| Patent | Date |
|---|
Actinic ray-sensitive or radiation-sensitive composition, method for purifying actinic ray-sensitive or radiation-sensitive composition, pattern forming method, and method for manufacturing electronic device
Grant 11,156,915 - Tsubaki , et al. October 26, 2 | 2021-10-26 |
Treatment Liquid And Pattern Forming Method
App 20210200097 - TSUBAKI; Hideaki ; et al. | 2021-07-01 |
Treatment liquid and pattern forming method
Grant 11,042,094 - Hirano , et al. June 22, 2 | 2021-06-22 |
Treatment liquid and pattern forming method
Grant 10,962,884 - Tsubaki , et al. March 30, 2 | 2021-03-30 |
Pattern forming method, resist pattern, method for manufacturing electronic device, and electronic device
Grant 10,890,847 - Tsuchihashi , et al. January 12, 2 | 2021-01-12 |
Pattern forming method and electronic device manufacturing method
Grant 10,788,754 - Nihashi , et al. September 29, 2 | 2020-09-29 |
Pattern forming method, method for manufacturing electronic device, and laminate
Grant 10,761,426 - Tsubaki , et al. Sep | 2020-09-01 |
Pattern forming method, method for manufacturing electronic device, and laminate
Grant 10,663,864 - Nihashi , et al. | 2020-05-26 |
Rinsing liquid, pattern forming method, and electronic device manufacturing method
Grant 10,599,038 - Tsubaki , et al. | 2020-03-24 |
Developer, pattern forming method, and electronic device manufacturing method
Grant 10,562,991 - Tsubaki , et al. Feb | 2020-02-18 |
Coating Composition, Antireflection Film, Manufacturing Method Therefor, Laminate, And Solar Cell Module
App 20190334037 - FUJIMAKI; Ayana ; et al. | 2019-10-31 |
Pattern forming method and method for manufacturing electronic device
Grant 10,394,127 - Nihashi , et al. A | 2019-08-27 |
Coating Composition, Antireflection Film, Laminate, Method For Manufacturing Laminate, And Solar Cell Module
App 20190233677 - TSUBAKI; Hideaki ; et al. | 2019-08-01 |
Resist Composition, Pattern Forming Method, And Method Of Manufacturing Electronic Device
App 20190219922 - KANEKO; Akihiro ; et al. | 2019-07-18 |
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Pattern Forming Method, And Method Of Manufacturing Electronic D
App 20190219921 - TSUBAKI; Hideaki ; et al. | 2019-07-18 |
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Pattern Forming Method, And Method Of Manufacturing Electronic D
App 20190187558 - NIHASHI; Wataru ; et al. | 2019-06-20 |
Actinic Ray-sensitive Or Radiation-sensitive Composition, Method For Purifying Actinic Ray-sensitive Or Radiation-sensitive Composition, Method For Producing Actinic Ray-sensitive Or Radiation-sensitive Composition, Pattern Forming Method, And Method For Manufacturing Electronic Device
App 20190018317 - TSUBAKI; Hideaki ; et al. | 2019-01-17 |
Actinic Ray-sensitive Or Radiation-sensitive Composition, Method For Producing Actinic Ray-sensitive Or Radiation-sensitive Composition, Pattern Forming Method, And Method For Manufacturing Electronic Device
App 20180364569 - NIHASHI; Wataru ; et al. | 2018-12-20 |
Actinic Ray-sensitive Or Radiation-sensitive Composition, Method For Purifying Actinic Ray-sensitive Or Radiation-sensitive Composition, Pattern Forming Method, And Method For Manufacturing Electronic Device
App 20180364568 - TSUBAKI; Hideaki ; et al. | 2018-12-20 |
Pattern Forming Method And Method For Manufacturing Electronic Device
App 20180267404 - KANEKO; Akihiro ; et al. | 2018-09-20 |
Treatment Liquid And Pattern Forming Method
App 20180217503 - TSUBAKI; Hideaki ; et al. | 2018-08-02 |
Treatment Liquid And Pattern Forming Method
App 20180217499 - HIRANO; Shuji ; et al. | 2018-08-02 |
Developer, Pattern Forming Method, And Electronic Device Manufacturing Method
App 20180186907 - TSUBAKI; Hideaki ; et al. | 2018-07-05 |
Pattern Forming Method, Method For Manufacturing Electronic Device, And Laminate
App 20180180996 - Tsubaki; Hideaki ; et al. | 2018-06-28 |
