loadpatents
name:-0.034785985946655
name:-0.030224084854126
name:-0.001622200012207
Triyoso; Dina H. Patent Filings

Triyoso; Dina H.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Triyoso; Dina H..The latest application filed is for "methods for forming dielectric materials with selected polarization for semiconductor devices".

Company Profile
1.29.33
  • Triyoso; Dina H. - Albany NY
  • Triyoso; Dina H. - Mechanicville NY
  • Triyoso; Dina H. - Dresden DE
  • Triyoso; Dina H. - Austin TX
  • Triyoso; Dina H. - Houston TX
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Methods For Forming Dielectric Materials With Selected Polarization For Semiconductor Devices
App 20220044922 - Triyoso; Dina H. ;   et al.
2022-02-10
Semiconductor Manufacturing Platform With In-situ Electrical Bias And Methods Thereof
App 20210367046 - Triyoso; Dina H. ;   et al.
2021-11-25
Strain retention semiconductor member for channel SiGe layer of pFET
Grant 10,236,343 - Triyoso , et al.
2019-03-19
Method For Late Differential Soi Thinning For Improved Fdsoi Performance And Hci Optimization
App 20180315832 - MULFINGER; George Robert ;   et al.
2018-11-01
Method for late differential SOI thinning for improved FDSOI performance and HCI optimization
Grant 10,050,119 - Mulfinger , et al. August 14, 2
2018-08-14
STRAIN RETENTION SEMICONDUCTOR MEMBER FOR CHANNEL SiGe LAYER OF pFET
App 20180190768 - Triyoso; Dina H. ;   et al.
2018-07-05
Method For Late Differential Soi Thinning For Improved Fdsoi Performance And Hci Optimization
App 20180069091 - MULFINGER; George Robert ;   et al.
2018-03-08
Integrated circuits including a MIMCAP device and methods of forming the same for long and controllable reliability lifetime
Grant 9,583,557 - Cheng , et al. February 28, 2
2017-02-28
Semiconductor structure including capacitors having different capacitor dielectrics and method for the formation thereof
Grant 9,530,833 - Triyoso , et al. December 27, 2
2016-12-27
Methods For Fabricating Semiconductor Structure With Condensed Silicon Germanium Layer
App 20160254145 - TRIYOSO; Dina H. ;   et al.
2016-09-01
Threshold voltage control for mixed-type non-planar semiconductor devices
Grant 9,362,284 - Togo , et al. June 7, 2
2016-06-07
Complex circuit element and capacitor utilizing CMOS compatible antiferroelectric high-k materials
Grant 9,318,315 - Mueller , et al. April 19, 2
2016-04-19
Integrated Circuits Including A Mimcap Device And Methods Of Forming The Same For Long And Controllable Reliability Lifetime
App 20160064472 - Cheng; Lili ;   et al.
2016-03-03
Integrated Circuits And Methods For Fabricating Integrated Circuits
App 20160064286 - Dilliway; Gabriela ;   et al.
2016-03-03
Semiconductor device with ferroelectric hafnium oxide and method for forming semiconductor device
Grant 9,269,785 - Mueller , et al. February 23, 2
2016-02-23
Threshold Voltage Control For Mixed-type Non-planar Semiconductor Devices
App 20160049400 - TOGO; Mitsuhiro ;   et al.
2016-02-18
Threshold Voltage Control For Mixed-type Non-planar Semiconductor Devices
App 20150380409 - TOGO; Mitsuhiro ;   et al.
2015-12-31
Semiconductor Structure Including Capacitors Having Different Capacitor Dielectrics And Method For The Formation Thereof
App 20150364535 - Triyoso; Dina H. ;   et al.
2015-12-17
Threshold voltage control for mixed-type non-planar semiconductor devices
Grant 9,209,186 - Togo , et al. December 8, 2
2015-12-08
Semiconductor Device With Ferooelectric Hafnium Oxide And Method For Forming Semiconductor Device
App 20150214322 - Mueller; Johannes ;   et al.
2015-07-30
Transistor Device With Strained Layer
App 20150179740 - Triyoso; Dina H. ;   et al.
2015-06-25
Complex Circuit Element And Capacitor Utilizing Cmos Compatible Antiferroelectric High-k Materials
App 20150014813 - Mueller; Johannes ;   et al.
2015-01-15
Protection Of The Gate Stack Encapsulation
App 20140353733 - Dilliway; Gabriela ;   et al.
2014-12-04
Methods for fabricating integrated circuits with narrow, metal filled openings
Grant 8,652,890 - Schmidbauer , et al. February 18, 2
2014-02-18
Methods For Fabricating Integrated Circuits With Narrow, Metal Filled Openings
App 20130224927 - Schmidbauer; Sven ;   et al.
2013-08-29
Reverse ALD
Grant 8,404,594 - Triyoso , et al. March 26, 2
2013-03-26
Method for forming a through silicon via (TSV)
