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Patent applications and USPTO patent grants for Tran; Tony Quan.The latest application filed is for "neutral to alkaline chemical mechanical polishing compositions and methods for tungsten".
Patent | Date |
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Neutral To Alkaline Chemical Mechanical Polishing Compositions And Methods For Tungsten App 20210163787 - Guo; Yi ;   et al. | 2021-06-03 |
Neutral to alkaline chemical mechanical polishing compositions and methods for tungsten Grant 10,995,238 - Guo , et al. May 4, 2 | 2021-05-04 |
Trapezoidal CMP groove pattern Grant 10,857,648 - Nguyen , et al. December 8, 2 | 2020-12-08 |
High-rate CMP polishing method Grant 10,857,647 - Nguyen , et al. December 8, 2 | 2020-12-08 |
Controlled residence CMP polishing method Grant 10,861,702 - Nguyen , et al. December 8, 2 | 2020-12-08 |
Biased Pulse Cmp Groove Pattern App 20200381258 - Nguyen; John Vu ;   et al. | 2020-12-03 |
Biased pulse CMP groove pattern Grant 10,777,418 - Nguyen , et al. Sept | 2020-09-15 |
Uniform CMP polishing method Grant 10,586,708 - Nguyen , et al. | 2020-03-10 |
Neutral To Alkaline Chemical Mechanical Polishing Compositions And Methods For Tungsten App 20200010726 - Guo; Yi ;   et al. | 2020-01-09 |
Controlled Residence Cmp Polishing Method App 20180366332 - Nguyen; John Vu ;   et al. | 2018-12-20 |
Trapezoidal Cmp Groove Pattern App 20180361533 - Nguyen; John Vu ;   et al. | 2018-12-20 |
High-rate Cmp Polishing Method App 20180361532 - Nguyen; John Vu ;   et al. | 2018-12-20 |
Biased Pulse Cmp Groove Pattern App 20180366333 - Nguyen; John Vu ;   et al. | 2018-12-20 |
Uniform Cmp Polishing Method App 20180366331 - Nguyen; John Vu ;   et al. | 2018-12-20 |
Method of making composite polishing layer for chemical mechanical polishing pad Grant 10,092,998 - Qian , et al. October 9, 2 | 2018-10-09 |
Method of making composite polishing layer for chemical mechanical polishing pad Grant 10,011,002 - Qian , et al. July 3, 2 | 2018-07-03 |
Chemical mechanical polishing pad and method of making same Grant 9,776,300 - Qian , et al. October 3, 2 | 2017-10-03 |
Chemical mechanical polishing pad composite polishing layer formulation Grant 9,630,293 - Qian , et al. April 25, 2 | 2017-04-25 |
Chemical mechanical polishing pad and method of making same Grant 9,586,305 - Qian , et al. March 7, 2 | 2017-03-07 |
Method Of Making Composite Polishing Layer For Chemical Mechanical Polishing Pad App 20160375554 - Qian; Bainian ;   et al. | 2016-12-29 |
Chemical Mechanical Polishing Pad And Method Of Making Same App 20160379840 - Qian; Bainian ;   et al. | 2016-12-29 |
Method Of Making Composite Polishing Layer For Chemical Mechanical Polishing Pad App 20160375552 - Qian; Bainian ;   et al. | 2016-12-29 |
Chemical Mechanical Polishing Pad And Method Of Making Same App 20160375543 - Qian; Bainian ;   et al. | 2016-12-29 |
Chemical Mechanical Polishing Pad Composite Polishing Layer Formulation App 20160375545 - Qian; Bainian ;   et al. | 2016-12-29 |
Dissolution of metal particles produced by polishing Grant 6,602,112 - Tran , et al. August 5, 2 | 2003-08-05 |
Dissolution of metal particles produced by polishing App 20010039166 - Tran, Tony Quan ;   et al. | 2001-11-08 |
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