| Patent | Date |
|---|
Metrology Method And Apparatus, Computer Program And Lithographic System
App 20220155694 - TURNER; Paul Jonathan ; et al. | 2022-05-19 |
Method For Metrology Optimization
App 20220082944 - REHMAN; Samee Ur ; et al. | 2022-03-17 |
Method And Apparatus To Determine A Patterning Process Parameter
App 20220066330 - TSIATMAS; Anagnostis ; et al. | 2022-03-03 |
Method And Apparatus To Determine A Patterning Process Parameter
App 20210384086 - VAN LEEST; Adriaan Johan ; et al. | 2021-12-09 |
Method And Apparatus To Determine A Patterning Process Parameter
App 20210335678 - VAN LEEST; Adriaan Johan ; et al. | 2021-10-28 |
Method and apparatus to determine a patterning process parameter
Grant 11,143,972 - Tsiatmas , et al. October 12, 2 | 2021-10-12 |
Method and apparatus to determine a patterning process parameter
Grant 11,145,557 - Van Leest , et al. October 12, 2 | 2021-10-12 |
Method and apparatus to determine a patterning process parameter
Grant 11,101,185 - Van Leest , et al. August 24, 2 | 2021-08-24 |
Method and apparatus to determine a patterning process parameter
Grant 11,101,184 - Van Leest , et al. August 24, 2 | 2021-08-24 |
Method Of Determining Information About A Patterning Process, Method Of Reducing Error In Measurement Data, Method Of Calibrating A Metrology Process, Method Of Selecting Metrology Targets
App 20210255552 - VENSELAAR; Joannes Jitse ; et al. | 2021-08-19 |
Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method
Grant 11,092,900 - Van Der Schaar , et al. August 17, 2 | 2021-08-17 |
Method of determining information about a patterning process, method of reducing error in measurement data, method of calibrating a metrology process, method of selecting metrology targets
Grant 11,022,897 - Venselaar , et al. June 1, 2 | 2021-06-01 |
Method and apparatus for measuring a parameter of interest using image plane detection techniques
Grant 10,983,445 - Pandey , et al. April 20, 2 | 2021-04-20 |
Method And Apparatus To Determine A Patterning Process Parameter
App 20210035871 - VAN LEEST; Adriaan Johan ; et al. | 2021-02-04 |
Substrate, metrology apparatus and associated methods for a lithographic process
Grant 10,871,367 - Verma , et al. December 22, 2 | 2020-12-22 |
Method and apparatus to determine a patterning process parameter
Grant 10,811,323 - Van Leest , et al. October 20, 2 | 2020-10-20 |
Method of determining a value of a parameter of interest, method of cleaning a signal containing information about a parameter of interest, device manufacturing method
Grant 10,795,269 - Zhou , et al. October 6, 2 | 2020-10-06 |
Method and apparatus to determine a patterning process parameter
Grant 10,782,617 - Tsiatmas , et al. Sept | 2020-09-22 |
Substrate, Metrology Apparatus And Associated Methods For A Lithographic Process
App 20200284578 - VERMA; Alok ; et al. | 2020-09-10 |
Method of measuring a parameter of a device manufacturing process, metrology apparatus, substrate, target, device manufacturing system, and device manufacturing method
Grant 10,747,122 - Tsiatmas , et al. A | 2020-08-18 |
Method And Apparatus To Determine A Patterning Process Parameter
App 20200185281 - VAN LEEST; Adriaan Johan ; et al. | 2020-06-11 |
Substrate, metrology apparatus and associated methods for a lithographic process
Grant 10,677,589 - Verma , et al. | 2020-06-09 |
Method And Apparatus To Determine A Patterning Process Parameter
App 20200126872 - VAN LEEST; Adriaan Johan ; et al. | 2020-04-23 |
Method and apparatus to determine a patterning process parameter, associated with a change in a physical configuration, using measured pixel optical characteristic values
Grant 10,615,084 - Van Leest , et al. | 2020-04-07 |
Method of optimizing a metrology process
Grant 10,585,354 - Tsiatmas , et al. | 2020-03-10 |
