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Patent applications and USPTO patent grants for Trentman; Brian M..The latest application filed is for "protection of silicon from phosphoric acid using thick chemical oxide".
Patent | Date |
---|---|
Method to reduce photoresist poisoning Grant 7,887,875 - Friedmann , et al. February 15, 2 | 2011-02-15 |
Protection of silicon from phosphoric acid using thick chemical oxide Grant 7,384,869 - Riley , et al. June 10, 2 | 2008-06-10 |
Protection of silicon from phosphoric acid using thick chemical oxide App 20060228904 - Riley; Deborah J. ;   et al. | 2006-10-12 |
Post plasma clean process for a hardmask Grant 6,921,721 - Kirkpatrick , et al. July 26, 2 | 2005-07-26 |
Forming a trench to define one or more isolation regions in a semiconductor structure Grant 6,905,943 - DeLoach , et al. June 14, 2 | 2005-06-14 |
Forming A Trench To Define One Or More Isolation Regions In A Semiconductor Structure App 20050101101 - DeLoach, Juanita ;   et al. | 2005-05-12 |
Post plasma clean process for a hardmask App 20050090115 - Kirkpatrick, Brian K. ;   et al. | 2005-04-28 |
Method to reduce photoresist poisoning App 20040062867 - Friedmann, James B. ;   et al. | 2004-04-01 |
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