Tsai; Jang-Shiang
Patent Applications and Registrations
Patent applications and USPTO patent grants for Tsai; Jang-Shiang.The latest application filed is for "method of preventing pattern collapse".
- Tsai; Jang-Shiang - Zhubei TW
- Tsai; Jang-Shiang - Zhubei City TW
- Tsai; Jang-Shiang - Taipei County N/A TW
- Tsai; Jang-Shiang - Shindian TW
- Tsai; Jang-Shiang - Xindian TW
- Tsai; Jang-Shiang - Xindian City TW
| Patent | Date |
|---|---|
| Method for manufacturing semiconductor structure Grant 11,355,642 - Hsu , et al. June 7, 2 | 2022-06-07 |
| Method of preventing pattern collapse Grant 11,043,453 - Ting , et al. June 22, 2 | 2021-06-22 |
| Method of Preventing Pattern Collapse App 20200126913 - Ting; Chih-Yuan ; et al. | 2020-04-23 |
| Method For Manufacturing Semiconductor Structure App 20200052122 - HSU; Ju-Wang ; et al. | 2020-02-13 |
| Method of preventing pattern collapse Grant 10,515,895 - Ting , et al. Dec | 2019-12-24 |
| Fin field effect transistor and method of forming the same Grant 10,483,397 - Hsu , et al. Nov | 2019-11-19 |
| Method of Preventing Pattern Collapse App 20170069573 - Ting; Chih-Yuan ; et al. | 2017-03-09 |
| Method of preventing pattern collapse Grant 9,502,287 - Ting , et al. November 22, 2 | 2016-11-22 |
| Method Of Preventing Pattern Collapse App 20160027688 - Ting; Chih-Yuan ; et al. | 2016-01-28 |
| Method of preventing a pattern collapse Grant 9,153,479 - Ting , et al. October 6, 2 | 2015-10-06 |
| Fin Field Effect Transistor And Method Of Forming The Same App 20150137265 - HSU; Ju-Wang ; et al. | 2015-05-21 |
| Fin field effect transistor and method of forming the same Grant 8,927,353 - Hsu , et al. January 6, 2 | 2015-01-06 |
| Method of Preventing a Pattern Collapse App 20140252625 - Ting; Chih-Yuan ; et al. | 2014-09-11 |
| Method for photoresist stripping and treatment of low-k dielectric material Grant 7,598,176 - Tsai , et al. October 6, 2 | 2009-10-06 |
| Fin Filled Effect Transistor And Method Of Forming The Same App 20080277745 - Hsu; Ju-Wang ; et al. | 2008-11-13 |
| Measuring low dielectric constant film properties during processing Grant 7,400,401 - Tsai , et al. July 15, 2 | 2008-07-15 |
| Poly Silicon Hard Mask App 20080122107 - Tsai; Jang-Shiang ; et al. | 2008-05-29 |
| Measuring low dielectric constant film properties during processing App 20060220653 - Tsai; Jang-Shiang ; et al. | 2006-10-05 |
| Low oxygen content photoresist stripping process for low dielectric constant materials Grant 7,029,992 - Shieh , et al. April 18, 2 | 2006-04-18 |
| Method for photoresist stripping and treatment of low-k dielectric material App 20060063386 - Tsai; Jang-Shiang ; et al. | 2006-03-23 |
| Low Oxygen Content Photoresist Stripping Process For Low Dielectric Constant Materials App 20060040474 - Shieh; Jyu-Horng ; et al. | 2006-02-23 |
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.
| 