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Patent applications and USPTO patent grants for Tsui; Paul G. Y..The latest application filed is for "process for forming semiconductor device with thick and thin films".
Patent | Date |
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Process for forming semiconductor device with thick and thin films Grant 6,261,978 - Chen , et al. July 17, 2 | 2001-07-17 |
Lithographic proximity correction through subset feature modification Grant 5,958,635 - Reich , et al. September 28, 1 | 1999-09-28 |
Method for making a dual-thickness gate oxide layer using a nitride/oxide composite region Grant 5,960,289 - Tsui , et al. September 28, 1 | 1999-09-28 |
Semiconductor device with ESD protection Grant 5,744,841 - Gilbert , et al. April 28, 1 | 1998-04-28 |
Process for forming a semiconductor device with ESD protection Grant 5,733,794 - Gilbert , et al. March 31, 1 | 1998-03-31 |
Process for fabricating a MOSFET device having reduced reverse short channel effects Grant 5,552,332 - Tseng , et al. September 3, 1 | 1996-09-03 |
Process for forming a semiconductor device having a metal-semiconductor compound Grant 5,545,574 - Chen , et al. August 13, 1 | 1996-08-13 |
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