loadpatents
name:-0.021111011505127
name:-0.01755690574646
name:-0.0073878765106201
Torimi; Satoshi Patent Filings

Torimi; Satoshi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Torimi; Satoshi.The latest application filed is for "sic wafer and manufacturing method for sic wafer".

Company Profile
6.17.23
  • Torimi; Satoshi - Kanonji JP
  • TORIMI; Satoshi - Kagawa JP
  • Torimi; Satoshi - Kanonji-shi JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Method for manufacturing reformed sic wafer, epitaxial layer-attached sic wafer, method for manufacturing same, and surface treatment method
Grant 11,261,539 - Torimi , et al. March 1, 2
2022-03-01
SiC WAFER AND MANUFACTURING METHOD FOR SiC WAFER
App 20210301421 - NAGAYA; Masatake ;   et al.
2021-09-30
Surface treatment method for SiC substrate
Grant 10,665,465 - Kaneko , et al.
2020-05-26
Heat treatment vessel for single-crystal silicon carbide substrate and etching method
Grant 10,665,485 - Torimi , et al.
2020-05-26
Reformed Sic Wafer Manufacturing Method, Epitaxial Layer-attached Sic Wafer, Method For Manufacturing Same, And Surface Processi
App 20200095703 - Torimi; Satoshi ;   et al.
2020-03-26
Etching method for SiC substrate and holding container
Grant 10,388,536 - Torimi , et al. A
2019-08-20
Seed material for liquid phase epitaxial growth of monocrystalline silicon carbide, and method for liquid phase epitaxial growth of monocrystalline silicon carbide
Grant 10,358,741 - Torimi , et al. July 23, 2
2019-07-23
METHOD FOR MANUFACTURING SINGLE-CRYSTAL SiC, AND HOUSING CONTAINER
App 20190010629 - YABUKI; Norihito ;   et al.
2019-01-10
Heat Treatment Vessel For Single-crystal Silicon Carbide Substrate And Etching Method
App 20180301359 - Torimi; Satoshi ;   et al.
2018-10-18
SiC substrate treatment method
Grant 10,014,176 - Yabuki , et al. July 3, 2
2018-07-03
Method for estimating depth of latent scratches in SiC substrates
Grant 9,991,175 - Torimi , et al. June 5, 2
2018-06-05
METHOD FOR MANUFACTURING THIN SiC WAFER AND THIN SiC WAFER
App 20180069084 - TORIMI; SATOSHI ;   et al.
2018-03-08
SURFACE TREATMENT METHOD FOR SiC SUBSTRATE
App 20170345672 - Kaneko; Tadaaki ;   et al.
2017-11-30
Etching Method For Sic Substrate And Holding Container
App 20170323797 - Torimi; Satoshi ;   et al.
2017-11-09
SiC SUBSTRATE TREATMENT METHOD
App 20170323792 - Yabuki; Norihito ;   et al.
2017-11-09
METHOD FOR MANUFACTURING THIN SiC WAFER AND THIN SiC WAFER
App 20170236905 - Torimi; Satoshi ;   et al.
2017-08-17
Method for epitaxial growth of monocrystalline silicon carbide using a feed material including a surface layer containing a polycrystalline silicon carbide with a 3C crystal polymorph
Grant 9,725,822 - Torimi , et al. August 8, 2
2017-08-08
Storing container, storing container manufacturing method, semiconductor manufacturing method, and semiconductor manufacturing apparatus
Grant 9,704,733 - Torimi , et al. July 11, 2
2017-07-11
Semiconductor device manufacturing apparatus
Grant 9,644,894 - Torimi , et al. May 9, 2
2017-05-09
SURFACE TREATMENT METHOD FOR SiC SUBSTRATES, SiC SUBSTRATE, AND SEMICONDUCTOR PRODUCTION METHOD
App 20170121848 - Torimi; Satoshi ;   et al.
2017-05-04
METHOD FOR REMOVING WORK-AFFECTED LAYER ON SiC SEED CRYSTAL, SiC SEED CRYSTAL, AND SiC SUBSTRATE MANUFACTURING METHOD
App 20170114475 - Yabuki; Norihito ;   et al.
2017-04-27
METHOD FOR ESTIMATING DEPTH OF LATENT SCRATCHES IN SiC SUBSTRATES
App 20170110378 - Torimi; Satoshi ;   et al.
2017-04-20
Surface treatment method for single crystal SiC substrate, and single crystal SiC substrate
Grant 9,570,306 - Torimi , et al. February 14, 2
2017-02-14
Seed material for liquid phase epitaxial growth of monocrystalline silicon carbide, and method for liquid phase epitaxial growth of monocrystalline silicon
Grant 9,447,517 - Torimi , et al. September 20, 2
2016-09-20
Unit for liquid phase epitaxial growth of monocrystalline silicon carbide, and method for liquid phase epitaxial growth of monocrystalline silicon carbide
Grant 9,252,206 - Torimi , et al. February 2, 2
2016-02-02
SURFACE TREATMENT METHOD FOR SINGLE CRYSTAL SiC SUBSTRATE, AND SINGLE CRYSTAL SiC SUBSTRATE
App 20150294867 - Torimi; Satoshi ;   et al.
2015-10-15
Storing Container, Storing Container Manufacturing Method, Semiconductor Manufacturing Method, And Semiconductor Manufacturing Apparatus
App 20150255314 - Torimi; Satoshi ;   et al.
2015-09-10
Semiconductor Device Manufacturing Apparatus
App 20150249025 - Torimi; Satoshi ;   et al.
2015-09-03
Unit For Liquid Phase Epitaxial Growth Of Monocrystalline Silicon Carbide, And Method For Liquid Phase Epitaxial Growth Of Monocrystalline Silicon Carbide
App 20130285060 - Torimi; Satoshi ;   et al.
2013-10-31
Seed Material For Liquid Phase Epitaxial Growth Of Monocrystalline Silicon Carbide, And Method For Liquid Phase Epitaxial Growth Of Monocrystalline Silicon Carbide
App 20130269597 - Torimi; Satoshi ;   et al.
2013-10-17
Feed Material For Epitaxial Growth Of Monocrystalline Silicon Carbide, And Method For Epitaxial Growth Of Monocrystalline Silicon Carbide
App 20130269596 - Torimi; Satoshi ;   et al.
2013-10-17
Seed Material For Liquid Phase Epitaxial Growth Of Monocrystalline Silicon Carbide, And Method For Liquid Phase Epitaxial Growth Of Monocrystalline Silicon
App 20130263774 - Torimi; Satoshi ;   et al.
2013-10-10

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