loadpatents
name:-0.017051935195923
name:-0.012006998062134
name:-0.012911081314087
TRUMPF Huettinger Sp. z o. o. Patent Filings

TRUMPF Huettinger Sp. z o. o.

Patent Applications and Registrations

Patent applications and USPTO patent grants for TRUMPF Huettinger Sp. z o. o..The latest application filed is for "method of plasma processing a substrate in a plasma chamber and plasma processing system".

Company Profile
13.21.18
  • TRUMPF Huettinger Sp. z o. o. - Zielonka N/A PL
  • TRUMPF Huettinger Sp. z o. o. - Zeilonka PL
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Controlling multiple plasma processes
Grant 11,430,642 - Engelstaedter , et al. August 30, 2
2022-08-30
Method Of Plasma Processing A Substrate In A Plasma Chamber And Plasma Processing System
App 20220208532 - Gajewski; Wojciech ;   et al.
2022-06-30
Method Of Adjusting The Output Power Of A Power Supply Supplying Electrical Power To A Plasma, Plasma Apparatus And Power Supply
App 20220115207 - Swiatnicki; Jakub ;   et al.
2022-04-14
Power Converter, Power Supply System And Hf Plasma System
App 20210159050 - Klimczak; Andrzej ;   et al.
2021-05-27
Balun And Amplifier Including Balun
App 20210159872 - Klimczak; Andrzej ;   et al.
2021-05-27
Arc Detector For Detecting Arcs, Plasma System And Method Of Detecting Arcs
App 20210156893 - Klimczak; Andrzej ;   et al.
2021-05-27
Controlling multiple plasma processes
Grant 10,971,342 - Engelstaedter , et al. April 6, 2
2021-04-06
Controlling Multiple Plasma Processes
App 20200066498 - Engelstaedter; Jan Peter ;   et al.
2020-02-27
Controlling Multiple Plasma Processes
App 20200066497 - Engelstaedter; Jan Peter ;   et al.
2020-02-27
Controlling Multiple Plasma Processes
App 20200058475 - Engelstaedter; Jan Peter ;   et al.
2020-02-20
Detecting an arc occuring during supplying power to a plasma process
Grant 10,431,437 - O
2019-10-01
Plasma impedance matching for supplying RF power to a plasma load
Grant 10,410,835 - Glazek , et al. Sept
2019-09-10
Treating arcs in a plasma process
Grant 10,297,431 - Zelechowski , et al.
2019-05-21
Monitoring a discharge in a plasma process
Grant 10,290,477 - Gieraltowski , et al.
2019-05-14
Plasma Impedance Matching for Supplying RF Power to a Plasma Load
App 20180053633 - Glazek; Wojciech ;   et al.
2018-02-22
Generating a highly ionized plasma in a plasma chamber
Grant 9,840,770 - Klimczak , et al. December 12, 2
2017-12-12
Treating Arcs in a Plasma Process
App 20170330737 - Zelechowski; Marcin ;   et al.
2017-11-16
Reducing stored electrical energy in a lead inductance
Grant 9,818,579 - Ozimek , et al. November 14, 2
2017-11-14
Detecting An Arc Occuring During Supplying Power To A Plasma Process
App 20170287684 - Gapinski; Cezary ;   et al.
2017-10-05
High-rate reactive sputtering of dielectric stoichiometric films
Grant 9,637,814 - Bugyi , et al. May 2, 2
2017-05-02
Monitoring a Discharge in a Plasma Process
App 20160343549 - Gieraltowski; Andrzej ;   et al.
2016-11-24
Apparatus for generating and maintaining plasma for plasma processing
Grant 9,368,328 - Ozimek , et al. June 14, 2
2016-06-14
High-rate Reactive Sputtering Of Dielectric Stoichiometric Films
App 20150354052 - Bugyi; Rafal ;   et al.
2015-12-10
Apparatus For Generating And Maintaining Plasma For Plasma Processing
App 20150206711 - Ozimek; Pawel ;   et al.
2015-07-23
Reducing Stored Electrical Energy In A Lead Inductance
App 20140320015 - Ozimek; Pawel ;   et al.
2014-10-30
Reducing stored electrical energy in a lead inductance
Grant 8,786,263 - Ozimek , et al. July 22, 2
2014-07-22
Generating a Highly Ionized Plasma in a Plasma Chamber
App 20140174909 - Klimczak; Andrzej ;   et al.
2014-06-26

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