Grant 8,039,386 - Dao , et al. October 18, 2
2011-10-18
Plasma treatment of a semiconductor surface for enhanced nucleation of a metal-containing layer
Grant 8,030,220 - Triyoso , et al. October 4, 2
2011-10-04
Method For Forming A Through Silicon Via (tsv)
App 20110237073 - Dao; Thuy B. ;   et al.
2011-09-29
Semiconductor device with selectively modulated gate work function
Grant 7,911,002 - Thean , et al. March 22, 2
2011-03-22
Semiconductor Device With Selectively Modulated Gate Work Function
App 20100230756 - Thean; Voon-Yew ;   et al.
2010-09-16
Method of removing defects from a dielectric material in a semiconductor
Grant 7,776,731 - Junker , et al. August 17, 2
2010-08-17
In-situ nitridation of high-k dielectrics
Grant 7,704,821 - Triyoso , et al. April 27, 2
2010-04-27
Plasma Treatment Of A Semiconductor Surface For Enhanced Nucleation Of A Metal-containing Layer
App 20100035434 - Triyoso; Dina H. ;   et al.
2010-02-11
Method to selectively modulate gate work function through selective Ge condensation and high-K dielectric layer
Grant 7,659,156 - Thean , et al. February 9, 2
2010-02-09
Plasma treatment of a semiconductor surface for enhanced nucleation of a metal-containing layer
Grant 7,618,902 - Triyoso , et al. November 17, 2
2009-11-17
Method Of Removing Defects From A Dielectric Material In A Semiconductor
App 20090075434 - Junker; Kurt H. ;   et al.
2009-03-19
Method to selectively modulate gate work function through selective Ge condensation and high-K dielectric layer
App 20080258219 - Thean; Voon-Yew ;   et al.
2008-10-23
ALD gate electrode
Grant 7,303,983 - Triyoso , et al. December 4, 2
2007-12-04
Gate dielectric and metal gate integration
Grant 7,297,586 - Triyoso , et al. November 20, 2
2007-11-20
ALD gate electrode
App 20070166970 - Triyoso; Dina H. ;   et al.
2007-07-19
Semiconductor transistor having structural elements of differing materials
Grant 7,230,264 - Thean , et al. June 12, 2
2007-06-12
Plasma treatment of a semiconductor surface for enhanced nucleation of a metal-containing layer
App 20070123056 - Triyoso; Dina H. ;   et al.
2007-05-31
In-situ nitridation of high-k dielectrics
App 20060273411 - Triyoso; Dina H. ;   et al.
2006-12-07
Reverse ALD
App 20060270239 - Triyoso; Dina H. ;   et al.
2006-11-30
Method for treating a semiconductor surface to form a metal-containing layer
Grant 7,132,360 - Schaeffer , et al. November 7, 2
2006-11-07
Electronic device including dielectric layer, and a process for forming the electronic device
Grant 7,091,568 - Hegde , et al. August 15, 2
2006-08-15
Novel gate dielectric and metal gate integration
App 20060166425 - Triyoso; Dina H. ;   et al.
2006-07-27
Method of forming a semiconductor device having a dielectric layer with high dielectric constant
Grant 7,071,038 - Triyoso , et al. July 4, 2
2006-07-04
Electronic Device Including Dielectric Layer, And A Process For Forming The Electronic Device
App 20060131671 - Hegde; Rama I. ;   et al.
2006-06-22
Semiconductor transistor having structural elements of differing materials
App 20060076579 - Thean; Voon-Yew ;   et al.
2006-04-13
Method of forming a semiconductor device having a dielectric layer with high dielectric constant
App 20060063336 - Triyoso; Dina H. ;   et al.
2006-03-23
Method for forming a layer using a purging gas in a semiconductor process
Grant 7,015,153 - Triyoso , et al. March 21, 2
2006-03-21
Method to reduce impurity elements during semiconductor film deposition
Grant 6,987,063 - Adetutu , et al. January 17, 2
2006-01-17
Semiconductor transistor having structural elements of differing materials and method of formation
Grant 6,979,622 - Thean , et al. December 27, 2
2005-12-27
Method To Reduce Impurity Elements During Semiconductor Film Deposition
App 20050277296 - Adetutu, Olubunmi O. ;   et al.
2005-12-15
Method for treating a semiconductor surface to form a metal-containing layer
App 20050277294 - Schaeffer, James K. ;   et al.
2005-12-15
Method of making an integrated circuit using an EUV mask formed by atomic layer deposition
Grant 6,835,671 - Hector , et al. December 28, 2
2004-12-28
Method of making an integrated circuit using an EUV mask formed by atomic layer deposition
App 20040033699 - Hector, Scott Daniel ;   et al.
2004-02-19

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