Tsuchiya; Hajime

Patent Applications and Registrations

Patent applications and USPTO patent grants for Tsuchiya; Hajime.The latest application filed is for "method for producing cathode material and cathode including cathode material produced thereby".

Company Profile

1.7.8

Tsuchiya; Hajime - Yokohama-City JP
Tsuchiya; Hajime - Yokohama JP
TSUCHIYA; Hajime - Osaka JP
Tsuchiya; Hajime - Kumamoto JP
Tsuchiya; Hajime - Ibaraki-ken JP
Tsuchiya; Hajime - Tokyo JP
TSUCHIYA; Hajime - Kumamoto-shi JP
Tsuchiya; Hajime - Kamamoto JP
Tsuchiya; Hajime - Kamamoto-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method For Producing Cathode Material And Cathode Including Cathode Material Produced Thereby App 20220109160 - Yoon; Yong Sub ; et al.	2022-04-07
All solid secondary battery and method of preparing all solid secondary battery Grant 9,819,019 - Fujiki , et al. November 14, 2	2017-11-14
All Solid Secondary Battery And Method Of Preparing All Solid Secondary Battery App 20150171428 - FUJIKI; Satoshi ; et al.	2015-06-18
All Solid Secondary Battery And Method Of Preparing All Solid Secondary Battery App 20150147660 - FUJIKI; Satoshi ; et al.	2015-05-28
Liquid crystal display element and projection type liquid crystal display device Grant 8,212,985 - Kuroi , et al. July 3, 2	2012-07-03
Digital converter for processing resolver signal Grant 8,188,896 - Sata , et al. May 29, 2	2012-05-29
Organic silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device Grant 7,932,295 - Tsuchiya , et al. April 26, 2	2011-04-26
Digital Converter For Processing Resolver Signal App 20110090104 - Sata; Kuniaki ; et al.	2011-04-21
Organic Silica-based Film, Method Of Forming The Same, Composition For Forming Insulating Film For Semiconductor Device, Interconnect Structure, And Semiconductor Device App 20080246153 - TSUCHIYA; Hajime ; et al.	2008-10-09
Organic silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device Grant 7,399,715 - Tsuchiya , et al. July 15, 2	2008-07-15
Liquid crystal display element and projection type liquid crystal display device App 20080055492 - Kuroi; Hidenobu ; et al.	2008-03-06
Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device Grant 7,291,567 - Tsuchiya , et al. November 6, 2	2007-11-06
Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device App 20060024980 - Tsuchiya; Hajime ; et al.	2006-02-02
Organic silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device App 20060006541 - Tsuchiya; Hajime ; et al.	2006-01-12
Method for modification of surface of pressure-sensitive adhesive with functional group Grant 6,103,302 - Minamizaki , et al. August 15, 2	2000-08-15

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