Pattern Forming Method, Method For Manufacturing Electronic Device, And Laminate
App 20180181003 - NIHASHI; Wataru ; et al. | 2018-06-28 |
Rinsing Liquid, Pattern Forming Method, And Electronic Device Manufacturing Method
App 20180120708 - TSUBAKI; Hideaki ; et al. | 2018-05-03 |
Pattern Forming Method And Electronic Device Manufacturing Method
App 20180120705 - NIHASHI; Wataru ; et al. | 2018-05-03 |
Treatment Liquid And Pattern Forming Method
App 20180101100 - TSUBAKI; Hideaki ; et al. | 2018-04-12 |
Pattern Forming Method And Method For Manufacturing Electronic Device
App 20180017872 - NIHASHI; Wataru ; et al. | 2018-01-18 |
Organic Processing Liquid And Pattern Forming Method
App 20170285482 - TSUCHIHASHI; Toru ; et al. | 2017-10-05 |
Pattern Forming Method, Resist Pattern, Method For Manufacturing Electronic Device, And Electronic Device
App 20170075222 - TSUCHIHASHI; Toru ; et al. | 2017-03-16 |
Actinic-ray- or radiation-sensitive resin composition, resist film therefrom and method of forming pattern therewith
Grant 9,568,824 - Takahashi , et al. February 14, 2 | 2017-02-14 |
Compound, actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern formation method, and method for manufacturing electronic device using same, and electronic device
Grant 9,527,809 - Yokokawa , et al. December 27, 2 | 2016-12-27 |
Pattern Forming Method, Resist Composition For Multiple Development Used In The Pattern Forming Method, Developer For Negative Development Used In The Pattern Forming Method, And Rinsing Solution For Negative Development Used In The Pattern Forming Method
App 20160349619 - TSUBAKI; Hideaki ; et al. | 2016-12-01 |
Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic device
Grant 9,500,951 - Yokokawa , et al. November 22, 2 | 2016-11-22 |
Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device
Grant 9,470,980 - Inoue , et al. October 18, 2 | 2016-10-18 |
Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method
Grant 9,465,298 - Tsubaki , et al. October 11, 2 | 2016-10-11 |
Method of forming patterns
Grant 9,458,343 - Tsubaki October 4, 2 | 2016-10-04 |
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, manufacturing method of electronic device using the same, and electronic device
Grant 9,448,477 - Kawabata , et al. September 20, 2 | 2016-09-20 |
Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, method for manufacturing electronic device using the same, and electronic device
Grant 9,411,230 - Takizawa , et al. August 9, 2 | 2016-08-09 |
Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same
Grant 9,323,153 - Hirano , et al. April 26, 2 | 2016-04-26 |
Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern
Grant 9,323,150 - Hirano , et al. April 26, 2 | 2016-04-26 |
Pattern Forming Method, Resist Composition For Multiple Development Used In The Pattern Forming Method, Developer For Negative Development Used In The Pattern Forming Method, And Rinsing Solution For Negative Development Used In The Pattern Forming Method
App 20160103395 - TSUBAKI; Hideaki ; et al. | 2016-04-14 |
Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method
Grant 9,291,904 - Tsubaki , et al. March 22, 2 | 2016-03-22 |
Compound, Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Resist Film, And Pattern Formation Method, And Method For Manufacturing Electronic Device Using Same, And Electronic Device
App 20160024005 - YOKOKAWA; NATSUMI ; et al. | 2016-01-28 |
Method Of Forming Patterns
App 20160009936 - TSUBAKI; Hideaki | 2016-01-14 |
Actinic ray-sensitive or radiation-sensitive composition, actinic ray-sensitive or radiation-sensitive film using the same, pattern forming method, manufacturing method of electronic device, electronic device and resin
Grant 9,223,215 - Yokokawa , et al. December 29, 2 | 2015-12-29 |
Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic device
