Tsukada; Eri

Patent Applications and Registrations

Patent applications and USPTO patent grants for Tsukada; Eri.The latest application filed is for "method of forming silicon oxide containing films".

Company Profile

0.5.6

Tsukada; Eri - Tokyo N/A JP
Tsukada; Eri - Ibaraki JP
Tsukada; Eri - Saitama JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method of forming silicon oxide containing films Grant 8,613,976 - Dussarrat , et al. December 24, 2	2013-12-24
Method Of Forming Silicon Oxide Containing Films App 20120276292 - DUSSARRAT; Christian ; et al.	2012-11-01
Method of forming silicon oxide containing films Grant 8,227,032 - Dussarrat , et al. July 24, 2	2012-07-24
Method Of Forming Silicon Oxide Containing Films App 20090232985 - Dussarrat; Christian ; et al.	2009-09-17
Method for forming dielectric or metallic films Grant 7,482,286 - Misra , et al. January 27, 2	2009-01-27
Method for forming dielectric or metallic films App 20070190807 - Misra; Ashutosh ; et al.	2007-08-16
Method for producing silicon nitride films and silicon oxynitride films by chemical vapor deposition App 20070160774 - Tsukada; Eri ; et al.	2007-07-12
Method for the fabrication of silicon nitride, silicon oxynitride, and silicon oxide films by chemical vapor deposition App 20050048204 - Dussarrat, Christian ; et al.	2005-03-03
Process for producing trifluoromethylbenzylamines Grant 6,376,712 - Narizuka , et al. April 23, 2	2002-04-23
Process for producing trifluoromethylbenzylamines App 20020013500 - Narizuka, Satoru ; et al.	2002-01-31

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