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Patent applications and USPTO patent grants for TSUCHIYA; Junji.The latest application filed is for "sealant discharge nozzle and sealant discharge apparatus".
Patent | Date |
---|---|
Sealant Discharge Nozzle And Sealant Discharge Apparatus App 20200406289 - OKAMOTO; Masayoshi ;   et al. | 2020-12-31 |
Cutting tool Grant 9,656,328 - Saito , et al. May 23, 2 | 2017-05-23 |
Drill Grant 8,734,067 - Saito , et al. May 27, 2 | 2014-05-27 |
Cutting Tool App 20120251253 - SAITO; Manabu ;   et al. | 2012-10-04 |
Drill App 20100232899 - Saito; Manabu ;   et al. | 2010-09-16 |
Resist composition and patterning process App 20070231741 - Nishi; Tsunehiro ;   et al. | 2007-10-04 |
Resist polymer, resist composition and patterning process Grant 7,135,270 - Watanabe , et al. November 14, 2 | 2006-11-14 |
Photoacid generators, chemically amplified resist compositions, and patterning process Grant 6,916,591 - Ohsawa , et al. July 12, 2 | 2005-07-12 |
Resist polymer, resist composition and patterning process App 20050031989 - Watanabe, Takeru ;   et al. | 2005-02-10 |
Switch device having self-cleaning function Grant 6,844,509 - Tsuchiya , et al. January 18, 2 | 2005-01-18 |
Connection device for stabilizing a contact with external connectors Grant 6,821,129 - Tsuchiya November 23, 2 | 2004-11-23 |
Switch device having self-cleaning function App 20040149561 - Tsuchiya, Junji ;   et al. | 2004-08-05 |
Connection device for stabilizing a contact with external connectors App 20040152346 - Tsuchiya, Junji | 2004-08-05 |
High molecular weight silicone compounds, resist compositions, and patterning method Grant 6,730,453 - Nakashima , et al. May 4, 2 | 2004-05-04 |
Photoacid generators, chemically amplified resist compositions, and patterning process App 20030215738 - Ohsawa, Youichi ;   et al. | 2003-11-20 |
High molecular weight silicone compounds, resist compositions, and patterning method App 20020058205 - Nakashima, Mutsuo ;   et al. | 2002-05-16 |
High molecular weight silicone compounds, chemically amplified positive resist compositions, and patterning method Grant 6,066,433 - Takemura , et al. May 23, 2 | 2000-05-23 |
High molecular weight silicone compound, chemically amplified positive resist composition and patterning method Grant 5,972,560 - Kaneko , et al. October 26, 1 | 1999-10-26 |
Chemically amplified positive resist composition Grant 5,882,844 - Tsuchiya , et al. March 16, 1 | 1999-03-16 |
Chemically amplified positive resist compositions Grant 5,731,126 - Takemura , et al. March 24, 1 | 1998-03-24 |
Positive resist composition Grant 5,612,170 - Takemura , et al. March 18, 1 | 1997-03-18 |
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