oxide-containing Film, Metal Oxide-containing Film-bearing Substrate, And Patterning Method
App 20090136869 - OGIHARA; Tsutomu ; et al. | 2009-05-28 |
Sacrificial film-forming composition, patterning process, sacrificial film and removal method
Grant 7,485,690 - Hamada , et al. February 3, 2 | 2009-02-03 |
Porous film-forming composition, patterning process, and porous sacrificial film
Grant 7,417,104 - Iwabuchi , et al. August 26, 2 | 2008-08-26 |
Sacrificial film-forming composition, patterning process, sacrificial film and removal method
Grant 7,385,021 - Hamada , et al. June 10, 2 | 2008-06-10 |
Freeze-Dried Composition of Inactivated Virus Envelope with Membrane Fusion Activity
App 20080102524 - Ueda; Takafumi | 2008-05-01 |
Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method
App 20080026322 - Ogihara; Tsutomu ; et al. | 2008-01-31 |
Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method
App 20070238300 - Ogihara; Tsutomu ; et al. | 2007-10-11 |
Antireflection film composition, substrate, and patterning process
App 20070172759 - Ogihara; Tsutomu ; et al. | 2007-07-26 |
Antireflection film composition, patterning process and substrate using the same
App 20070134916 - Iwabuchi; Motoaki ; et al. | 2007-06-14 |
Substrate, method for producing the same, and patterning process using the same
App 20070128886 - Ogihara; Tsutomu ; et al. | 2007-06-07 |
Rework process for photoresist film
App 20070117411 - Ogihara; Tsutomu ; et al. | 2007-05-24 |
Silicon-containing antireflective coating forming composition, silicon-containing antireflective coating, substrate processing intermediate, and substrate processing method
App 20070117252 - Ogihara; Tsutomu ; et al. | 2007-05-24 |
Silicon-containing film forming composition, silicon-containing film serving as etching mask, substrate processing intermediate, and substrate processing method
App 20070117044 - Ogihara; Tsutomu ; et al. | 2007-05-24 |
Rework process for photoresist film
App 20070111134 - Ogihara; Tsutomu ; et al. | 2007-05-17 |
Anti-reflection film material and a substrate having an anti-reflection film and a method for forming a pattern
Grant 7,163,778 - Hatakeyama , et al. January 16, 2 | 2007-01-16 |
Sacrificial film-forming composition, patterning process, sacrificial film and removal method
App 20050277755 - Hamada, Yoshitaka ; et al. | 2005-12-15 |
Sacrificial film-forming composition, patterning process, sacrificial film and removal method
App 20050274692 - Hamada, Yoshitaka ; et al. | 2005-12-15 |
Antireflective film-forming composition, method for manufacturing the same, and antireflective film and pattern formation method using the same
App 20050277058 - Iwabuchi, Motoaki ; et al. | 2005-12-15 |
Porous film-forming composition, patterning process, and porous sacrificial film
App 20050277756 - Iwabuchi, Motoaki ; et al. | 2005-12-15 |
Anti-reflection film material and a substrate having an anti-reflection film and a method for forming a pattern
App 20040191479 - Hatakeyama, Jun ; et al. | 2004-09-30 |
Organosiloxane polymer, photo-curable resin composition, patterning process, and substrate protective coating
Grant 6,590,010 - Kato , et al. July 8, 2 | 2003-07-08 |
Positive resist composition suitable for lift-off technique and pattern forming method
Grant 6,440,646 - Ueda , et al. August 27, 2 | 2002-08-27 |
Organosiloxane polymer, photo-curable resin composition, patterning process, and substrate protective coating
App 20020055550 - Kato, Hideto ; et al. | 2002-05-09 |
Heat-curable photosensitive compositions
App 20010038965 - Ueda, Takafumi ; et al. | 2001-11-08 |
Positive resist composition suitable for lift-off technique and pattern forming method
App 20010018160 - Ueda, Takafumi ; et al. | 2001-08-30 |
Positive resist composition suitable for lift-off technique and pattern forming method
Grant 6,210,855 - Ueda , et al. April 3, 2 | 2001-04-03 |
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