Tran; Tony Quan

Patent Applications and Registrations

Patent applications and USPTO patent grants for Tran; Tony Quan.The latest application filed is for "neutral to alkaline chemical mechanical polishing compositions and methods for tungsten".

Company Profile

12.12.14

Tran; Tony Quan - Bear DE
Tran; Tony Quan - Newark DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Neutral To Alkaline Chemical Mechanical Polishing Compositions And Methods For Tungsten App 20210163787 - Guo; Yi ; et al.	2021-06-03
Neutral to alkaline chemical mechanical polishing compositions and methods for tungsten Grant 10,995,238 - Guo , et al. May 4, 2	2021-05-04
Trapezoidal CMP groove pattern Grant 10,857,648 - Nguyen , et al. December 8, 2	2020-12-08
High-rate CMP polishing method Grant 10,857,647 - Nguyen , et al. December 8, 2	2020-12-08
Controlled residence CMP polishing method Grant 10,861,702 - Nguyen , et al. December 8, 2	2020-12-08
Biased Pulse Cmp Groove Pattern App 20200381258 - Nguyen; John Vu ; et al.	2020-12-03
Biased pulse CMP groove pattern Grant 10,777,418 - Nguyen , et al. Sept	2020-09-15
Uniform CMP polishing method Grant 10,586,708 - Nguyen , et al.	2020-03-10
Neutral To Alkaline Chemical Mechanical Polishing Compositions And Methods For Tungsten App 20200010726 - Guo; Yi ; et al.	2020-01-09
Controlled Residence Cmp Polishing Method App 20180366332 - Nguyen; John Vu ; et al.	2018-12-20
Trapezoidal Cmp Groove Pattern App 20180361533 - Nguyen; John Vu ; et al.	2018-12-20
High-rate Cmp Polishing Method App 20180361532 - Nguyen; John Vu ; et al.	2018-12-20
Biased Pulse Cmp Groove Pattern App 20180366333 - Nguyen; John Vu ; et al.	2018-12-20
Uniform Cmp Polishing Method App 20180366331 - Nguyen; John Vu ; et al.	2018-12-20
Method of making composite polishing layer for chemical mechanical polishing pad Grant 10,092,998 - Qian , et al. October 9, 2	2018-10-09
Method of making composite polishing layer for chemical mechanical polishing pad Grant 10,011,002 - Qian , et al. July 3, 2	2018-07-03
Chemical mechanical polishing pad and method of making same Grant 9,776,300 - Qian , et al. October 3, 2	2017-10-03
Chemical mechanical polishing pad composite polishing layer formulation Grant 9,630,293 - Qian , et al. April 25, 2	2017-04-25
Chemical mechanical polishing pad and method of making same Grant 9,586,305 - Qian , et al. March 7, 2	2017-03-07
Method Of Making Composite Polishing Layer For Chemical Mechanical Polishing Pad App 20160375554 - Qian; Bainian ; et al.	2016-12-29
Chemical Mechanical Polishing Pad And Method Of Making Same App 20160379840 - Qian; Bainian ; et al.	2016-12-29
Method Of Making Composite Polishing Layer For Chemical Mechanical Polishing Pad App 20160375552 - Qian; Bainian ; et al.	2016-12-29
Chemical Mechanical Polishing Pad And Method Of Making Same App 20160375543 - Qian; Bainian ; et al.	2016-12-29
Chemical Mechanical Polishing Pad Composite Polishing Layer Formulation App 20160375545 - Qian; Bainian ; et al.	2016-12-29
Dissolution of metal particles produced by polishing Grant 6,602,112 - Tran , et al. August 5, 2	2003-08-05
Dissolution of metal particles produced by polishing App 20010039166 - Tran, Tony Quan ; et al.	2001-11-08

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