Tomozawa; Akihiro
Patent Applications and Registrations
Patent applications and USPTO patent grants for Tomozawa; Akihiro.The latest application filed is for "process of fabricating a semiconductor insulated circuit device having a phosphosilicate glass insulating film".
- Tomozawa; Akihiro - Hinode JP
- Tomozawa; Akihiro - Hinodemachi JP
- Tomozawa; Akihiro - Kodaira JA
- Tomozawa; Akihiro - Tokyo JA
| Patent | Date |
|---|---|
| Process of fabricating a semiconductor insulated circuit device having a phosphosilicate glass insulating film Grant 4,782,037 - Tomozawa , et al. November 1, 1 | 1988-11-01 |
| Semiconductor device Grant 4,377,819 - Sakai , et al. March 22, 1 | 1983-03-22 |
| Method of producing MIS structure Grant 3,972,756 - Nagase , et al. August 3, 1 | 1976-08-03 |
| Method of forming insulating film on interconnection layer Grant 3,935,083 - Tomozawa , et al. January 27, 1 | 1976-01-27 |
| Method of producing multi-layer structure Grant 3,906,620 - Anzai , et al. September 23, 1 | 1975-09-23 |
| Method Of Manufacturing Interconnection Substrate Grant 3,855,112 - Tomozawa , et al. December 17, 1 | 1974-12-17 |
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