Grant 9,188,865 - Yokokawa , et al. November 17, 2 | 2015-11-17 |
Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same
Grant 9,188,862 - Hirano , et al. November 17, 2 | 2015-11-17 |
Method of forming patterns
Grant 9,176,386 - Tsubaki November 3, 2 | 2015-11-03 |
Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device
Grant 9,170,489 - Takizawa , et al. October 27, 2 | 2015-10-27 |
Actinic Ray-sensitive Or Radiation-sensitive Composition, Resist Film Using The Same, Pattern Forming Method, Method For Manufacturing Electronic Device, And Electronic Device
App 20150293446 - YOKOKAWA; Natsumi ; et al. | 2015-10-15 |
Actinic Ray-sensitive Or Radiation-sensitive Composition, Resist Film Using The Same, Pattern Forming Method, Method For Manufacturing Electronic Device, And Electronic Device
App 20150284492 - YOKOKAWA; Natsumi ; et al. | 2015-10-08 |
Actinic-ray- or radiation-sensitive resin composition, actinic-ray-or radiation-sensitive film therefrom, method of forming pattern, process for manufacturing semiconductor device, semiconductor device and compound
Grant 9,152,047 - Kawabata , et al. October 6, 2 | 2015-10-06 |
Chemical amplification resist composition, and mold preparation method and resist film using the same
Grant 9,090,722 - Fujimori , et al. July 28, 2 | 2015-07-28 |
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Resist Film, Pattern Forming Method, Manufacturing Method Of Electronic Device Using The Same, And Electronic Device
App 20150185612 - KAWABATA; Takeshi ; et al. | 2015-07-02 |
Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition
Grant 9,052,590 - Takahashi , et al. June 9, 2 | 2015-06-09 |
Resist composition for negative tone development and pattern forming method using the same
Grant 9,046,782 - Tsubaki June 2, 2 | 2015-06-02 |
Actinic-ray- Or Radiation-sensitive Resin Composition, Actinic-ray- Or Radiation-sensitive Film Therefrom, Method Of Forming Pattern, Process For Manufacturing Semiconductor Device, And Semiconductor Device
App 20150118628 - KAWABATA; Takeshi ; et al. | 2015-04-30 |
Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition
Grant 9,005,870 - Takahashi , et al. April 14, 2 | 2015-04-14 |
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Resist Film And Pattern Forming Method Using The Same, Manufacturing Method Of Semiconductor Device, And Semiconductor Device
App 20150086912 - KAWABATA; Takeshi ; et al. | 2015-03-26 |
Pattern Forming Method, Resist Composition For Multiple Development Used In The Pattern Forming Method, Developer For Negative Development Used In The Pattern Forming Method, And Rinsing Solution For Negative Development Used In The Pattern Forming Method
App 20150079522 - TSUBAKI; Hideaki ; et al. | 2015-03-19 |
Method Of Forming Patterns
App 20150044616 - TSUBAKI; Hideaki | 2015-02-12 |
Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method
Grant 8,951,718 - Tsubaki , et al. February 10, 2 | 2015-02-10 |
Pattern Forming Method, Method For Selecting Heating Temperature In Pattern Forming Method, Extreme Ultraviolet-sensitive Resin Composition, Resist Film, Manufacturing Method Of Electronic Device Using The Same, And Electronic Device
App 20150017576 - INOUE; Naoki ; et al. | 2015-01-15 |
Actinic Ray-sensitive Or Radiation-sensitive Composition, Resist Film Using The Same, Pattern Forming Method, Method For Manufacturing Electronic Device, And Electronic Device
App 20150010857 - YOKOKAWA; Natsumi ; et al. | 2015-01-08 |
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, And, Actinic Ray-sensitive Or Radiation-sensitive Film And Pattern Forming Method, Each Using The Same
App 20150004533 - HIRANO; Shuji ; et al. | 2015-01-01 |
Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the composition
Grant 8,900,791 - Tsuchimura , et al. December 2, 2 | 2014-12-02 |
