Tsukune; Atsuhiro

Patent Applications and Registrations

Patent applications and USPTO patent grants for Tsukune; Atsuhiro.The latest application filed is for "semiconductor device having insulating layers containing oxygen and a barrier layer containing manganese".

Company Profile

0.10.4

Tsukune; Atsuhiro - Kawasaki JP
Tsukune; Atsuhiro - Inagi JP
Tsukune; Atsuhiro - Kanagawa JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Semiconductor device having insulating layers containing oxygen and a barrier layer containing manganese Grant 9,704,740 - Ochimizu , et al. July 11, 2	2017-07-11
Semiconductor Device Having Insulating Layers Containing Oxygen And A Barrier Layer Containing Manganese App 20170047246 - OCHIMIZU; Hirosato ; et al.	2017-02-16
Semiconductor device fabrication method Grant 8,916,468 - Ochimizu , et al. December 23, 2	2014-12-23
Semiconductor Device Having Insulating Layers Containing Oxygen And A Barrier Layer Containing Manganese App 20140353829 - OCHIMIZU; Hirosato ; et al.	2014-12-04
Semiconductor device having insulating layers containing oxygen and a barrier layer containing manganese Grant 8,836,126 - Ochimizu , et al. September 16, 2	2014-09-16
Semiconductor Device Fabrication Method App 20130273701 - Ochimizu; Hirosato ; et al.	2013-10-17
Semiconductor Device App 20100038792 - OCHIMIZU; Hirosato ; et al.	2010-02-18
Semiconductor device and method of manufacturing the same Grant 6,635,523 - Uchiyama , et al. October 21, 2	2003-10-21
Semiconductor device manufacturing apparatus and its cleaning method Grant 5,609,721 - Tsukune , et al. March 11, 1	1997-03-11
Graphite columnar heating body for semiconductor wafer heating Grant 5,233,163 - Mieno , et al. August 3, 1	1993-08-03
Chemical vapor deposition method using a plasma self-cleaning Grant 5,041,311 - Tsukune , et al. August 20, 1	1991-08-20
Method of selectively depositing tungsten upon a semiconductor substrate Grant 4,804,560 - Shioya , et al. February 14, 1	1989-02-14
Process for the formation of phosphosilicate glass coating Grant 4,781,945 - Nishimura , et al. November 1, 1	1988-11-01

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.