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name:-0.022418975830078
name:-0.019973993301392
name:-0.017889022827148
Tseng; Chin-Yuan Patent Filings

Tseng; Chin-Yuan

Patent Applications and Registrations

Patent applications and USPTO patent grants for Tseng; Chin-Yuan.The latest application filed is for "method of making semiconductor device which includes fins".

Company Profile
18.18.21
  • Tseng; Chin-Yuan - Taipei TW
  • TSENG; Chin-Yuan - Hsinchu TW
  • TSENG; Chin-Yuan - Taipei City TW
  • Tseng; Chin-Yuan - Hsin-Chu TW
  • TSENG; CHIN-YUAN - Kaohsiung TW
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Method for forming semiconductor device structure
Grant 11,437,239 - Lai , et al. September 6, 2
2022-09-06
Method Of Making Semiconductor Device Which Includes Fins
App 20220108990 - CHEN; Chih-Liang ;   et al.
2022-04-07
Semiconductor device which includes fins and method of making same
Grant 11,222,899 - Chen , et al. January 11, 2
2022-01-11
Fin patterning methods for increased process margins
Grant 11,081,354 - Tseng , et al. August 3, 2
2021-08-03
Method For Forming Semiconductor Device Structure
App 20210225649 - LAI; Chih-Ming ;   et al.
2021-07-22
High-Density Semiconductor Device
App 20210166947 - Chou; Lei-Chun ;   et al.
2021-06-03
Method for forming semiconductor device structure
Grant 10,971,363 - Lai , et al. April 6, 2
2021-04-06
Fin-like field effect transistor patterning methods for increasing process margins
Grant 10,957,551 - Tseng , et al. March 23, 2
2021-03-23
High-density semiconductor device
Grant 10,950,456 - Chou , et al. March 16, 2
2021-03-16
Semiconductor Device Which Includes Fins And Method Of Making Same
App 20200335507 - CHEN; Chih-Liang ;   et al.
2020-10-22
Semiconductor device which includes Fins
Grant 10,714,485 - Chen , et al.
2020-07-14
Fin Patterning Methods for Increased Process Margins
App 20200152464 - Tseng; Chin-Yuan ;   et al.
2020-05-14
Method For Forming Semiconductor Device Structure
App 20200066523 - LAI; Chih-Ming ;   et al.
2020-02-27
High-Density Semiconductor Device
App 20200043741 - Chou; Lei-Chun ;   et al.
2020-02-06
Fin patterning methods for increased process margins
Grant 10,535,520 - Tseng , et al. Ja
2020-01-14
Fin-Like Field Effect Transistor Patterning Methods for Increasing Process Margins
App 20200013630 - Tseng; Chin-Yuan ;   et al.
2020-01-09
Method for forming semiconductor device structure
Grant 10,497,565 - Lai , et al. De
2019-12-03
High-density semiconductor device
Grant 10,446,406 - Chou , et al. Oc
2019-10-15
Fin-like field effect transistor patterning methods for increasing process margins
Grant 10,418,252 - Tseng , et al. Sept
2019-09-17
Lithographic technique incorporating varied pattern materials
Grant 10,312,109 - Tseng , et al.
2019-06-04
Method Of Patterning
App 20190164772 - TSENG; Chin-Yuan ;   et al.
2019-05-30
Method For Forming Semiconductor Device Structure
App 20190157085 - LAI; Chih-Ming ;   et al.
2019-05-23
Semiconductor Device Which Includes Fins
App 20190019797 - CHEN; Chih-Liang ;   et al.
2019-01-17
Fin Patterning Methods for Increased Process Margins
App 20180315602 - Tseng; Chin-Yuan ;   et al.
2018-11-01
Lithographic Technique Incorporating Varied Pattern Materials
App 20180286698 - Tseng; Chin-Yuan ;   et al.
2018-10-04
Method of manufacturing fins and semiconductor device which includes fins
Grant 10,074,657 - Chen , et al. September 11, 2
2018-09-11
Fin-Like Field Effect Transistor Patterning Methods for Increasing Process Margins
App 20180174854 - Tseng; Chin-Yuan ;   et al.
2018-06-21
Lithographic technique incorporating varied pattern materials
Grant 9,991,132 - Tseng , et al. June 5, 2
2018-06-05
High-Density Semiconductor Device
App 20180151381 - Chou; Lei-Chun ;   et al.
2018-05-31
Method Of Manufacturing Fins And Semiconductor Device Which Includes Fins
App 20170317089 - CHEN; Chih-Liang ;   et al.
2017-11-02
High fin cut fabrication process
Grant 9,679,994 - Chou , et al. June 13, 2
2017-06-13
Method for integrated circuit manufacturing
Grant 9,672,320 - Chang , et al. June 6, 2
2017-06-06
Method for Integrated Circuit Manufacturing
App 20170004242 - Chang; Shih-Ming ;   et al.
2017-01-05
Multiple directed self-assembly patterning process
Grant 9,530,660 - Tseng , et al. December 27, 2
2016-12-27
Multiple Directed Self-Assembly Patterning Process
App 20160336186 - Tseng; Chin-Yuan ;   et al.
2016-11-17
Lithographic Technique Incorporating Varied Pattern Materials
App 20160307769 - Tseng; Chin-Yuan ;   et al.
2016-10-20
Fin patterning methods for increased process margin
Grant 9,449,880 - Tseng , et al. September 20, 2
2016-09-20
Fin Patterning Methods For Increased Process Margin
App 20160254191 - Tseng; Chin-Yuan ;   et al.
2016-09-01
Chip Resistor Having Low Resistance And Method For Manufacturing The Same
App 20110234365 - YANG; CHIH-CHUNG ;   et al.
2011-09-29

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