Uchida; Ryusuke

Patent Applications and Registrations

Patent applications and USPTO patent grants for Uchida; Ryusuke.The latest application filed is for "cleaning solution, method of removing a removal target and method of etching a substrate using said cleaning solution".

Company Profile

0.6.14

Uchida; Ryusuke - Kawasaki JP
UCHIDA; Ryusuke - Kawasaki-shi JP
UCHIDA; RYUSUKE - Osaka JP
Uchida; Ryusuke - Kanagawa JP
Uchida; Ryusuke - Hillsboro OR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Cleaning solution, method of removing a removal target and method of etching a substrate using said cleaning solution Grant 10,363,585 - Shirai , et al.	2019-07-30
Cleaning Solution, Method Of Removing A Removal Target And Method Of Etching A Substrate Using Said Cleaning Solution App 20170309468 - SHIRAI; Yuriko ; et al.	2017-10-26
Perovskite Solar Cell App 20170018371 - SUZUKA; MICHIO ; et al.	2017-01-19
Photovoltaic Device Comprising Porous Titanium Oxide Layer, First Hole Transport Layer, And Second Hole Transport Layer App 20160343514 - UCHIDA; RYUSUKE ; et al.	2016-11-24
Resist Composition For Supercritical Development App 20070196764 - HIROSAKI; Takako ; et al.	2007-08-23
Positive-working chemical-amplification photoresist composition Grant 7,147,984 - Yukawa , et al. December 12, 2	2006-12-12
Positive-working chemical-amplification photoresist composition Grant 6,890,697 - Oomori , et al. May 10, 2	2005-05-10
Positive-working chemical-amplification photoresist composition Grant 6,869,745 - Oomori , et al. March 22, 2	2005-03-22
Positive-working chemical-amplification photoresist composition App 20050042544 - Oomori, Katsumi ; et al.	2005-02-24
Positive-working chemical-amplification photoresist composition Grant 6,815,144 - Oomori , et al. November 9, 2	2004-11-09
Positive-working chemical-amplification photoresist composition App 20040191677 - Yukawa, Hiroto ; et al.	2004-09-30
Positive-working chemical-amplification photoresist composition Grant 6,773,863 - Oomori , et al. August 10, 2	2004-08-10
Positive-working chemical-amplification photoresist composition App 20040023163 - Yukawa, Hiroto ; et al.	2004-02-05
Positive-working chemical-amplification photoresist composition App 20030152865 - Oomori, Katsumi ; et al.	2003-08-14
Positive-working chemical-amplification photoresist composition App 20020119393 - Yukawa, Hiroto ; et al.	2002-08-29
Positive-working chemical-amplification photoresist composition App 20020094489 - Oomori, Katsumi ; et al.	2002-07-18
Positive-working chemical-amplification photoresist composition and method for forming a resist pattern using the same App 20020090567 - Oomori, Katsumi ; et al.	2002-07-11
Positive-working chemical-amplification photoresist composition App 20020090571 - Oomori, Katsumi ; et al.	2002-07-11
Positive-working chemical-amplification photoresist composition App 20020090570 - Oomori, Katsumi ; et al.	2002-07-11
Positive-working chemical-amplification photoresist composition App 20020028407 - Oomori, Katsumi ; et al.	2002-03-07

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