loadpatents
name:-0.10050702095032
name:-0.022148847579956
name:-0.0037598609924316
Touya; Takanao Patent Filings

Touya; Takanao

Patent Applications and Registrations

Patent applications and USPTO patent grants for Touya; Takanao.The latest application filed is for "charged particle beam writing apparatus and charged particle beam writing method".

Company Profile
3.21.19
  • Touya; Takanao - Kanagawa JP
  • Touya; Takanao - Kawasaki JP
  • TOUYA; Takanao - Kawasaki-shi JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method
Grant 11,145,483 - Nakayama , et al. October 12, 2
2021-10-12
Charged particle beam writing apparatus and charged particle beam writing method
Grant 10,998,164 - Touya , et al. May 4, 2
2021-05-04
Charged particle beam writing method and charged particle beam writing apparatus
Grant 10,504,686 - Ogasawara , et al. Dec
2019-12-10
Charged Particle Beam Writing Apparatus And Charged Particle Beam Writing Method
App 20190371565 - TOUYA; Takanao ;   et al.
2019-12-05
Charged Particle Beam Writing Apparatus, Method Of Adjusting Beam Incident Angle To Target Object Surface, And Charged Particle Beam Writing Method
App 20190115185 - NAKAYAMA; Takahito ;   et al.
2019-04-18
Blanking device for multi charged particle beams, and multi charged particle beam irradiation apparatus
Grant 10,224,171 - Touya , et al.
2019-03-05
Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method
Grant 10,192,712 - Nakayama , et al. Ja
2019-01-29
Charged Particle Beam Writing Method And Charged Particle Beam Writing Apparatus
App 20180342366 - OGASAWARA; Munehiro ;   et al.
2018-11-29
Charged Particle Beam Writing Apparatus, Method Of Adjusting Beam Incident Angle To Target Object Surface, And Charged Particle Beam Writing Method
App 20180076002 - NAKAYAMA; Takahito ;   et al.
2018-03-15
Multi charged particle beam irradiation apparatus, multi charged particle beam irradiation method, and multi charged particle beam adjustment method
Grant 9,916,962 - Nishimura , et al. March 13, 2
2018-03-13
Blanking Device For Multi Charged Particle Beams, And Multi Charged Particle Beam Irradiation Apparatus
App 20170345612 - TOUYA; Takanao ;   et al.
2017-11-30
Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method
Grant 9,824,849 - Nakayama , et al. November 21, 2
2017-11-21
Multi Charged Particle Beam Irradiation Apparatus, Multi Charged Particle Beam Irradiation Method, And Multi Charged Particle Beam Adjustment Method
App 20170309440 - NISHIMURA; Shinsuke ;   et al.
2017-10-26
Inspection system and method for inspecting line width and/or positional errors of a pattern
Grant 9,406,117 - Touya , et al. August 2, 2
2016-08-02
Electron beam writing apparatus and electron beam writing method
Grant 9,373,424 - Touya , et al. June 21, 2
2016-06-21
Charged particle beam pattern writing method and charged particle beam writing apparatus that corrects beam rotation utilizing a correlation table
Grant 9,343,266 - Ogasawara , et al. May 17, 2
2016-05-17
Charged Particle Beam Writing Apparatus, Method Of Adjusting Beam Incident Angle To Target Object Surface, And Charged Particle Beam Writing Method
App 20160071682 - NAKAYAMA; Takahito ;   et al.
2016-03-10
Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method
Grant 9,236,223 - Nakayama , et al. January 12, 2
2016-01-12
Inspection System And Method For Inspecting Line Width And/or Positional Errors Of A Pattern
App 20150193918 - TOUYA; Takanao ;   et al.
2015-07-09
Inspection system and method for inspecting line width and/or positional errors of a pattern
Grant 9,036,896 - Touya , et al. May 19, 2
2015-05-19
Multi charged particle beam writing apparatus and multi charged particle beam writing method with fixed voltage ratio einzel lens
Grant 8,927,941 - Touya , et al. January 6, 2
2015-01-06
Charged particle beam writing apparatus
Grant 8,884,254 - Touya , et al. November 11, 2
2014-11-11
Multi charged particle beam writing apparatus
Grant 8,835,868 - Touya , et al. September 16, 2
2014-09-16
Electron beam writing apparatus and electron beam writing method
Grant 8,816,276 - Touya , et al. August 26, 2
2014-08-26
Charged particle beam writing apparatus and charged particle beam writing method
Grant 8,791,422 - Touya , et al. July 29, 2
2014-07-29
Charged Particle Beam Writing Apparatus, Method Of Adjusting Beam Incident Angle To Target Object Surface, And Charged Particle Beam Writing Method
App 20140203185 - NAKAYAMA; Takahito ;   et al.
2014-07-24
Multi Charged Particle Beam Writing Apparatus
App 20140175302 - TOUYA; Takanao ;   et al.
2014-06-26
Charged Particle Beam Writing Apparatus
App 20140175303 - TOUYA; Takanao ;   et al.
2014-06-26
Charged Particle Beam Pattern Writing Method And Charged Particle Beam Writing Apparatus
App 20140061499 - Ogasawara; Munehiro ;   et al.
2014-03-06
Charged particle beam writing apparatus and method
Grant 8,610,096 - Touya December 17, 2
2013-12-17
Multi Charged Particle Beam Writing Apparatus And Multi Charged Particle Beam Writing Method
App 20130240750 - Touya; Takanao ;   et al.
2013-09-19
Electron Beam Writing Apparatus And Electron Beam Writing Method
App 20130216953 - TOUYA; Takanao ;   et al.
2013-08-22
Electron Beam Writing Apparatus And Electron Beam Writing Method
App 20130214172 - Touya; Takanao ;   et al.
2013-08-22
Charged Particle Beam Writing Apparatus And Charged Particle Beam Writing Method
App 20130149646 - TOUYA; Takanao ;   et al.
2013-06-13
Charged Particle Beam Writing Apparatus And Method
App 20120193553 - TOUYA; Takanao
2012-08-02
Electron beam writing apparatus and method
Grant 8,067,753 - Touya November 29, 2
2011-11-29
Inspection System And Method For Inspecting Line Width And/or Positional Errors Of A Pattern
App 20110255770 - Touya; Takanao ;   et al.
2011-10-20
Electron Beam Writing Apparatus And Method
App 20090246655 - TOUYA; Takanao
2009-10-01

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