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name:-0.016865015029907
name:-0.11709213256836
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Tsuruta; Kaoru Patent Filings

Tsuruta; Kaoru

Patent Applications and Registrations

Patent applications and USPTO patent grants for Tsuruta; Kaoru.The latest application filed is for "drawing apparatus and control method thereof".

Company Profile
0.6.7
  • Tsuruta; Kaoru - Yokohama JP
  • Tsuruta; Kaoru - Kanagawa JP
  • TSURUTA; Kaoru - Yokohama-shi JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Drawing apparatus and control method thereof
Grant 11,352,694 - Nakahashi , et al. June 7, 2
2022-06-07
Drawing Apparatus And Control Method Thereof
App 20190127847 - NAKAHASHI; Satoshi ;   et al.
2019-05-02
Charged particle beam writing apparatus and charged particle beam writing method
Grant 9,472,372 - Yamada , et al. October 18, 2
2016-10-18
Charged Particle Beam Writing Apparatus And Charged Particle Beam Writing Method
App 20160020063 - Yamada; Taku ;   et al.
2016-01-21
Charged particle beam writing apparatus, and charged particle beam writing method
Grant 9,190,245 - Motosugi , et al. November 17, 2
2015-11-17
Charged Particle Beam Writing Apparatus, And Charged Particle Beam Writing Method
App 20150228455 - MOTOSUGI; Tomoo ;   et al.
2015-08-13
Charged particle beam drawing apparatus and charged particle beam drawing method
Grant 8,748,843 - Tsuruta June 10, 2
2014-06-10
Charged Particle Beam Drawing Apparatus And Charged Particle Beam Drawing Method
App 20130037724 - TSURUTA; Kaoru
2013-02-14
Correcting substrate for charged particle beam lithography apparatus
Grant 8,183,544 - Tsuruta , et al. May 22, 2
2012-05-22
Method And System For Pattern Writing With Charged-particle Beam
App 20110089346 - Tsuruta; Kaoru
2011-04-21
Correcting Substrate For Charged Particle Beam Lithography Apparatus
App 20090242807 - TSURUTA; Kaoru ;   et al.
2009-10-01

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