loadpatents
name:-0.010771036148071
name:-0.019080877304077
name:-0.0049810409545898
TSUKADA; Tsutomu Patent Filings

TSUKADA; Tsutomu

Patent Applications and Registrations

Patent applications and USPTO patent grants for TSUKADA; Tsutomu.The latest application filed is for "apparatus for exhaust gas abatement under reduced pressure".

Company Profile
4.16.8
  • TSUKADA; Tsutomu - Nagaokakyo-shi Kyoto
  • Tsukada; Tsutomu - Nagaokakyo JP
  • Tsukada; Tsutomu - Tokyo JP
  • Tsukada; Tsutomu - Chiba-ken JP
  • Tsukada; Tsutomu - Fuchu JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Apparatus For Exhaust Gas Abatement Under Reduced Pressure
App 20200122085 - MAEDA; Masashi ;   et al.
2020-04-23
Apparatus for exhaust gas abatement under reduced pressure
Grant 10,617,997 - Maeda , et al.
2020-04-14
Method For Exhaust Gas Abatement Under Reduced Pressure And Apparatus Therefor
App 20200038805 - YANAGISAWA; Michihiko ;   et al.
2020-02-06
Method And Apparatus For Exhaust Gas Abatement Under Reduced Pressure
App 20200033000 - YANAGISAWA; Michihiko ;   et al.
2020-01-30
Ammonia detoxification device
Grant 9,120,072 - Tsukada , et al. September 1, 2
2015-09-01
Ammonia Detoxification Device
App 20140056785 - Tsukada; Tsutomu ;   et al.
2014-02-27
Apparatus and method for manufacturing halogen gas and halogen gas recovery and circulatory system
App 20090260974 - Numasawa; Yoichiro ;   et al.
2009-10-22
Apparatus and method for manufacturing halogen gas and halogen gas recovery and circulatory system
App 20070086939 - Numasawa; Yoichiro ;   et al.
2007-04-19
Apparatus and method for manufacturing halogen gas and halogen gas recovery and circulatory system
App 20040035691 - Numasawa, Yoichiro ;   et al.
2004-02-26
Plasma processing apparatus
Grant 6,199,505 - Sato , et al. March 13, 2
2001-03-13
Plasma processing apparatus
Grant 6,043,608 - Samukawa , et al. March 28, 2
2000-03-28
Surface processing apparatus
Grant 5,961,776 - Sato , et al. October 5, 1
1999-10-05
Plasma processing apparatus which uses a uniquely shaped antenna to reduce the overall size of the apparatus with respect to the plasma chamber
Grant 5,565,738 - Samukawa , et al. October 15, 1
1996-10-15
Plasma etching apparatus with dielectrically isolated electrodes
Grant 4,968,374 - Tsukada , et al. November 6, 1
1990-11-06
Plasma processing apparatus
Grant 4,950,956 - Asamaki , et al. August 21, 1
1990-08-21
Vacuum processing apparatus
Grant 4,816,638 - Ukai , et al. March 28, 1
1989-03-28
Waste gas exhaust system for vacuum process apparatus
Grant 4,655,800 - Tsukada , et al. April 7, 1
1987-04-07
Dry etching apparatus comprising etching chambers of different etching rate distributions
Grant 4,482,419 - Tsukada , et al. November 13, 1
1984-11-13
Method of monitoring status of a silicon layer by detecting, emission spectra variable during etching
Grant 4,430,151 - Tsukada February 7, 1
1984-02-07
Plasma device comprising an intermediate electrode out of contact with a high frequency electrode to induce electrostatic attraction
Grant 4,399,016 - Tsukada , et al. August 16, 1
1983-08-16
Dry etching device comprising a member for bringing a specimen into electrical contact with a grounded electrode
Grant 4,376,692 - Tsukada , et al. March 15, 1
1983-03-15
Dry etching device comprising an electrode for controlling etch rate
Grant 4,352,725 - Tsukada October 5, 1
1982-10-05

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.

© 2024 USPTO.report | Privacy Policy | Resources | RSS Feed of Trademarks | Trademark Filings Twitter Feed