Method of determining a value of a parameter of interest of a target formed by a patterning process
Grant 10,585,048 - Rehman , et al. | 2020-03-10 |
Method and Apparatus for Measuring a Parameter of a Lithographic Process, Substrate and Patterning Devices for use in the Method
App 20200073254 - VAN DER SCHAAR; Maurits ; et al. | 2020-03-05 |
Method of determining an optimal focus height for a metrology apparatus
Grant 10,571,363 - Medvedyeva , et al. Feb | 2020-02-25 |
Method and apparatus to determine a patterning process parameter
Grant 10,546,790 - Van Leest , et al. Ja | 2020-01-28 |
Beat patterns for alignment on small metrology targets
Grant 10,488,768 - Fagginger Auer , et al. Nov | 2019-11-26 |
Method Of Measuring A Parameter Of A Device Manufacturing Process, Metrology Apparatus, Substrate, Target, Device Manufacturing
App 20190354024 - TSIATMAS; Anagnostis ; et al. | 2019-11-21 |
Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method
Grant 10,481,503 - Van Der Schaar , et al. Nov | 2019-11-19 |
Method Of Determining A Value Of A Parameter Of Interest Of A Target Formed By A Patterning Process
App 20190323972 - REHMAN; Samee Ur ; et al. | 2019-10-24 |
Method and apparatus to determine a patterning process parameter using an asymmetric optical characteristic distribution portion
Grant 10,453,758 - Van Leest , et al. Oc | 2019-10-22 |
Method And Apparatus For Measuring A Parameter Of Interest Using Image Plane Detection Techniques
App 20190250094 - PANDEY; Nitesh ; et al. | 2019-08-15 |
Method Of Determining An Optimal Focus Height For A Metrology Apparatus
App 20190242782 - MEDVEDYEVA; Mariya Vyacheslavivna ; et al. | 2019-08-08 |
Method Of Optimizing A Metrology Process
App 20190243253 - TSIATMAS; Anagnostis ; et al. | 2019-08-08 |
Method Of Determining Information About A Patterning Process, Method Of Reducing Error In Measurement Data, Method Of Calibratin
App 20190171115 - VENSELAAR; Joannes Jitse ; et al. | 2019-06-06 |
Method And Apparatus To Determine A Patterning Process Parameter
App 20190155173 - Tsiatmas; Anagnostis ; et al. | 2019-05-23 |
Method Of Determining A Value Of A Parameter Of Interest, Method Of Cleaning A Signal Containing Information About A Parameter Of Interest, Device Manufacturing Method
App 20190129316 - ZHOU; Zili ; et al. | 2019-05-02 |
Beat Patterns For Alignment On Small Metrology Targets
App 20190072860 - FAGGINGER AUER; Bastiaan Onne ; et al. | 2019-03-07 |
Substrate, Metrology Apparatus And Associated Methods For A Lithographic Process
App 20190063911 - Verma; Alok ; et al. | 2019-02-28 |
Method And Apparatus To Determine A Patterning Process Parameter
App 20190049859 - TSIATMAS; Anagnostis ; et al. | 2019-02-14 |
Method And Apparatus To Determine A Patterning Process Parameter
App 20170255736 - VAN LEEST; Adriaan Johan ; et al. | 2017-09-07 |
Method And Apparatus To Determine A Patterning Process Parameter
App 20170255737 - VAN LEEST; Adriaan Johan ; et al. | 2017-09-07 |
Method And Apparatus To Determine A Patterning Process Parameter
App 20170255112 - VAN LEEST; Adriaan Johan ; et al. | 2017-09-07 |
Method And Apparatus To Determine A Patterning Process Parameter
App 20170255738 - VAN LEEST; Adriaan Johan ; et al. | 2017-09-07 |
Method And Apparatus To Determine A Patterning Process Parameter
App 20170256465 - VAN LEEST; Adriaan Johan ; et al. | 2017-09-07 |
Method And Apparatus for Measuring a Parameter of a Lithographic Process, Substrate and Patterning Devices for use in the Method
App 20170059999 - VAN DER SCHAAR; Maurits ; et al. | 2017-03-02 |
Magnetic field generator
Grant 8,780,677 - Zheludev , et al. July 15, 2 | 2014-07-15 |
Magnetic Field Generator
App 20130176836 - Zheludev; Nikolay Ivanovich ; et al. | 2013-07-11 |
| 