Actinic-ray- Or Radiation-sensitive Resin Composition, Actinic-ray-or Radiation-sensitive Film Therefrom, Method Of Forming Pattern, Process For Manufacturing Semiconductor Device, Semiconductor Device And Compound
App 20140349223 - KAWABATA; Takeshi ; et al. | 2014-11-27 |
Method of forming patterns
Grant 8,895,225 - Tsubaki November 25, 2 | 2014-11-25 |
Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern
Grant 8,865,389 - Hirano , et al. October 21, 2 | 2014-10-21 |
Method of forming patterns
Grant 8,852,847 - Tsubaki October 7, 2 | 2014-10-07 |
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method using the same, and resin
Grant 8,852,845 - Takahashi , et al. October 7, 2 | 2014-10-07 |
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, And, Actinic Ray-sensitive Or Radiation-sensitive Film And Pattern Forming Method, Each Using The Same
App 20140295332 - HIRANO; Shuji ; et al. | 2014-10-02 |
Actinic Ray-sensitive Or Radiation-sensitive Composition, Actinic Ray-sensitive Or Radiation-sensitive Film Using The Same, Pattern Forming Method, Manufacturing Method Of Electronic Device, Electronic Device And Resin
App 20140272692 - YOKOKAWA; Natsumi ; et al. | 2014-09-18 |
Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, manufacturing method of electronic device, and electronic device
Grant 8,822,129 - Iwato , et al. September 2, 2 | 2014-09-02 |
Actinic-ray- Or Radiation-sensitive Resin Composition, Actinic-ray- Or Radiation-sensitive Film Therefrom And Method Of Forming Pattern
App 20140227636 - HIRANO; Shuji ; et al. | 2014-08-14 |
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Resist Film And Pattern Forming Method Each Using The Composition, Manufacturing Method Of Semiconductor Device, Semiconductor Device And Production Method Of Resin
App 20140212797 - KAWABATA; Takeshi ; et al. | 2014-07-31 |
Pattern-forming Method, Electron Beam-sensitive Or Extreme Ultraviolet Radiation-sensitive Resin Composition, Resist Film, Manufacturing Method Of Electronic Device Using Them And Electronic Device
App 20140212811 - INOUE; Naoki ; et al. | 2014-07-31 |
Pattern Forming Method, Electron Beam-sensitive Or Extreme Ultraviolet-sensitive Composition, Resist Film, Method For Manufacturing Electronic Device Using The Same, And Electronic Device
App 20140212796 - TAKIZAWA; Hiroo ; et al. | 2014-07-31 |
Pattern-forming Method, Electron Beam-sensitive Or Extreme Ultraviolet Radiation-sensitive Resin Composition, Resist Film, Manufacturing Method Of Electronic Device Using Them And Electronic Device
App 20140199617 - TSUBAKI; Hideaki ; et al. | 2014-07-17 |
Pattern-forming Method, Electron Beam-sensitive Or Extreme Ultraviolet Radiation-sensitive Resin Composition, Resist Film, Manufacturing Method Of Electronic Device Using Them And Electronic Device
App 20140193749 - TAKIZAWA; Hiroo ; et al. | 2014-07-10 |
Method Of Forming Patterns
App 20140080068 - TSUBAKI; Hideaki | 2014-03-20 |
Method Of Forming Patterns
App 20140057209 - TSUBAKI; Hideaki | 2014-02-27 |
Resist composition for negative tone development and pattern forming method using the same
Grant 8,642,253 - Tsubaki February 4, 2 | 2014-02-04 |
Actinic-ray-or Radiation-sensitive Resin Composition, Actinic-ray- Or Radiation-sensitive Resin Film Therefrom And Method Of Forming Pattern Using The Composition
App 20140030643 - TAKAHASHI; Toshiya ; et al. | 2014-01-30 |
Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the composition
Grant 8,637,220 - Tsuchimura , et al. January 28, 2 | 2014-01-28 |
Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method
Grant 8,637,229 - Tsubaki , et al. January 28, 2 | 2014-01-28 |
Negative resist pattern forming method, developer and negative chemical-amplification resist composition used therefor, and resist pattern
Grant 8,637,222 - Tsuchihashi , et al. January 28, 2 | 2014-01-28 |
Method of forming patterns
Grant 8,632,942 - Tsubaki January 21, 2 | 2014-01-21 |
