loadpatents
name:-0.012271881103516
name:-0.0090329647064209
name:-0.0014879703521729
Tsunooka; Masahiro Patent Filings

Tsunooka; Masahiro

Patent Applications and Registrations

Patent applications and USPTO patent grants for Tsunooka; Masahiro.The latest application filed is for "pattern formation material and pattern formation method".

Company Profile
0.8.9
  • Tsunooka; Masahiro - Sennan JP
  • Tsunooka; Masahiro - Osaka JP
  • Tsunooka, Masahiro - Sennan-shi JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Pattern formation material and pattern formation method
Grant 6,753,132 - Kishimura , et al. June 22, 2
2004-06-22
Pattern formation material and pattern formation method
Grant 6,689,536 - Kishimura , et al. February 10, 2
2004-02-10
Pattern formation material and pattern formation method
Grant 6,645,694 - Kishimura , et al. November 11, 2
2003-11-11
Pattern formation material and pattern formation method
App 20030113670 - Kishimura, Shinji ;   et al.
2003-06-19
Pattern formation material and pattern formation method
App 20020197557 - Kishimura, Shinji ;   et al.
2002-12-26
Pattern formation material and pattern formation method
App 20020039700 - Kishimura, Shinji ;   et al.
2002-04-04
Pattern formation material and pattern formation method
App 20020037471 - Kishimura, Shinji ;   et al.
2002-03-28
Pattern forming material and pattern forming method
App 20010036599 - Matsuo, Takahiro ;   et al.
2001-11-01
Pattern forming material and pattern forming method
App 20010034000 - Matsuo, Takahiro ;   et al.
2001-10-25
Pattern formation material and method
App 20010033999 - Kishimura, Shinji ;   et al.
2001-10-25
Pattern forming material and pattern forming method
Grant 6,306,556 - Matsuo , et al. October 23, 2
2001-10-23
Pattern formation material and method
App 20010028989 - Kishimura, Shinji ;   et al.
2001-10-11
Pattern forming material and pattern forming method
App 20010024768 - Matsuo, Takahiro ;   et al.
2001-09-27
Pattern forming material and pattern forming method
Grant 6,017,683 - Endo , et al. January 25, 2
2000-01-25
Pattern forming material and pattern forming method
Grant 5,965,325 - Matsuo , et al. October 12, 1
1999-10-12
Patterning material and patterning method
Grant 5,928,840 - Matsuo , et al. July 27, 1
1999-07-27
Positive type photosensitive resinous composition
Grant 4,869,995 - Shirai , et al. September 26, 1
1989-09-26

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