Toyama; Nobuhito

Patent Applications and Registrations

Patent applications and USPTO patent grants for Toyama; Nobuhito.The latest application filed is for "diffractive optical element".

Company Profile

6.16.18

Toyama; Nobuhito - Tokyo JP
Toyama; Nobuhito - Shinjuku-Ku JP
Toyama; Nobuhito - Tokyo-to JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Diffractive optical element Grant 11,366,256 - Toyama June 21, 2	2022-06-21
Diffractive optical element Grant 11,340,389 - Toyama May 24, 2	2022-05-24
Diffractive optical element and light irradiation device Grant 10,768,347 - Miyazaki , et al. Sep	2020-09-08
Diffractive optical element and light irradiation apparatus Grant 10,704,763 - Miyazaki , et al.	2020-07-07
Diffractive Optical Element App 20200116908 - TOYAMA; Nobuhito	2020-04-16
Diffractive optical element and light irradiation apparatus Grant 10,591,133 - Miyazaki , et al.	2020-03-17
Diffractive Optical Element App 20200073030 - TOYAMA; Nobuhito	2020-03-05
Diffractive Optical Element And Light Irradiation Apparatus App 20190346108 - MIYAZAKI; Yuichi ; et al.	2019-11-14
Diffractive Optical Element And Light Irradiation Device App 20190285781 - MIYAZAKI; Yuichi ; et al.	2019-09-19
Diffractive Optical Element And Light Irradiation Apparatus App 20190178468 - MIYAZAKI; Yuichi ; et al.	2019-06-13
Diffractive optical device, and aligner comprising that device Grant 8,259,290 - Toyama , et al. September 4, 2	2012-09-04
Gradated photomask and its fabrication process Grant 8,124,301 - Fujikawa , et al. February 28, 2	2012-02-28
Photomask Grant 7,968,255 - Kitahata , et al. June 28, 2	2011-06-28
Photomask App 20090311612 - Kitahata; Yasuhisa ; et al.	2009-12-17
Gradated Photomask And Its Fabrication Process App 20090220867 - Fujikawa; Junji ; et al.	2009-09-03
Diffractive Optical Device, And Aligner Comprising That Device App 20090168040 - Toyama; Nobuhito ; et al.	2009-07-02
Designing method and device for phase shift mask Grant 7,367,010 - Mesuda , et al. April 29, 2	2008-04-29
Antireflection structure Grant 7,297,386 - Suzuki , et al. November 20, 2	2007-11-20
Designing method and device for phase shift mask Grant 7,287,240 - Toyama , et al. October 23, 2	2007-10-23
Method of evaluating the exposure property of data to wafer Grant 7,117,140 - Toyama October 3, 2	2006-10-03
Designing method and device for phase shift mask App 20060141365 - Toyama; Nobuhito ; et al.	2006-06-29
Designing method and device for phase shift mask Grant 7,067,221 - Mesuda , et al. June 27, 2	2006-06-27
Designing method and device for phase shift mask App 20050262468 - Mesuda, Kei ; et al.	2005-11-24
Antireflection structure App 20050074579 - Suzuki, Toshiyuki ; et al.	2005-04-07
Method For Correcting Design Pattern Of Semiconductor Circuit, A Photomask Fabricated Using The Corrected Design Pattern Data, A Method For Inspecting The Photomask And A Method For Generating Pattern Data For Inspection Of Photomask Grant 6,821,683 - Toyama , et al. November 23, 2	2004-11-23
Phase mask for forming diffraction grating, method of fabricating phase mask, and method of forming diffraction grating App 20040131949 - Kurihara, Masaaki ; et al.	2004-07-08
Designing method and device for phase shift mask App 20040101766 - Mesuda, Kei ; et al.	2004-05-27
Design circuit pattern for test of semiconductor circuit Grant 6,694,500 - Toyama February 17, 2	2004-02-17
Method of forming minute focusing lens Grant 6,656,664 - Takahashi , et al. December 2, 2	2003-12-02
Method of forming minute focusing lens App 20030059725 - Takahashi, Yoichi ; et al.	2003-03-27
Method of evaluating the exposure property of data to wafer App 20020194576 - Toyama, Nobuhito	2002-12-19
Method for correcting design pattern of semiconductor circuit, a photomask fabricated using the corrected design pattern data, a method for inspecting the photomask and a method for generating pattern data for inspection of photomask App 20020110742 - Toyama, Nobuhito ; et al.	2002-08-15
Design circuit pattern for test of semiconductor circuit App 20020075028 - Toyama, Nobuhito	2002-06-20
Process for making photomask pattern data and photomask App 20020028523 - Toyama, Nobuhito ; et al.	2002-03-07

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