Tregub; Alexander
Patent Applications and Registrations
Patent applications and USPTO patent grants for Tregub; Alexander.The latest application filed is for "chemical-mechanical planarization (cmp) pad conditioner brush-and-abrasive hybrid for multi-step, preparation- and restoration-c".
- Tregub; Alexander - San Jose CA
- Tregub; Alexander - Oak Park CA US
| Patent | Date |
|---|---|
| Chemical-mechanical Planarization (cmp) Pad Conditioner Brush-and-abrasive Hybrid For Multi-step, Preparation- And Restoration-c App 20190193245 - Tregub; Alexander ; et al. | 2019-06-27 |
| Mounting a pellicle to a frame Grant 8,551,675 - Eschbach , et al. October 8, 2 | 2013-10-08 |
| Mounting A Pellicle To A Frame App 20110294048 - Eschbach; Florence ; et al. | 2011-12-01 |
| Mounting a pellicle to a frame Grant 8,012,651 - Eschbach , et al. September 6, 2 | 2011-09-06 |
| Brush for cleaning wafer Grant 7,469,443 - Liou , et al. December 30, 2 | 2008-12-30 |
| Detecting particle agglomeration in chemical mechanical polishing slurries Grant 7,383,723 - Tregub , et al. June 10, 2 | 2008-06-10 |
| Mounting a Pellicle to a Frame App 20080094591 - Eschbach; Florence ; et al. | 2008-04-24 |
| Mounting a pellicle to a frame Grant 7,316,869 - Eschbach , et al. January 8, 2 | 2008-01-08 |
| Process to optimize properties of polymer pellicles and resist for lithography applications Grant 7,314,667 - Tregub , et al. January 1, 2 | 2008-01-01 |
| Fullerenes to increase radiation resistance in polymer-based pellicles Grant 7,288,300 - Tregub , et al. October 30, 2 | 2007-10-30 |
| Fullerenes to increase radiation resistance in polymer-based pellicles Grant 7,288,299 - Tregub , et al. October 30, 2 | 2007-10-30 |
| Attaching a pellicle frame to a reticle Grant 7,264,853 - Eschbach , et al. September 4, 2 | 2007-09-04 |
| Hardened porous polymer chemical mechanical polishing (CMP) pad App 20070117393 - Tregub; Alexander ; et al. | 2007-05-24 |
| Use of alternative polymer materials for "soft" polymer pellicles App 20070037074 - Tregub; Alexander ; et al. | 2007-02-15 |
| Method of manufacturing a polymer memory device App 20070003695 - Tregub; Alexander ; et al. | 2007-01-04 |
| Treatment of CMP pad window to improve transmittance App 20060291530 - Tregub; Alexander ; et al. | 2006-12-28 |
| Detecting particle agglomeration in chemical mechanical polishing slurries App 20060266736 - Tregub; Alexander ; et al. | 2006-11-30 |
| Radiation stability of polymer pellicles App 20060234134 - Tregub; Alexander ; et al. | 2006-10-19 |
| Brush for cleaning wafer App 20060151003 - Liou; Huey-Chiang ; et al. | 2006-07-13 |
| Conditioning polishing pad for chemical-mechanical polishing Grant 7,048,610 - Tregub , et al. May 23, 2 | 2006-05-23 |
| Fullerences to increase radiation resistance in polymer-based pellicles App 20060008528 - Tregub; Alexander ; et al. | 2006-01-12 |
| Anti-bacterial protection to improve performance of post CMP clean brush App 20050287032 - Tregub, Alexander ; et al. | 2005-12-29 |
| Use of alternative polymer materials for "soft" polymer pellicles App 20050202252 - Tregub, Alexander ; et al. | 2005-09-15 |
| Process to optimize properties of polymer pellicles and resist for lithography applications App 20050203254 - Tregub, Alexander ; et al. | 2005-09-15 |
| Attaching a pellicle frame to a reticle App 20050045262 - Eschbach, Florence ; et al. | 2005-03-03 |
| Mounting a pellicle to a frame App 20050048376 - Eschbach, Florence ; et al. | 2005-03-03 |
| Fullerenes to increase radiation resistance in polymer-based pellicles App 20050029126 - Tregub, Alexander ; et al. | 2005-02-10 |
| Annealing of CMP polishing pads App 20030207661 - Tregub, Alexander ; et al. | 2003-11-06 |
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