Patent | Date |
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Method For Non-Resist Nanolithography App 20200287025 - Chen; Miin-Jang ;   et al. | 2020-09-10 |
Method for non-resist nanolithography Grant 10,665,696 - Chen , et al. | 2020-05-26 |
Charged-particle-beam patterning without resist Grant 10,615,036 - Tsai , et al. | 2020-04-07 |
Method For Non-Resist Nanolithography App 20180248020 - Chen; Miin-Jang ;   et al. | 2018-08-30 |
Charged-Particle-Beam Patterning Without Resist App 20180218903 - Tsai; Kuen-Yu ;   et al. | 2018-08-02 |
Determining proximity effect parameters for non rectangular semiconductor structures Grant 10,007,752 - Tsai , et al. June 26, 2 | 2018-06-26 |
Method for non-resist nanolithography Grant 9,972,702 - Chen , et al. May 15, 2 | 2018-05-15 |
Charged-particle-beam patterning without resist Grant 9,934,969 - Tsai , et al. April 3, 2 | 2018-04-03 |
Projection patterning with exposure mask Grant 9,570,301 - Tsai , et al. February 14, 2 | 2017-02-14 |
Method for calibrating a manufacturing process model Grant 9,541,500 - Tsai , et al. January 10, 2 | 2017-01-10 |
Method and system for establishing parametric model Grant 9,418,049 - Tsai , et al. August 16, 2 | 2016-08-16 |
Projection Patterning With Exposure Mask App 20150348775 - Tsai; Kuen-Yu ;   et al. | 2015-12-03 |
Method For Non-Resist Nanolithography App 20150340469 - Chen; Miin-Jang ;   et al. | 2015-11-26 |
Determining Proximity Effect Parameters for Non Rectangular Semiconductor Structures App 20150324515 - Tsai; Kuen-Yu ;   et al. | 2015-11-12 |
Charged-Particle-Beam Patterning Without Resist App 20150221514 - Tsai; Kuen-Yu ;   et al. | 2015-08-06 |
Multilayer Mirror Structure App 20150212427 - Li; Jia-Han ;   et al. | 2015-07-30 |
Determining proximity effect parameters for non-rectangular semiconductor structures Grant 9,087,173 - Tsai , et al. July 21, 2 | 2015-07-21 |
Method And System For Establishing Parametric Model App 20140200866 - TSAI; Kuen-Yu ;   et al. | 2014-07-17 |
Method And Computer-aided Design System Of Manufacturing An Optical System App 20130297061 - Tsai; Kuen-Yu ;   et al. | 2013-11-07 |
Method for compensating effect of patterning process and apparatus thereof Grant 8,578,303 - Tsai , et al. November 5, 2 | 2013-11-05 |
Method for compensating proximity effects of particle beam lithography processes Grant 8,539,392 - Tsai , et al. September 17, 2 | 2013-09-17 |
Method and apparatus for designing patterning system based on patterning fidelity Grant 8,490,033 - Tsai , et al. July 16, 2 | 2013-07-16 |
Method for improving accuracy of parasitics extraction considering sub-wavelength lithography effects Grant 8,438,505 - Tsai , et al. May 7, 2 | 2013-05-07 |
Method for Calibrating a Manufacturing Process Model App 20130073070 - TSAI; Kuen-Yu ;   et al. | 2013-03-21 |
Method And Apparatus For Designing Patterning System Based On Patterning Fidelity App 20130024823 - Tsai; Kuen-Yu ;   et al. | 2013-01-24 |
Method For Compensating Proximity Effects Of Particle Beam Lithography Processes App 20120221983 - Tsai; Kuen-Yu ;   et al. | 2012-08-30 |
Method For Improving Accuracy Of Parasitics Extraction Considering Sub-wavelength Lithography Effects App 20120185807 - Tsai; Kuen-Yu ;   et al. | 2012-07-19 |
Apparatus And Method For Estimating Change Of Status Of Particle Beams App 20120112065 - TSAI; Kuen-Yu ;   et al. | 2012-05-10 |
System And Method For Estimating Change Of Status Of Particle Beams App 20120112086 - TSAI; Kuen-Yu ;   et al. | 2012-05-10 |
Method For Adjusting Status Of Particle Beams For Patterning A Substrate And System Using The Same App 20120112091 - Tsai; Kuen-Yu ;   et al. | 2012-05-10 |
Determining Proximity Effect Parameters For Non-rectangular Semiconductor Structures App 20110178778 - Tsai; Kuen-Yu ;   et al. | 2011-07-21 |
Method for fast design of multi-objective frequency-shaping equalizers Grant 6,992,542 - Tsai January 31, 2 | 2006-01-31 |
Method for Fast Design of Multi-objective Frequency-shaping Equalizers App 20040223543 - Tsai, Kuen-Yu | 2004-11-11 |
Method for Design of Multi-objective Robust Controllers App 20040225383 - Tsai, Kuen-Yu ;   et al. | 2004-11-11 |