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name:-0.016438007354736
name:-0.012517929077148
name:-0.005047082901001
TUITJE; Holger Patent Filings

TUITJE; Holger

Patent Applications and Registrations

Patent applications and USPTO patent grants for TUITJE; Holger.The latest application filed is for "normal-incidence in-situ process monitor sensor".

Company Profile
5.12.15
  • TUITJE; Holger - Fremont CA
  • Tuitje; Holger - Neuwied DE
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Normal-incidence In-situ Process Monitor Sensor
App 20210193444 - MENG; Ching Ling ;   et al.
2021-06-24
Normal-incident in-situ process monitor sensor
Grant 10,978,278 - Meng , et al. April 13, 2
2021-04-13
Self-aware And Correcting Heterogenous Platform Incorporating Integrated Semiconductor Processing Modules And Method For Using S
App 20200043764 - Clark; Robert ;   et al.
2020-02-06
Normal-incident In-situ Process Monitor Sensor
App 20200043710 - Meng; Ching Ling ;   et al.
2020-02-06
Self-aware And Correcting Heterogenous Platform Incorporating Integrated Semiconductor Processing Modules And Method For Using S
App 20200006100 - Clark; Robert ;   et al.
2020-01-02
Spatially resolved optical emission spectroscopy (OES) in plasma processing
Grant 10,473,525 - Meng , et al. Nov
2019-11-12
Advanced Optical Sensor, System, And Methodologies For Etch Processing Monitoring
App 20180286643 - TUITJE; Holger ;   et al.
2018-10-04
Spatially resolved optical emission spectroscopy (OES) in plasma processing
Grant 9,970,818 - Bao , et al. May 15, 2
2018-05-15
Differential acoustic time of flight measurement of temperature of semiconductor substrates
Grant 9,846,088 - Pei , et al. December 19, 2
2017-12-19
Spatially Resolved Optical Emission Spectroscopy (oes) In Plasma Processing
App 20170314991 - MENG; Ching-Ling ;   et al.
2017-11-02
System for in-situ film stack measurement during etching and etch control method
Grant 9,059,038 - Li , et al. June 16, 2
2015-06-16
Spatially Resolved Optical Emission Spectroscopy (oes) In Plasma Processing
App 20150124250 - BAO; Junwei ;   et al.
2015-05-07
Differential Acoustic Time Of Flight Measurement Of Temperature Of Semiconductor Substrates
App 20150078416 - PEI; Jun ;   et al.
2015-03-19
System For In-situ Film Stack Measurement During Etching And Etch Control Method
App 20140024143 - LI; Shifang ;   et al.
2014-01-23
Diffraction order sorting filter for optical metrology
Grant 8,107,073 - Norton , et al. January 31, 2
2012-01-31
Calibration method for optical metrology
Grant 7,924,422 - Stanke , et al. April 12, 2
2011-04-12
Diffraction Order Sorting Filter For Optical Metrology
App 20100202055 - NORTON; Adam ;   et al.
2010-08-12
Calibration Method For Optical Metrology
App 20100201981 - STANKE; Fred ;   et al.
2010-08-12
Matching optical metrology tools using spectra enhancement
Grant 7,505,148 - Vuong , et al. March 17, 2
2009-03-17
Matching optical metrology tools using diffraction signals
Grant 7,446,888 - Stanke , et al. November 4, 2
2008-11-04
Matching optical metrology tools using hypothetical profiles
Grant 7,446,887 - Stanke , et al. November 4, 2
2008-11-04
Drift compensation for an optical metrology tool
Grant 7,428,044 - Vuong , et al. September 23, 2
2008-09-23
Drift compensation for an optical metrology tool
App 20080117437 - Vuong; Vi ;   et al.
2008-05-22
Matching optical metrology tools using spectra enhancement
App 20080117411 - Vuong; Vi ;   et al.
2008-05-22
Matching optical metrology tools using diffraction signals
App 20070268498 - Stanke; Fred ;   et al.
2007-11-22
Matching optical metrology tools using hypothetical profiles
App 20070268497 - Stanke; Fred ;   et al.
2007-11-22
Apparatus for evaluating measuring values
Grant 5,621,220 - Muehlenbein , et al. April 15, 1
1997-04-15

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