loadpatents
Patent applications and USPTO patent grants for TSAI; Kao-Tsair.The latest application filed is for "method for manufacturing non-volatile memory device".
Patent | Date |
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Method For Manufacturing Non-volatile Memory Device App 20220181339 - WU; Chien-Hsien ;   et al. | 2022-06-09 |
Method For Manufacturing Semiconductor Device App 20220172986 - HO; Chang-Ju ;   et al. | 2022-06-02 |
Method For Forming Semiconductor Memory Structure App 20220108894 - CHOU; Hsin-Hung ;   et al. | 2022-04-07 |
Image Analysis System And Image Analysis Method App 20210304432 - WU; Tung-Yu ;   et al. | 2021-09-30 |
Semiconductor Device App 20200161264 - Lin; Chun-Hung ;   et al. | 2020-05-21 |
Semiconductor device including conductive structure Grant 10,658,320 - Lin , et al. | 2020-05-19 |
Methods of forming semiconductor devices with flowable material for better planarization method Grant 10,615,046 - Wu , et al. | 2020-04-07 |
Methods Of Forming Semiconductor Devices App 20190304795 - WU; Kun-Che ;   et al. | 2019-10-03 |
Memory devices Grant 9,773,842 - Hung , et al. September 26, 2 | 2017-09-26 |
Memory Devices App 20170186814 - HUNG; Tso-Hua ;   et al. | 2017-06-29 |
Overlay mark Grant 8,022,560 - Chen , et al. September 20, 2 | 2011-09-20 |
Overlay Mark App 20090294995 - CHEN; MIN-HUNG ;   et al. | 2009-12-03 |
Method Of Manufacturing An Overlay Mark App 20090267240 - Chen; Min-Hung ;   et al. | 2009-10-29 |
Method of manufacturing an overlay mark Grant 7,598,155 - Chen , et al. October 6, 2 | 2009-10-06 |
Immersion lithography process, and structure used for the same and patterning process Grant 7,223,527 - Tsai , et al. May 29, 2 | 2007-05-29 |
Immersion lithography process, and structure used for the same and patterning process App 20060238727 - Tsai; Kao-Tsair ;   et al. | 2006-10-26 |
Method for fabricating phase mask of photolithography process Grant 7,008,729 - Tsai , et al. March 7, 2 | 2006-03-07 |
Semiconductor manufacturing apparatus and method Grant 6,791,668 - Tsai , et al. September 14, 2 | 2004-09-14 |
Method for fabricating phase mask of photolithography process App 20040076890 - Tsai, Kao-Tsair ;   et al. | 2004-04-22 |
Semiconductor manufacturing apparatus and method App 20040032577 - Tsai, Kao-Tsair ;   et al. | 2004-02-19 |
Multilayer photoresist process in photolithography Grant 6,509,137 - Wang , et al. January 21, 2 | 2003-01-21 |
Photomask set for photolithographic operation App 20020150841 - Wang, Li-Ming ;   et al. | 2002-10-17 |
Method of reducing optical proximity effect Grant 6,413,685 - Tsai , et al. July 2, 2 | 2002-07-02 |
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