Method of forming patterns
Grant 8,617,794 - Tsubaki December 31, 2 | 2013-12-31 |
Active light ray sensitive or radioactive ray sensitive resin composition, and active light ray sensitive or radioactive ray sensitive film and pattern forming method using the same
Grant 8,603,727 - Kawabata , et al. December 10, 2 | 2013-12-10 |
Pattern forming method, and resist composition, developer and rinsing solution used in the pattern forming method
Grant 8,603,733 - Tarutani , et al. December 10, 2 | 2013-12-10 |
Organic solvent development or multiple development pattern-forming method using electron beams or EUV rays
Grant 8,546,063 - Tsubaki , et al. October 1, 2 | 2013-10-01 |
Method For Forming A Resist Pattern And A Method For Processing A Substrate Utilizing The Method For Forming A Resist Pattern
App 20130236837 - HONDA; Soichiro ; et al. | 2013-09-12 |
Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method
Grant 8,530,148 - Tsubaki , et al. September 10, 2 | 2013-09-10 |
Pattern forming method
Grant 8,476,001 - Tsubaki July 2, 2 | 2013-07-02 |
Surface-treating agent for pattern formation and pattern-forming method using the surface-treating agent
Grant 8,431,330 - Hoshino , et al. April 30, 2 | 2013-04-30 |
Pattern Forming Method, Electron Beam-sensitive Or Extreme Ultraviolet-sensitive Composition, Resist Film, Manufacturing Method Of Electronic Device, And Electronic Device
App 20130084438 - IWATO; Kaoru ; et al. | 2013-04-04 |
Actinic-ray- Or Radiation-sensitive Resin Composition, Actinic-ray- Or Radiation-sensitive Resin Film Therefrom And Method Of Forming Pattern Using The Composition
App 20130045445 - TAKAHASHI; Toshiya ; et al. | 2013-02-21 |
Pattern Forming Method, Resist Composition For Multiple Development Used In The Pattern Forming Method, Developer For Negative Development Used In The Pattern Forming Method, And Rinsing Solution For Negative Development Used In The Pattern Forming Method
App 20120315449 - TSUBAKI; Hideaki ; et al. | 2012-12-13 |
Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method
Grant 8,241,840 - Tsubaki , et al. August 14, 2 | 2012-08-14 |
Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method
Grant 8,227,183 - Tsubaki , et al. July 24, 2 | 2012-07-24 |
Actinic-ray- Or Radiation-sensitive Resin Composition And Method Of Forming Pattern Using The Composition
App 20120156618 - Takahashi; Hidenori ; et al. | 2012-06-21 |
Method Of Forming Patterns
App 20120135355 - Tsubaki; Hideaki | 2012-05-31 |
Actinic-ray- Or Radiation-sensitive Resin Composition And Method Of Forming Pattern Using The Composition
App 20120094235 - Tsuchihashi; Toru ; et al. | 2012-04-19 |
Method Of Forming Patterns
App 20120088194 - TSUBAKI; Hideaki | 2012-04-12 |
Active Light Ray Sensitive Or Radioactive Ray Sensitive Resin Composition, And Active Light Ray Sensitive Or Radioactive Ray Sensitive Film And Pattern Forming Method Using The Same
App 20120082939 - KAWABATA; Takeshi ; et al. | 2012-04-05 |
Actinic-ray- Or Radiation-sensitive Resin Composition, Actinic-ray- Or Radiation-sensitive Film Therefrom And Method Of Forming Pattern
App 20120076997 - HIRANO; Shuji ; et al. | 2012-03-29 |
Surface-treating Agent For Pattern Formation And Pattern-forming Method Using The Surface-treating Agent
App 20120076991 - HOSHINO; Wataru ; et al. | 2012-03-29 |
Pattern Forming Method, Resist Composition For Multiple Development Used In The Pattern Forming Method, Developer For Negative Development Used In The Pattern Forming Method, And Rinsing Solution For Negative Development Used In The Pattern Forming Method
App 20120058436 - TSUBAKI; Hideaki ; et al. | 2012-03-08 |
Actinic-ray- Or Radiation-sensitive Resin Composition, Resist Film Therefrom And Method Of Forming Pattern Therewith
App 20120034559 - TAKAHASHI; Toshiya ; et al. | 2012-02-09 |
Chemical Amplification Resist Composition, And Mold Preparation Method And Resist Film Using The Same
