Tweet; Douglas James

Patent Applications and Registrations

Patent applications and USPTO patent grants for Tweet; Douglas James.The latest application filed is for "cmos active pixel sensor".

Company Profile

0.9.7

Tweet; Douglas James - Camas WA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
CMOS active pixel sensor Grant 7,800,148 - Lee , et al. September 21, 2	2010-09-21
CMOS Active Pixel Sensor App 20080303072 - Lee; Jong-Jan ; et al.	2008-12-11
Method to form thick relaxed SiGe layer with trench structure Grant 7,226,504 - Maa , et al. June 5, 2	2007-06-05
Integrated circuit metal oxide semiconductor transistor Grant 6,759,695 - Ma , et al. July 6, 2	2004-07-06
Method to form relaxed sige layer with high ge content Grant 6,746,902 - Maa , et al. June 8, 2	2004-06-08
Integrated circuit metal oxide semiconductor transistor App 20040077136 - Ma, Yanjun ; et al.	2004-04-22
Thermally stable nickel germanosilicide formed on SiGe Grant 6,627,919 - Maa , et al. September 30, 2	2003-09-30
Silicon-germanium MOSFET with deposited gate dielectric and metal gate electrode and method for making the same Grant 6,620,664 - Ma , et al. September 16, 2	2003-09-16
Silicon-germanium Mosfet With Deposited Gate Dielectric And Metal Gate Electrode And Method For Making The Same App 20030146428 - Ma, Yanjun ; et al.	2003-08-07
Method to form relaxed SiGe layer with high Ge content App 20030143783 - Maa, Jer-Shen ; et al.	2003-07-31
Method to form thick relaxed SiGe Layer with trench structure App 20030140844 - Maa, Jer-Shen ; et al.	2003-07-31
Thermally stable nickel germanosilicide formed on SiGe App 20030124780 - Maa, Jer-shen ; et al.	2003-07-03
Process integration of Si1-xGex CMOS with Si1-xGex relaxation after STI formation Grant 6,583,000 - Hsu , et al. June 24, 2	2003-06-24
Method to form thermally stable nickel germanosilicide on SiGe Grant 6,506,637 - Maa , et al. January 14, 2	2003-01-14
Method to form thermally stable nickel germanosilicide on SiGe App 20020134982 - Maa, Jer-shen ; et al.	2002-09-26
Method of forming amorphous conducting diffusion barriers Grant 6,194,310 - Hsu , et al. February 27, 2	2001-02-27

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