Toukhy; Medhat A.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Toukhy; Medhat A..The latest application filed is for "novolak/dnq based, chemically amplified photoresist".

Company Profile

2.10.14

Toukhy; Medhat A. - Flemington NJ
Toukhy; Medhat A. - Barrington RI

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Enviromentally stable, thick film, chemically amplified resist Grant 11,385,543 - Toukhy , et al. July 12, 2	2022-07-12
Novolak/dnq Based, Chemically Amplified Photoresist App 20210382390 - Toukhy; Medhat A. ; et al.	2021-12-09
Negative Resist Formulation For Producing Undercut Pattern Profiles App 20200319555 - MUKHERJEE; Anupama ; et al.	2020-10-08
Enviromentally Stable, Thick Film, Chemically Amplified Resist App 20200183278 - Toukhy; Medhat A. ; et al.	2020-06-11
Thick film resists Grant 8,715,918 - Toukhy , et al. May 6, 2	2014-05-06
Thick Film Resists App 20090081589 - Toukhy; Medhat A. ; et al.	2009-03-26
Bottom Antireflective Coatings App 20080032229 - Toukhy; Medhat A. ; et al.	2008-02-07
Photoresist composition for imaging thick films Grant 7,255,970 - Toukhy , et al. August 14, 2	2007-08-14
Developable undercoating composition for thick photoresist layers App 20070105040 - Toukhy; Medhat A. ; et al.	2007-05-10
Photoresist composition for imaging thick films App 20070015080 - Toukhy; Medhat A. ; et al.	2007-01-18
Process for producing an image using a first minimum bottom antireflective coating composition App 20060199103 - Neisser; Mark O. ; et al.	2006-09-07
Process for producing an image using a first minimum bottom antireflective coating composition Grant 7,070,914 - Neisser , et al. July 4, 2	2006-07-04
Negative-working photoimageable bottom antireflective coating App 20060063105 - Oberlander; Joseph E. ; et al.	2006-03-23
Bottom antireflective coatings App 20050074688 - Toukhy, Medhat A. ; et al.	2005-04-07
Positive-working photoimageable bottom antireflective coating Grant 6,844,131 - Oberlander , et al. January 18, 2	2005-01-18
Photoacid generators App 20040265733 - Houlihan, Francis M. ; et al.	2004-12-30
Negative-working photoimageable bottom antireflective coating App 20030215736 - Oberlander, Joseph E. ; et al.	2003-11-20
Positive-working photoimageable bottom antireflective coating App 20030129531 - Oberlander, Joseph E. ; et al.	2003-07-10
Process for producing an image using a first minimum bottom antireflective coating composition App 20030129547 - Neisser, Mark O. ; et al.	2003-07-10
Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures Grant 5,019,478 - Toukhy , et al. May 28, 1	1991-05-28
Positive photoresist with cresol-formaldehyde novolak resin and photosensitive naphthoquinone diazide Grant 4,587,196 - Toukhy * May 6, 1	1986-05-06
Positive photoresist composition with cresol-formaldehyde novolak resins Grant 4,529,682 - Toukhy July 16, 1	1985-07-16
Positive novolak photoresist compositions Grant 4,377,631 - Toukhy , et al. March 22, 1	1983-03-22

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