App 20120006788 - Fujimori; Toru ; et al. | 2012-01-12 |
Actinic-ray- Or Radiation-sensitive Resin Composition And Method Of Forming Pattern Using The Composition
App 20120003585 - Tsubaki; Hideaki ; et al. | 2012-01-05 |
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, And Resist Film And Pattern Forming Method Using The Composition
App 20120003583 - TSUCHIMURA; Tomotaka ; et al. | 2012-01-05 |
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, And Resist Film And Pattern Forming Method Using The Same
App 20120003590 - HIRANO; Shuji ; et al. | 2012-01-05 |
Method of forming patterns
Grant 8,088,557 - Tsubaki January 3, 2 | 2012-01-03 |
Surface-treating agent for pattern formation and pattern-forming method using the surface-treating agent
Grant 8,088,566 - Hoshino , et al. January 3, 2 | 2012-01-03 |
Positive resist composition and pattern forming method
Grant 8,088,550 - Tarutani , et al. January 3, 2 | 2012-01-03 |
Actinic-ray- Or Radiation-sensitive Resin Composition, And Resist Film And Pattern Forming Method Using The Same
App 20110318693 - TAKAHASHI; Hidenori ; et al. | 2011-12-29 |
Resist Composition For Semiconductor, And Resist Film And Pattern Forming Method Using The Same
App 20110318691 - TSUCHIMURA; Tomotaka ; et al. | 2011-12-29 |
Pattern Forming Method, And Resist Composition, Developer And Rinsing Solution Used In The Pattern Forming Method
App 20110305992 - TARUTANI; Shinji ; et al. | 2011-12-15 |
Organic Solvent Development Or Multiple Development Pattern-forming Method Using Electron Beams Or Euv Rays
App 20110300485 - Tsubaki; Hideaki ; et al. | 2011-12-08 |
Method of forming patterns
Grant 8,071,272 - Tsubaki December 6, 2 | 2011-12-06 |
Negative Resist Pattern Forming Method, Developer And Negative Chemical-amplification Resist Composition Used Therefor, And Resist Pattern
App 20110287234 - Tsuchihashi; Toru ; et al. | 2011-11-24 |
Pattern Forming Method
App 20110250543 - Tsubaki; Hideaki | 2011-10-13 |
Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method
Grant 8,034,547 - Tsubaki , et al. October 11, 2 | 2011-10-11 |
Pattern forming method, and resist composition, developer and rinsing solution used in the pattern forming method
Grant 8,017,304 - Tarutani , et al. September 13, 2 | 2011-09-13 |
Method of forming patterns
Grant 8,017,298 - Tsubaki September 13, 2 | 2011-09-13 |
Method of forming patterns
Grant 7,998,655 - Tsubaki August 16, 2 | 2011-08-16 |
Actinic-ray- Or Radiation-sensitive Resin Composition And Method Of Forming Pattern Using The Composition
App 20110183263 - TAKAHASHI; Hidenori ; et al. | 2011-07-28 |
Pattern forming method
Grant 7,985,534 - Tsubaki July 26, 2 | 2011-07-26 |
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition And Method Of Forming Pattern With The Composition
App 20110171577 - TSUCHIMURA; Tomotaka ; et al. | 2011-07-14 |
Method Of Forming Patterns
App 20110076625 - TSUBAKI; Hideaki | 2011-03-31 |
Resist Composition For Negative Tone Development And Pattern Forming Method Using The Same
App 20110045413 - TSUBAKI; Hideaki | 2011-02-24 |
Method Of Forming Patterns
App 20110020755 - TSUBAKI; Hideaki | 2011-01-27 |
Pattern Forming Method, Resist Composition To Be Used In The Pattern Forming Method, Negative Developing Solution To Be Used In The Pattern Forming Method And Rinsing Solution For Negative Development To Be Used In The Pattern Forming Method
App 20100330507 - TSUBAKI; Hideaki ; et al. | 2010-12-30 |
Pattern Forming Method, Resist Composition For Multiple Development Used In The Pattern Forming Method, Developer For Negative Development Used In The Pattern Forming Method, And Rinsing Solution For Negative Development Used In The Pattern Forming Method
App 20100323305 - TSUBAKI; Hideaki ; et al. | 2010-12-23 |
Resist composition for negative tone development and pattern forming method using the same
