loadpatents
Patent applications and USPTO patent grants for Toshima; Masato M..The latest application filed is for "dual cassette load lock".
Patent | Date |
---|---|
Dual cassette load lock App 20060245854 - Toshima; Masato M. ;   et al. | 2006-11-02 |
Dual cassette load lock Grant 6,599,076 - Toshima , et al. July 29, 2 | 2003-07-29 |
Plasma reactor using inductive RF coupling, and processes Grant 6,545,420 - Collins , et al. April 8, 2 | 2003-04-08 |
Plasma reactor using inductive RF coupling, and processes Grant 6,518,195 - Collins , et al. February 11, 2 | 2003-02-11 |
Dual cassette load lock App 20030002959 - Toshima, Masato M. ;   et al. | 2003-01-02 |
Dual cassette load lock App 20030002960 - Toshima, Masato M. ;   et al. | 2003-01-02 |
Magnetic confinement in a plasma reactor having an RF bias electrode Grant 6,488,807 - Collins , et al. December 3, 2 | 2002-12-03 |
Dual cassette load lock Grant 6,454,508 - Toshima , et al. September 24, 2 | 2002-09-24 |
Dual cassette load lock Grant 6,454,519 - Toshima , et al. September 24, 2 | 2002-09-24 |
Processes Used In An Inductively Coupled Plasma Reactor App 20020004309 - COLLINS, KENNETH S. ;   et al. | 2002-01-10 |
Dual Cassette Load Lock App 20010014266 - TOSHIMA, MASATO M. ;   et al. | 2001-08-16 |
Plasma etch processes Grant 6,251,792 - Collins , et al. June 26, 2 | 2001-06-26 |
Process used in an RF coupled plasma reactor Grant 6,068,784 - Collins , et al. May 30, 2 | 2000-05-30 |
Dual cassette load lock Grant 5,769,588 - Toshima , et al. June 23, 1 | 1998-06-23 |
Method and apparatus for etching film layers on large substrates Grant 5,753,133 - Wong , et al. May 19, 1 | 1998-05-19 |
Silicon scavenger in an inductively coupled RF plasma reactor Grant 5,556,501 - Collins , et al. September 17, 1 | 1996-09-17 |
Uniformity for magnetically enhanced plasma chambers Grant 5,308,417 - Groechel , et al. May 3, 1 | 1994-05-03 |
Dual cassette load lock Grant 5,186,594 - Toshima , et al. February 16, 1 | 1993-02-16 |
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