Toyo Gosei Kogyo Co., Ltd.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Toyo Gosei Kogyo Co., Ltd..The latest application filed is for "method for producing onium salt derivatives, and novel onium salt derivatives".

Company Profile

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Toyo Gosei Kogyo Co., Ltd. - Ichikawa-shi Chiba JP
Toyo Gosei Kogyo Co., Ltd. - Chiba JP
Toyo Gosei Kogyo Co., Ltd. - JP JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method for producing onium salt derivatives, and novel onium salt derivatives Grant 7,335,787 - Tomita , et al. February 26, 2	2008-02-26
Photosensitive compound, photosensitive resin, and photosensitive composition Grant 6,861,456 - Shibuya , et al. March 1, 2	2005-03-01
Photosensitive composition comprising photosensitive saponified poly(vinyl acetate) and pattern formation method making use of the composition Grant 6,797,452 - Takano , et al. September 28, 2	2004-09-28
Coating solution for forming transparent and conductive tin oxide film and method for preparing transparent and conductive tin oxide film, and transparent and conductive tin oxide film Grant 6,777,477 - Niume , et al. August 17, 2	2004-08-17
Cinnamaldehyde compound having an azido group Grant 6,768,027 - Takeda July 27, 2	2004-07-27
1,2-Naphthoquinone-2-diazidesulfonate ester photosensitive agent, method for producing the photosensitive agent, and photoresist composition Grant 6,713,225 - Iida , et al. March 30, 2	2004-03-30
Process for producing onium salt derivative and novel onium salt derivative Grant 6,620,957 - Tomita , et al. September 16, 2	2003-09-16
Photosensitive compositions and pattern formation method Grant 6,342,330 - Watanabe , et al. January 29, 2	2002-01-29
Photosensitive compositions and pattern formation method Grant 6,140,007 - Watanabe , et al. October 31, 2	2000-10-31
Positive photoresist composition containing phenol ester of 1,2-napthoquinone-(2)-diazide-6-sulfonic acid and pattern formation method using the composition Grant 5,965,320 - Torimitsu , et al. October 12, 1	1999-10-12
Photosensitive colored resin composition, colored image formation method of color filter, and formation method of black matrix Grant 5,639,579 - Hayashi , et al. June 17, 1	1997-06-17
Photosensitive 4,4'-diazidostilbene derivative Grant 5,041,570 - Tochizawa , et al. August 20, 1	1991-08-20
Contrast-enhancing agent for photolithography Grant 4,925,770 - Ichimura , et al. May 15, 1	1990-05-15

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