Grant 7,851,140 - Tsubaki December 14, 2 | 2010-12-14 |
Photosensitive composition and pattern forming method using the same
Grant 7,824,836 - Tsubaki November 2, 2 | 2010-11-02 |
Pattern Forming Method
App 20100239984 - Tsubaki; Hideaki | 2010-09-23 |
Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition
Grant 7,799,505 - Kodama , et al. September 21, 2 | 2010-09-21 |
Resist Composition For Negative Tone Development And Pattern Forming Method Using The Same
App 20100190106 - Tsubaki; Hideaki | 2010-07-29 |
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Resist Film, Pattern Forming Method Using The Same, And Resin
App 20100183975 - TAKAHASHI; Hidenori ; et al. | 2010-07-22 |
Resist Composition For Negative Tone Development And Pattern Forming Method Using The Same
App 20100167201 - Tsubaki; Hideaki | 2010-07-01 |
Positive photosensitive composition and a pattern-forming method using the same
Grant 7,700,261 - Kodama , et al. April 20, 2 | 2010-04-20 |
Pattern Forming Method, And Resist Composition, Developer And Rinsing Solution Used In The Pattern Forming Method
App 20100040972 - TARUTANI; Shinji ; et al. | 2010-02-18 |
Pattern Forming Method, And Resist Composition, Developer And Rinsing Solution Used In The Pattern Forming Method
App 20100040971 - TARUTANI; Shinji ; et al. | 2010-02-18 |
Surface Treating Agent For Resist-pattern, And Pattern-forming Method Using Same
App 20090280440 - Tarutani; Shinji ; et al. | 2009-11-12 |
Positive Photosensitive Composition And A Pattern-forming Method Using The Same
App 20090081581 - Kodama; Kunihiko ; et al. | 2009-03-26 |
Method Of Forming Patterns
App 20090042147 - Tsubaki; Hideaki | 2009-02-12 |
Positive Resist Composition And Pattern Forming Mehtod
App 20090035692 - TARUTANI; Shinji ; et al. | 2009-02-05 |
Positive Resist Composition And Pattern Forming Method
App 20090023096 - TARUTANI; Shinji ; et al. | 2009-01-22 |
Pattern Forming Method
App 20090017400 - Tarutani; Shinji ; et al. | 2009-01-15 |
Pattern Forming Method, Resist Composition To Be Used In The Pattern Forming Method, Negative Developing Solution To Be Used In The Pattern Forming Method And Rinsing Solution For Negative Development To Be Used In The Pattern Forming Method
App 20090011366 - TSUBAKI; Hideaki ; et al. | 2009-01-08 |
Pattern Forming Method
App 20090011362 - TARUTANI; Shinji ; et al. | 2009-01-08 |
Method Of Forming Patterns
App 20080318171 - TSUBAKI; Hideaki | 2008-12-25 |
Photosensitive Composition And Pattern Forming Method Using The Same
App 20080274421 - TSUBAKI; Hideaki | 2008-11-06 |
Pattern Forming Method, Resist Composition For Multiple Development Used In The Pattern Forming Method, Developer For Negative Development Used In The Pattern Forming Method, And Rinsing Solution For Negative Development Used In The Pattern Forming Method
App 20080261150 - TSUBAKI; Hideaki ; et al. | 2008-10-23 |
Surface-treating Agent For Pattern Formation And Pattern-forming Method Using The Surface-treating Agent
App 20080241742 - HOSHINO; Wataru ; et al. | 2008-10-02 |
Pattern Forming Method, Resist Composition For Multiple Development Used In The Pattern Forming Method, Developer For Negative Development Used In The Pattern Forming Method, And Rinsing Solution For Negative Development Used In The Pattern Forming Method
App 20080187860 - TSUBAKI; Hideaki ; et al. | 2008-08-07 |
Photosensitive Composition, Compound For Use In The Photosensitive Composition And Pattern Forming Method Using The Photosensitive Composition
App 20080138742 - KODAMA; Kunihiko ; et al. | 2008-06-12 |
Positive resist composition and pattern forming method using the same
Grant 7,338,744 - Tsubaki , et al. March 4, 2 | 2008-03-04 |
Positive resist composition and pattern forming method using the same
App 20060194148 - Tsubaki; Hideaki ; et al. | 2006-08-31 |
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